Full Publications List

(last updated June 21, 2004 2:44 PM )

Journal Article

Journal Articles

• (JA-1). H.I. Smith and M.S. Gussenhoven, "Adhesion of Polished Quartz Crystals under Ultrahigh Vacuum", J. Appl. Phys. 36, 2326-2327 (1965).
• (JA-2). H.I. Smith, "Optical-Contact Bonding", J. Acoust. Soc. Amer. 37, 928-929 (1965).
• (JA-3). H. Van de Vaart and H.I. Smith, "High Efficiency Polarization Reversal of Magnetoelastic Waves in YIG by Optical-Contact Bonding of YAG Disks", Appl. Phys. Lett. 9, 439-441 (1966).
• (JA-4. H.I. Smith and A.B. Smith, "Transmission of Gigahertz Ultrasonic Waves through Optical-Contact Bonds at Room Temperature", J. Acoust. Soc. Amer. 44, 1737-1738 (1968).
• (JA-5. H.I. Smith, "Methods for Fabricating High Frequency Surface Wave Transducers", Rev. Sci. Inst. 40, 729-730 (1969).
• (JA-6. H.I. Smith, "The Physics and Technology of Surface Elastic Waves", International Journal of Nondestructive Testing 2, 31-59 (1970).
• (JA-7. B.E. Burke, A. Bers, H.I. Smith, R.A. Cohen, and R.W. Mountain, "Acoustic Surface Wave Amplification using an Accumuation Layer on Silicon", Proc. IEEE 58, 1775-1776 (1970).
• (JA-8. H.I. Smith, F.J. Bachner, and N. Efremow, "A High-Yield Photolithographic Technique for Surface Wave Devices", J. Electrochem. Soc. 118, 821-825 (1971).
• (JA-9. D.L. Spears and H.I. Smith, "High-Resolution Pattern Replication using Soft X-rays", Electronics Lett. 8, 102-104 (1972).
• (JA-10. D.L. Spears and H.I. Smith, "X-ray Lithography: A New High Resolution Replication Process", Solid State Technol. 15, No. 7, 21-26 (1972).
• (JA-11. R.C. Williamson and H.I. Smith, "Large-Time-Bandwidth-Product Surface-Wave Pulse Compressor Employing Reflective Gratings", Electronics Lett. 8, No. 16, 401-402 (1972).
• (JA-12. R.C. Williamson and H.I. Smith, "The use of Surface-Elastic-Wave Reflection Gratings in Large Time-Bandwidth Pulse-Compression Filters", IEEE Trans. Microwave Theory and Techniques MTT-21, 195-205 (1973).
• (JA-13. H.I. Smith, D.L. Spears, and S.E. Bernacki, "X-ray Lithography: A Complementary Technique to Electron Beam Lithography", J. Vac. Sci. Technol. 10, 913-917 (1973).
• (JA-14. R.J. Hawryluk, A.M. Hawryluk, and H.I. Smith, "Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering", J. Appl. Phys. 45, 2551-2556 (1974).
• (JA-15. H.I. Smith, "Fabrication Techniques for Surface-Acoustic Wave and Thin-Film Optical Devices", Proc. IEEE 62, 1361-1387 (1974).
• (JA-16. H.I. Smith, "Electron Beam, X-ray, and Optical Techniques for Fabricating Surface-Acoustic-Wave and Thin-Film Optical Devices", LeVide 29, No. 173, 364-370 (1974).
• (JA-17. H.I. Smith, N. Efremow, and P.L. Kelly, "Photolithographic Contact Printing of 4000Å Linewidth Patterns", J. Electrochem. Soc. 121, 1503-1506 (1974).
• (JA-18. R.J. Hawryluk, H.I. Smith, A. Soares, and A.M. Hawryluk, "Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering-Experiment", J. Appl. Phys. 46, 2528-2537 (1975).
• (JA-19. S.E. Bernacki and H.I. Smith, "Fabrication of Silicon MOS Devices using X-ray Lithography", IEEE Trans. Elec. Dev. ED22, 421-428 (1975).
• (JA-20. J. Melngailis, H.I. Smith, and N. Efremow, "Instrumentation for Conformable Photomask Lithography", IEEE Trans. Elec. Dev. ED22, 496-498 (1975).
• (JA-21. H.I. Smith, S.R. Chinn, and P.D. DeGraff, "Application of Moiré Techniques in Scanning Electron Beam Lithography and Microscopy", J. Vac. Sci. Technol. 12, 1262-1265 (1975).
• (JA-22. H.I. Smith and S.E. Bernacki, "Prospects for X-ray Fabrication of Silicon IC Devices", J. Vac. Sci. Technol. 12, 1321-1323 (1975).
• (JA-23. S.E. Bernacki and H.I. Smith, "Fabrication of Silicon MOS Devices using X-ray Lithography", (in Japanese), Nikkei Electronics 1-12, 139-157 (1976).
• (JA-24. H.I. Smith and D.C. Flanders, "X-ray Lithography", Japan J. Appl. Phys. 16, Supplement 16 1, 61-65 (1977).
• (JA-25. D.C. Flanders, H.I. Smith, and S. Austin, "A New Interferometric Alignment Technique", Appl. Phys. Lett. 31, 426-428 (1977).
• (JA-26. D.C. Flanders, H.I. Smith, H.W. Lehmann, R. Widmer, and D.C. Shaver, "Surface Relief Structures with Linewidths Below 2000Å", Appl. Phys. Lett. 32, 112-114 (1978).
• JA-27. N.M. Ceglio and H.I. Smith, "Micro Fresnel Zone Plates for Coded Imaging Applications", Rev. Sci. Instr. 49, 15-20 (1978).
• JA-28. H.I. Smith and D.C. Flanders, "Oriented Crystal Growth on Amorphous Substrates using Artificial Surface-Relief Gratings", Appl. Phys. Lett. 32, 349-350 (1978).
• JA-29. D.C. Flanders, D.C. Shaver, and H.I. Smith, "Alignment of Liquid Crystals using Submicrometer Periodicity Gratings", Appl. Phys. Lett. 32, 597-598 (1978).
• JA-30. S. Austin, H.I. Smith, and D.C. Flanders, "Alignment of X-ray Lithography Masks using a New Interferometric Technique - Experimental Results", J. Vac. Sci. Technol. 15, 984 (1978).
• JA-31. D.C. Flanders and H.I. Smith, "Polyimide Membrane X-ray Lithography Masks - Fabrication and Distortion Measurements", J. Vac. Sci. Technol. 15, 995-997 (1978).
• JA-32. D.C. Flanders and H.I. Smith, "Surface Relief Gratings of 3200Å-Period-Fabrication and Influence on Thin-Film Growth", J. Vac. Sci. Technol. 15, 1001 (1978).
• JA-33. M.W. Geis, D.C. Flanders, and H.I. Smith, "Crystallographic Orientation of Silicon on an Amorphous Substrate using an Artificial Surface-Relief Grating and Laser Crystallization", Appl. Phys. Lett. 35, 71 (1979).
• JA-34. J. Melngailis, H.A. Haus, and A. Lattes, "Efficient Conversion of Surface Acoustic Waves in Shallow Gratings to Bulk Plate Modes", Appl. Phys. Lett. 35, 324 (1979).
• JA-35. D.C. Shaver, D.C. Flanders, N.M. Ceglio, and H.I. Smith, "X-ray Zone Plates Fabricated using Electron-Beam and X-ray Lithography", J. Vac. Sci. Technol. 16, 1626 (1979).
• JA-36. M.W. Geis, D.C. Flanders, H.I. Smith, and D.A. Antoniadis, "Graphoepitaxy of Silicon on Fused Silica using Surface Micropatterns and Laser Crystallization", J. Vac. Sci. Technol. 16, 1640 (1979).
• JA-37. D.C. Flanders, A.M. Hawryluk, and H.I. Smith, "Spatial-Period-Division - A New Technique for Exposing Submicrometer-Linewidth Periodic and Quasi-Periodic Patterns", J. Vac. Sci. Technol. 16, 1949 (1979).
• JA-38. H.I. Smith and D.C. Flanders, "X-ray Lithography - A Review and Assessment of Future Applications", J. Vac. Sci. Technol. 17, 533 (1980).
• JA-39. M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, "Silicon Graphoepitaxy using a Strip-Heater Oven", Appl. Phys. Lett. 37, 454 (1980).
• JA-40. H.A. Haus, A. Lattes, and J. Melngailis, "Grating Coupling Between Surface Acoustic Waves and Plate Modes", IEEE Trans. Sonics and Ultrasonics SU27, 258 September 1980.
• JA-41. H.V. Kanel and J.D. Litster, "Light Scattering Studies on Single-Layer Smectic p Butoxybenzilidene p-Octylaniline", Phys. Rev. A 23, 3251 (1981).
• JA-42. M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, "Silicon Graphoepitaxy", J. Vac. Sci. Technol. 18, 229 (1981).
• JA-43. H.V. Kanel, J.D. Litster, J. Melngailis, and H.I. Smith, "Alignment of Nematic Butoxybenzilidene Octylaniline by Surface Relief Gratings", Phys. Rev. A 24, 2713 (l98l).
• JA-44. N.M. Ceglio, C.F. Stone, and A.M. Hawryluk, "Microstructures for High Energy X-ray and Particle Imaging Applications", J. Vac. Sci. Technol. 19, 886 (1981).
• JA-45. A.M. Hawryluk, N.M. Ceglio, R.H. Price, J. Melngailis, and H.I. Smith, "Gold Transmission Gratings with Submicrometer Periods and Thicknesses > 0.5 µm", J. Vac. Sci. Technol. 19, 897 (1981).
• JA-46. N. Tsumita, J. Melngailis, A.M. Hawryluk, and H.I. Smith, "Fabrication of X-ray Masks using Anisotropic Etching of (110) Si and Shadowing Techniques", J. Vac. Sci. Technol. 19, 1211 (1981).
• JA-47. N.N. Efremow, N.P. Economou, K. Bezjian, S.S. Dana, and H.I. Smith, "A Simple Technique for Modifying the Profile of Resist Exposed by Holographic Lithography", J. Vac. Sci. Technol. 19, 1234 (1981).
• JA-48. C.M. Horowitz and J. Melngailis, "Reactive Sputter Etching of Si, SiO2, Cr, Al, and Other Materials with Gas Mixtures Based on CF4 and Cl2", J. Vac. Sci. Technol. 19, 1408 (1981).
• JA-49. P.F. Liao, J.G. Bergman, D.S. Chemla, A. Wokaun, J. Melngailis, A.M. Hawryluk, and N.P. Economou, "Surface Enhanced Raman Scattering from Microlithographic Silver Particle Surfaces", Chem. Phys. Lett. 82, (2), 355 (1981).
• JA-50. C.M. Horwitz, "Reactive Sputter Etching of Silicon with Very Low Mask-Material Etch Rates", IEEE Trans. Elect. Devices ED28, 1320 (198l).
• JA-51. M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, E.W. Maby, and D.A. Antoniadis, "Zone-Melting Recrystallization of Encapsulated Silicon Films on SiO2- Morphology and Crystallography", Appl. Phys. Lett. 40, 158 (1982).
• JA-52. R.J. Hawryluk, A.M. Hawryluk, and H.I. Smith, "Addendum: New Model of Electron Free Path in Multiple Layers for Monte Carlo Simulation", J. Appl. Phys. 53, 5985 (1982).
• JA-53. K.A. Bezjian, H.I. Smith, J.M. Carter, and M.W. Geis, "An Etch Pit Technique for Analyzing Crystallographic Orientation in Si Films", J. Electrochem. Soc. 129, 1848 (1982).
• JA-54. A.M. Hawryluk, H.I. Smith, R.M. Osgood, and D.J. Ehrlich, "Deep-UV Spatial Period Division using An Excimer Laser", Optics Letters 7, 402 (1982).
• JA-55. M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, D.J. Silversmith, and R.W. Mountain, "Zone Melting Recrystallization of Si Films with a Movable-Strip-Heater Oven", J. Electrochem. Soc. 129, 2812 (1982).
• JA-56. H.A. Atwater, H.I. Smith, and M.W. Geis, "Orientation Selection by Zone-Melting Silicon Films through Planar Constrictions", Appl. Phys. Lett. 41, 747 (1982).
• JA-57. N.M. Ceglio, A.M. Hawryluk, and R.H. Price, "Imaging X-ray Spectrometer for Laser Fusion Applications", Appl. Opt. 21, 3953-3960 (1981).
• JA-58. M.W. Geis, H.I. Smith, D.J. Silversmith, R.W. Mountain, and C.V. Thompson, "Solidification-Front Modulation to Entrain Subboundaries in Zone Melting Recrystallization of Si on SiO2", J. Electrochem. Soc. 130, 1178 (1983).
• JA-59. C.M. Horwitz, "New Dry Etch for Al and Al-Cu-Si Alloy: Reactively Masked Sputter Etching with SiF4", Appl. Phys. Lett. 42, 898 (1983).
• JA-60. E.W. Maby, H.A. Atwater, A.L. Keigler, and N.M. Johnson, "Electron-Beam-Induced Current Measurements in Silicon-on-Insulator Films Prepared by Zone-Melting Recrystallization", Appl. Phys. Lett. 43, 482 (1983).
• JA-61. C.M. Horwitz, "RF Sputtering-Voltage Division Between Two Electrodes", J. Vac. Sci. Technol. A 1, 60 (1983).
• JA-62. H.I. Smith, C.V. Thompson, M.W. Geis, R.A. Lemons, and M.A. Bosch, "The Mechanism of Orientation in Si Graphoepitaxy by Laser or Strip-Heater Recrystallization", J. Electrochem. Soc. 130, 2050 (1983).
• JA-63. H.I. Smith, M.W. Geis, C.V. Thompson, and H.A. Atwater, "Silicon-on-Insulator by Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films", J. Crystal Growth, 63, 527 (1983).
• JA-64. C.M. Horwitz, "Hollow Cathode Reactive Sputter Etching - A New High-Rate Process", Appl. Phys. Lett. 43, 977 (1983).
• JA-65. E.H. Anderson, C.M. Horwitz, and H.I. Smith, "Holographic Lithography with Thick Photoresist", Appl. Phys. Lett. 43, 874 (1983).
• JA-66. A.M. Hawryluk, H.I. Smith, and D.J. Ehrlich, "Deep UV Spatial-Frequency Doubling by Combining Multilayer Mirrors with Diffraction Gratings", J. Vac. Sci. Technol. B 1, 1200 (1983).
• JA-67. H.J. Lezec, E.H. Anderson, and H.I. Smith, "An Improved Technique for Resist-Profile Control in Holographic Lithography", J. Vac. Sci. Technol. B 1, 1204 (1983).
• JA-68. N.M. Ceglio, A.M. Hawryluk, and M.L. Schattenburg, "X-ray Phase Lens Design and Fabrication", J. Vac. Sci. Technol. B 1, 1285 (1983).
• JA-69. H.A. Atwater, C.V. Thompson, H.I. Smith, and M.W. Geis, "Orientation Filtering by Growth-Velocity Competition in Zone-Melting Recrystallization of Silicon on SiO2", Appl. Phys. Lett. 43, 1126 (1983).
• JA-70. C.M. Horwitz, "Radio Frequency Sputtering - The Significance of Power Input", J. Vac. Sci. Technol. A 1, 1795 (1983).
• JA-71. H.I. Smith, C.V. Thompson, and H.A. Atwater, "Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films", J. Cryst. Growth 65, 337 (1983).
• JA-72. C.J. Keavney and H.I. Smith, "A 3.8 µm Period Sawtooth Grating in InP by Anisotropic Etching", J. Electrochem. Soc. 131, 452 (1984).
• JA-73. R.F. Kwasnick, M.A. Kastner, J. Melngailis, and P.A. Lee, "Non-Monotonic Variations of the Conductance with Electron Density in ~70 nm Wide Inversion Layers", Phys. Rev. Lett. 52, 224 (1984).
• JA-74. C.V. Thompson and H.I. Smith, "Surface-Energy-Driven Secondary Grain Growth in Ultrathin (<100 nm) Films of Silicon", Appl. Phys. Lett. 44, 603 (1984).
• JA-75. H.A. Atwater, H.I. Smith, C.V. Thompson, and M.W. Geis, "Zone-Melting Recrystallization of Thick Silicon on Insulator Films", Mater. Lett. 2, 269 (1984).
• JA-76. T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, "Graphoepitaxy of Ge on SiO2 by Solid-State Surface-Energy-Driven Grain Growth", Appl. Phys. Lett. 45, 631 (1984).
• JA-77. M.L. Schattenburg, I. Plotnik, and H.I. Smith, "Reactive-Ion Etching of 0.2 µm Period Gratings in Tungsten and Molybdenum using CBrF3", J. Vac. Sci. Technol. B 3, 272 (1985).
• JA-78. A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, "Surface Superlattice Formation in Silicon Inversion Layers using 0.2 µm-Period Grating-Gate Electrodes", IEEE Elect. Dev. Lett. EDL-6, 294 (1985).
• JA-79. G.G. Shahidi, E.P. Ippen, and J. Melngailis, "Submicron-Gap High-Mobility Silicon Picosecond Photodetectors", Appl. Phys. 58, 763 (1985).
• JA-80. C.V. Thompson, "Secondary Grain Growth in Thin Films of Semiconductors: Theoretical Aspects", J. Appl. Phys. 58, 763 (1985).
• JA-81. S.Y. Chou, H.I. Smith, and D.A. Antoniadis, "X-ray Lithography for Sub-100 nm Channel Length Transistors using Masks Fabricated with Conventional Photolithography, Anisotropic Etching and Oblique Shadowing", J. Vac. Sci. Technol. B 3, 1587 (1985).
• JA-82. J.C. Licini, D.J. Bishop, M.A. Kastner, and J. Melngailis, "Aperiodic Magnetoresistance Oscillations in Narrow Inversion Layers in Si", Phy. Dev. Lett. 55, 2987 (1985).
• JA-83. S.Y. Chou, D.A. Antoniadis, and H.I. Smith, "Observation of Electron Velocity Overshoot in Sub-100 nm-Channel MOSFETs in Si", IEEE Elect. Dev. Lett. EDL-6, 665 (1985).
• JA-84. H.I. Smith, "A Statistical Analysis of UV, X-ray and Charged-Particle Lithographies", J. Vac. Sci. Technol. B 4, 148 (1986).
• JA-85. S.Y. Chou, H.I. Smith, and D.A. Antoniadis, "Sub-100 nm Channel-Length Transistors Fabricated using X-ray Lithography", J. Vac. Sci. Technol. B 4, 253 (1986).
• JA-86. A.C. Warren, I. Plotnik, E.H. Anderson, M.L. Schattenburg, D.A. Antoniadis, and H.I. Smith, "Fabrication of Sub-100 nm Linewidth Periodic Structures for Study of Quantum Effects from Interference and Confinement in Si Inversion Layers", J. Vac. Sci. Technol. B 4, 365 (1986).
• JA-87. C.C. Wong, H.I. Smith, and C.V. Thompson "Surface-Energy-Driven Secondary Grain Growth in Thin Au Films", Appl. Phys. Lett. 48, 335 (1986).
• JA-88. H.-J. Kim, C.V. Thompson, "Compensation of Grain Growth Enhancement in Doped Silicon Films", Appl. Phys. Lett. 48, 399 (1986).
• JA-89. A.C. Warren, D.A. Antoniadis, and H.I. Smith, "Quasi One-Dimensional Conduction in Multiple, Parallel Inversion Lines", Phys. Rev. Lett. 56, 1858 (1986).
• JA-90. S.Y. Chou and D.A. Antoniadis "Relationship Between Measured and Intrinsic Transconductances of FETs", IEEE Trans. Electron Devices ED-34, 448 (1987).
• JA-91. M.W. Geis, H.I. Smith, and C.K. Chen, "Characterization and Entrainment of Subboundaries and Defect Trails in Zone-Melting-Recrystallized Si Films", J. Appl. Phys. 60, 1152 (1986).
• JA-92. H.I. Smith, "A Review of Submicron Lithography", Superlattices and Microstructures 2, 129 (1986).
• JA-93. A.C. Warren, D.A. Antoniadis, and H.I. Smith, "Semi-Classical Calculation of Charge Distributions in Ultra-Narrow Inversion Lines", IEEE Electron Device Letters EDL-7, 413 (1986).
• JA-94. S.Y. Chou, D.A. Antoniadis, and H.I. Smith, "Application of the Shubnikov-de Haas Oscillations in Characterization of Si MOSFET's and GaAs MODFET's", IEEE Trans. Elec. Dev. ED-34, 883 (1987).
• JA-95. C.R. Canizares, H.V.D. Bradt, G.W. Clark, A.C. Fabian, P.C. Joss, A.M. Levine, W.H.G. Lewin, T.H. Market, W. Mayer, J.E. McClintock, S.A. Rappaport, G.R. Ricker, M.L. Schattenburg, H.I. Smith, and B.E. Woodgate, "The MIT Spectroscopy Investigation on AXAF and the Study of Supernova Remnants", Astro. Lett. and Communications 26, 87 (1987).
• JA-96. S.M. Garrison, R.C. Cammarata, C.V. Thompson, and H. I. Smith, "Surface-Energy-Driven Grain Growth during Rapid Thermal Annealing (< 10s) of Thin Silicon Films", J. Appl. Phys. 61, 1652 (1987).
• JA-97. S.Y. Chou, D.A. Antoniadis, H.I. Smith, and M.A. Kastner, "Conductance Fluctuations in Ultra-Short-Channel Si MOSFETs", Solid State Communications 61, 571 (1987).
• JA-98. M.A. Kastner, R.F. Kwasnick, J.C. Licini, and D.J. Bishop, "Conductance Fluctuations Near the Localized-to-Extended Transition in Narrow Si MOSFETs", Phys. Rev. B 36, 8015 (1987).
• JA-99. J.S. Im, H. Tomita, and C.V.Thompson, "Cellular and Dendritic Morphologies on Stationary and Moving Liquid-Solid Interfaces in Zone-Melting Recrystallization", Appl. Phys. Lett. 51, 685 (1987).
• JA-100. J. Palmer, C.V. Thompson, and H.I. Smith, "Grain Growth and Grain Size Distribution in Thin Germanium Films", J. Appl. Phys. 62, 2492 (1987).
• JA-101. G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, "Observation of Electron Velocity Overshoot at Room and Liquid Nitrogen Temperatures in Silicon Inversion Layers", IEEE Elect. Dev. Lett. EDL-9, 94 (1988).
• JA-102. H.A. Atwater, C.V. Thompson, and H.I. Smith, "Interface-Limited Grain Boundary Motion during Ion Bombardment", Phys. Rev. Lett. 60, 112 (1988).
• JA-103. G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, "Electron Velocity Overshoot in Sub-100 nm Channel Length MOSFETs at 77K and 300K", J. Vac. Sci. Technol. B 6, 137 (1988).
• JA-104. H.I. Smith, "A Model for Comparing Process Latitude in Ultraviolet, Deep-Ultraviolet and X-ray Lithography", J. Vac. Sci. Technol. B 6, 346-349 (1988).
• JA-105. E.H. Anderson, K. Komatsu, and H.I. Smith, "Achromatic Holographic Lithography in the Deep UV", J. Vac. Sci. Technol. B 6, 216 (1988).
• JA-106. Y.-C. Ku, E.H. Anderson, M.L. Schattenburg, and H.I. Smith, "Use of a Pi-Phase-Shifting X ray Mask to Increase the Intensity Slope at Feature Edges", J. Vac. Sci. Technol. B 6, 150 (1988).
• JA-107. G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, "Reduction of Channel-Hot-Electron-Generated Substrate Current in Sub-150 nm Channel Length Si MOSFETs", IEEE Elect. Dev. Lett. EDL-9, 497 (1988).
• JA-108. K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, "Surface-Superlattice Effects in a Grating-Gate GaAs/GaA1As Modulation-Doped Field-Effect Transistor", Appl. Phys. Lett. 52, 1071 (1988).
• JA-109. M.A. Kastner, S.B. Field, J.C. Licini, and S.L.Park, "Anomalous Magnetoresistance of the Electron Gas in a Restricted Geometry", Phys. Rev. Lett. 60, 2535 (1988).
• JA-110. E.H. Anderson, A.M. Levine, and M.L. Schattenburg, "Transmission X-ray Diffraction Grating Alignment using a Photoelastic Modulator", Appl. Opt. Lett. 27, 3522 (1988).
• JA-111. H.A. Atwater, C.V. Thompson, and H.I. Smith, "Ion Bombardment Enhanced Grain Growth in Germanium, Silicon and Gold Thin Films", J. Appl. Phys. 64, 2337 (1988).
• JA-112. H.A. Atwater, C.V. Thompson, and H.I. Smith, "Mechanisms for Crystallographic Orientation in the Crystallization of Thin Silicon Films from the Melt", J. Mat. Res. 3, 1232 (1988).
• JA-113. D.W. Keith, M.L. Schattenburg, H.I. Smith, and D.E. Pritchard, "Diffraction of Atoms by a Transmission Grating", Phys. Rev. Lett. 61, 1580-1583 (1988).
• JA-114. H.A. Atwater and C.V. Thompson, "Point Defect Enhanced Grain Growth in Silicon Thin Films: The Role of Ion Bombardment and Dopants", Appl. Phys. Lett. 53, 2155 (1988).
• JA-115. C. Ortiz, K.A. Rubin, and S. Ajuria, "Laser-Induced Multi- Crystallization Events of Thin Germanium Films", J. Mat. Res. 3, 1196 (1988).
• JA-116. K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, "Lateral-Surface Superlattice and Quasi-One-Dimensional GaAs/GaAlAs MODFETs Fabricated using X-ray and Deep-UV Lithography", J. Vac. Sci. Technol. B 6, 1824 (1988).
• JA-117. J.H.F. Scott-Thomas, M.A. Kastner, D.A. Antoniadis, H.I. Smith, and S. Field, "Si MOSFETs with 70 nm Slotted Gates for Study of Quasi-One-Dimensional Quantum Transport", J. Vac. Sci. Technol. B 6, 1841 (1988).
• JA-118. JA-118 Y.C. Ku, H.I. Smith,and I. Plotnik, "Use of Ion Implantation to Eliminate Stress-Induced Distortion in X-ray Masks", J. Vac. Sci. Technol. B 6, 2174 (1988).
• JA-119. U. Meirav, M. Heiblum, and F. Stern, "High-Mobility Variable-Density Two-Dimensional Electron Gas in Inverted GaAs-AlGaAs Heterojunctions", Appl. Phys. Lett. 52, 460-462 (1988).]
  JA-120. K. Ismail, W. Chu, A. Yen, D.A. Antoniadis and H.I. Smith, "Negative Transconductance and Negative Differential Resistance in a Grid-Gate Modulation-Doped Field-Effect Transistor", Appl. Phys. Lett. 54, 460 (1989).
• JA-121. K. Ismail, D.A. Antoniadis, and H.I. Smith, "One-Dimensional Subbands and Mobility Modulation in GaAs/AlGaAs Quantum Wires", Appl. Phys. Lett. 54, 1130 (1989).
  JA-122. J.H.F. Scott-Thomas, S.B. Field, M.A. Kastner, H.I. Smith, and D.A. Antoniadis, "Conductance Oscillations Periodic in the Density of a One-Dimensional Electron Gas", Phys. Rev. Lett. 62, 583 (1989).
  JA-123. P.F. Bagwell and T.P. Orlando, "Landauer's Conductance Formula and its Generalization to Finite Voltages", Phys. Rev. B 40, 1456 (1989).
• JA-124. P.F. Bagwell and T.P. Orlando, "Broadened Conductivity Tensor and Density of States for a Superlattice Potential in 1, 2, and 3 Dimensions", Phys. Rev. B 40, 3735 (1989).
• JA-125. C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Magneto-Optics of a Quasi Zero-Dimensional Electron Gas", Appl. Phy. Lett. 55, 168 (1989).
• JA-126. K. Ismail, D.A. Antoniadis, and H.I. Smith, "Lateral Resonant Tunneling in a Double-Barrier Field-Effect Transistor", Appl. Phys. Lett. 55, 589 (1989).
• JA-127. [U. Meirav, M.A. Kastner, M. Heiblum, and S.J. Wind, "One-Dimensional Electron Gas in GaAs: Periodic Conductance Oscillations as a Function of Density", Phys. Rev. B 40, 5871 (1989).]
• JA-128. W. Chu, A. Yen, K. Ismail, M.I. Shepard, H.J. Lezec, C.R. Musil, J. Melngailis, Y.-C. Ku, J.M. Carter, and H.I. Smith, "Sub-100 nm X-ray Mask Technology using Focused-Ion-Beam Lithography", J. Vac. Sci. Technol. B 7, 1583-1585 (1989).
• JA-129. A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith, "Microgap Control in X-ray Nanolithography", J. Vac. Sci. Technol. B 7, 1692-1695 (1989).
• JA-130. K. Ismail, W. Chu, R. Tiberio, A. Yen, H.J. Lezec, M.I. Shepard, C.R. Musil, J. Melngailis, D.A. Antoniadis, and H.I. Smith, "Resonant Tunneling Across and Mobility Modulation Along Surface-Structured Quantum Wells", J. Vac. Sci. Technol. B 7, 2025-2029 (1989).
• JA-131. K. Ismail, D.A. Antoniadis, H.I. Smith, C.T. Liu, K. Nakamura, and D.C. Tsui, "A Lateral-Surface Superlattice Structure on GaAs/AlGaAs for Far-Infrared and Magneto-Capacitance Measurements", J. Vac. Sci. Technol. B 7, 2000-2002 (1989).
• JA-132 K. Ismail, T.P. Smith, III, W.T. Masselink and H. I. Smith, "Magnetic Flux Commensurability in Coupled Quantum Dots", Appl. Phys. Lett. 55, 276 (1989).
• JA-132A A. Kumar, S.E. Laux, and F. Stern, "Channel Sensitivity to Gate Roughness in a Split-gate GaAs-AlGaAs Heterostructure", Appl. Phys. Lett. 54, 1270 (1989).
• JA-133. C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Far-Infrared Transmission Measurements on Grid-Gate GaAs/AlGaAs Lateral-Surface-Superlattice Structures", J. Surface Science 228, 527 (1990).
• JA-134. C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Oscillatory Density-of-States of Landau Bands in a Two-Dimensional Lateral Surface Superlattice", Solid State Communications 75, 395-399 (1990).
• JA-135. C.V. Thompson, J. Floro, and H.I. Smith, "Epitaxial Grain Growth in Thin Metal Films", J. Appl. Phys. 67, 4099-4104 (1990).
• JA-136. M.L. Schattenburg, E.H. Anderson, and H.I. Smith, "X-ray/VUV Transmission Gratings for Astrophysical and Laboratory Applications", Physica Scripta 41, 13-20 (1990).
• JA-137. J.A. del Alamo and C.C. Eugster, "Quantum Field-Effect Directional Coupler", Appl. Phys. Lett. 56, 78 (1990).]
• JA-138. P.F. Bagwell, "Evanescent Modes and Scattering in Quasi-One-Dimensional Wires", Phys. Rev. B 41, 354-371 (1990).
• JA-139. P.F. Bagwell, "Solution of Dyson's Equation in a Quasi-One-Dimensional Wire", J. Phy. Condens. Matter 2, 6179 (1990).
• JA-140. H.I. Smith and H.G. Craighead, "Nanofabrication", Physics Today pp. 24-30 February (1990).
• JA-141. H.I. Smith and D.A. Antoniadis, "Seeking a Radically New Electronics", Technology Review 93, pp. 26-40 (1990).
• JA-142. A. Toriumi, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, "Resonant Magneto-Capacitance in a Two-Dimensional Lateral-Surface Superlattice", Phys. Rev. B 41, 12346-12349 (1990).
• JA-143. S.B. Field, M.A. Kastner, U. Meirav, J.H.F. Scott-Thomas, D.A. Antoniadis, H.I. Smith, and S.J. Wind, "Conductance Oscillations Periodic in the Density of One-Dimensional Electron Gases", Phys. Rev. B 42, 3523-3536 (1990).
• JA-144. A. Kumar and P.F. Bagwell, "Resonant Tunneling in a Multi-Channel Wire", Solid State Communications, 75, 949-953 (1990).
• JA-145. P.F. Bagwell, T.P.E. Broekaert, T.P. Orlando, and C.G. Fonstad, "Resonant Tunneling Diodes and Transistors with a One-, Two-, or Three- Dimensional Electron Emitter", J. Appl. Phys. 68, 4634-4646 (1990).
• JA-146. [U. Meirav, M.A. Kastner, and S.J. Wind, "Single Electron Charging and Periodic Conductance Resonances in GaAs Nanostructures", Phys. Rev. Lett. 65, 771-774 (1990).]
• JA-147. M.L. Schattenburg, K. Early, Y.C. Ku, W. Chu, M.I. Shepard, S.C. The, H.I. Smith, D.W. Peters, R.D. Frankel, D.R. Kelly, and J.P. Drumheller, "Fabrication and Testing of 0.1 µm-Linewidth Microgap X-ray Masks", J. Vac. Sci. Technol. B 8, 1604-1608 (1990).
• JA-148. A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith, "A Compact, Low-Cost System for Sub-100 nm X-ray Lithography", J. Vac. Sci. Technol. B 8, 1648-1651 (1990).
• JA-149. [C.C. Eugster, J.A. del Alamo, and M.J. Rooks, "Transport in Novel Gated Quantum Wires: The Impact of Wire Length", Japanese J. Appl. Phys. 12, L2257-L2260 (1990).]
• JA-150. [A. Kumar, S.E. Laux, and F. Stern, "Electron States in a GaAs Quantum Dot in a Magnetic Field", Phys. Rev. B 42, 5166-5175 (1990).]
• JA-151. K. Ismail, M. Burkhardt, H.I. Smith, N.H. Karam, and P.A. Sekula-Moise, "Patterning and Characterization of Large-Area Quantum-Wire Arrays", Appl. Phys. Lett. 58, 1539-1541 (1991).
• JA-152. A. Kumar and P.F. Bagwell, "Resonant Tunneling in a Quasi-One-Dimensional Wire: Influence of Evanescent Modes", Phys. Rev. B 43, 9012-9020 (l991).
• JA-153. M.W. Geis, H. I. Smith, A. Argoitia, J. Angus, G.H.M. Ma, J.T. Glass, J. Butler, C.J. Robinson, and R. Pryor, "Large-Area Mosaic Diamond Films Approaching Single-Crystal Quality", Appl. Phys. Lett. 58, 2485 (1991).
• JA-154. C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Guiding-Center-Drift Resonance of Two-Dimensional Electrons in a Grid-Gate Superlattice Potential", Appl. Phys. Lett. 58, 2945-2947 (1991).
• JA-155. N.H. Karam, A. Mastrovita, V. Haven, K. Ismail, S. Pennycock, and H.I. Smith, "Patterning and Overgrowth of Nanostructure Quantum Well Wire Arrays by LP-MOVPE", J. Crystal Growth 107, 591-597 (1991).
• JA-156. W. Chu, H.I. Smith, M.L. Schattenburg, "Replication of 50 nm Linewidth Device Patterns using Proximity X-ray Lithography at Large Gaps", Appl. Phys. Lett. 59, 1641-1643 (1991).
• JA-157. K. Ismail, P.F. Bagwell, T.P. Orlando, D.A. Antoniadis, and H.I. Smith, "Quantum Phenomena in Field-Effect-Controlled Semiconductor Nanostructures", Proc. IEEE 79, 1106-1116 (1991).
• JA-158. M.L. Schattenburg, C.R. Canizares, D. Dewey, K.A. Flanagan, M.A. Hamnett, A.M. Levine, K.S.K. Lum, R. Manikkalingam, T.H. Markert, and H.I. Smith, "Transmission Grating Spectroscopy and the Advanced X-ray Astrophysics Facility", Optical Engineering 30, 1590 1600 (1991).
• JA-159. K. Ismail, F. Legoues, N.H. Karam, J. Carter, and H.I. Smith, "High Quality GaAs on Sawtooth-Patterned Si Substrates", Appl. Phys. Lett. 59, 2418-2420 (1991).
• JA-160. Y.C. Ku, L.-P. Ng, R. Carpenter, K. Lu, H.I. Smith, L.E. Haas, and I. Plotnik, "In-Situ Stress Monitoring and Deposition of Zero Stress W for X-ray Masks", J. Vac. Sci. Technol. B 9, 3297 3300 (1991).
• JA-161. A. Moel, W. Chu, K. Early, Y.C. Ku, E.E. Moon, F. Tsai, H.I. Smith, M.L. Schattenburg, C.D. Fung, F.W. Griffith, and L.E. Haas, "Fabrication and Characterization of High-Flatness Mesa-Etched Silicon Nitride X-ray Masks", J. Vac. Sci. Technol. B 9, 3287-3291 (1991).
• JA-162. H.I. Smith, S.D. Hector, M.L. Schattenburg, and E.H. Anderson, "A New Approach to High Fidelity E-Beam Lithography Based on an In-Situ, Global Fiducial Grid", J. Vac. Sci. Technol. B 9, 2992-2995 (1991).
• JA-163. E.H. Anderson, V.Boegli, M.L. Schattenburg, D.P. Kern, and H.I. Smith, "Metrology of Electron Beam Lithography Systems using Holographically Produced Reference Samples", J. Vac. Sci. Technol. B 9, 3606-3611 (1991).
• JA-164. M.L. Schattenburg, K. Li, R.T. Shin, J.A. Kong, D.B. Olster, and H.I. Smith, "Electromagnetic Calculation of Soft-X-ray Diffraction from 0.1 µm Scale Gold Structures", J. Vac. Sci. Technol. B 9, 3232-3236 (1991).
• JA-165. A. Kumar and P.F. Bagwell,"Evolution of the Quantized Ballistic Conductance with Increasing Disorder in Narrow-Wire Arrays", Phys. Rev. B44, 1747-1753 (1991).
• JA-166. C.C. Eugster and J.A. del Alamo, "Tunneling Spectroscopy of an Electron Waveguide", Phys. Rev. Lett. 67, 3586-3589 (1991).]
• JA-167. [P.L. McEuen, E.B. Foxman, U. Meirav, M.A. Kastner, Y. Meir, N.S. Wingree, and S.J. Wind, "Transport Spectroscopy of a Coulomb Island in the Quantum Hall Regime", Phys. Rev. Lett. 66, 1926-1929 (1991).]
• JA-168. K.W. Rhee, A.C. Ting, L.M. Shirley, K.W. Foster, J.M. Andrews, M.C. Peckerar, and Y.C. Ku, "Patterning Tungsten Films with an Electron Beam Lithogaphy System at 50 keV for X-ray Mask Applications", J. Vac. Sci. Technol. B 9, 3292-3296 (1991).
• JA-169. [U. Meirav, P.L. McEuen, M.A. Kastner, E.B. Foxman, A. Kumar, and S.J. Wind, "Conductance Oscillations and Transport Spectroscopy of a Quantum Dot", Z. Phys. B – Condensed Matter 85, 357-366 (1991).]
• JA-170. W. Chu, H.I. Smith, S.A. Rishton, D.P. Kern, and M.L. Schattenburg, "Fabrication of 50 nm Line-and-Space X-ray Masks in Thick Au using a 50 keV Electron Beam System", J. Vac. Sci. Technol. B 10, 118-121 (1992).
• JA-171. A. Yen, H.I. Smith, M.L. Schattenburg, and G.N. Taylor. "An Anti-Reflection Coating for use with PMMA at 193 nm", J. Electrochem. Soc., 139, 616-619 (1992).
• JA-172. [C.C. Eugster, J.A. del Alamo, M.J. Rooks, M.R. Melloch, "Split-Gate Dual-Electron Waveguide Device", Appl. Phys. Lett. 5, 642-644 (1992).]
• JA-173. Y. Zhao, D.C. Tsui, M. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, "Magneto-optical Absorption in a Two Dimensional Electron Grid", Appl. Phys. Lett. 12, 1510-1512 (1992).
• JA-174. A. Kumar, "Self-Consistent Calculations on Confined Electrons in Three-Dimensional Geometries", 9th Conf. on Electronic Properties of 2-D Systems, Nara, Japan, July 8-12, 91, Surface Science, 263, 335-340 (1992).
• JA-175. P.F. Bagwell, S.L. Park, A. Yen, D.A. Antoniadis, H.I. Smith, T.P. Orlando, and M.A. Kastner, "Magnetotransport in Multiple Narrow Silicon Inversion Channels Opened Electrostatically into a Two-Dimensional Electron Gas", Phys. Rev. B 45, 9214-9221 (1992).
• JA-176. A. Yen, M.L. Schattenburg, and H.I. Smith, "Proposed Method for Fabricating 50 nm-period Gratings by Achromatic Holographic Lithography", Applied Optics 31, 2972-2973 (1992).
• JA-177. A. Yen, E.H. Anderson, R.A. Ghanbari, M.L. Schattenburg, and H.I. Smith, "Achromatic Holographic Configuration for 100 nm Period Lithography", Applied Optics 31, 4540-4545 (1992).
• JA-178. [M.A. Kastner, "The Single Electron Transistor", Rev. Mod. Phys. 64, 849 (1992).]
• JA-179. J.M. Carter, D.B. Olster, M.L. Schattenburg, A. Yen, and H.I. Smith, "Large-Area, Free-Standing Gratings for Atom Interferometry Produced using Holographic Lithography", J. Vac. Sci. Technol. B 10, 2909-2911 (1992).
• JA-180. Y.C. Ku, M.H. Lim, J.M. Carter, M.K. Mondol, A. Moel, and H.I. Smith, "Correlation of In-Plane and Out-of-Plane Distortion in X-ray Lithography Masks", J. Vac. Sci. Technol. B 10, 3169-3172 (1992).
• JA-181. S.D. Hector, M.L. Schattenburg, E.H. Anderson, W. Chu, V.V. Wong, and H.I. Smith, "Modeling and Experimental Verification of Illumination and Diffraction Effects on Image Quality in X-ray Lithography", J. Vac. Sci. Technol. B 10, 3164-3168 (1992).
• JA-182. G.E. Rittenhouse, K. Early, B.S. Meyerson, H.I. Smith, and J.M. Graybeal, "Novel Vertical Silicon-Membrane Structure and Its Application to Josephson Devices", J. Vac. Sci. Technol. B 10, 2860-2863 (1992).
• JA-183. W. Chu, C.C. Eugster, A. Moel, E.E. Moon, J.A. del Alamo, H.I. Smith, M.L. Schattenburg, K.W. Rhee, M.C. Peckerar, and M.R. Melloch, "Conductance Quantization in a GaAs Electron Waveguide Device Fabricated by X-ray Lithography", J. Vac. Sci. Technol. B 10, 2966-2969 (1992).
• JA-184. R.A. Ghanbari, W. Chu, E.E. Moon, M. Burkhardt, K. Yee, D.A. Antoniadis, H.I. Smith, M.L. Schattenburg, K.W. Rhee, R. Bass, M.C. Peckerar, and M.R. Melloch, "Fabrication of Parallel Quasi-One-Dimensional Wires using a Novel Conformable X-ray Mask Technology", J. Vac. Sci. Technol. B 10, 3196-3199 (1992).
• JA-185. R.A. Ghanbari, M. Burkhardt, D.A. Antoniadis, H.I. Smith, M.R. Melloch, K.W. Rhee, and M.C. Peckerar, "Comparative Mobility Degradation in Modulation-Doped GaAs Devices after E-beam and X-ray Irradiation", J. Vac. Sci. Technol. B 10, 2890-2892 (1992).
• JA-186. K.W. Rhee, D.I. Ma, M.E. Peckerar, R.A. Ghanbari, and H.I. Smith, "Proximity Effect Reduction in X-ray Mask Making using Thin Silicon Dioxide Layers", J. Vac. Sci. Technol. B 10, 3062-3066 (1992).
• JA-187. H.I. Smith, M.L. Schattenburg, "X-ray Lithography, from 500 to 30 nm: X-ray Nanolithography", IBM Journal of Research & Development 37, 319-329 (1993).
• JA-188. Y. Zhao, D.C. Tsui, M. Santos and M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, Henry I. Smith, and K. Kempa, "Mode Softening in the Far Infrared Excitation of Quantum Wire Arrays", Phys. Rev. B 48, 5249-5255 (1993).
• JA-189. A. Moel, E.E. Moon, R. Frankel, and H.I. Smith, "Novel On-axis Interferometric Alignment Method with Sub-10 nm Precision", J. Vac. Sci. Technol. B 11, 2191-2194 (1993).
• JA-190. J. Ferrera, V.V. Wong, S. Rishton, V. Boegli, E.H. Anderson, D.P. Kern, and H.I. Smith, "Spatial-Phase-Locked Electron-Beam Lithography: Initial Test Results", J. Vac. Sci. Technol. B 11, 2342-2345 (1993).
• JA-191. V.V. Wong, W.-Y. Choi, J. Carter, C.G. Fonstad, and H.I. Smith, "Ridge-Waveguide Sidewall-Grating Distributed Feedback Structures Fabricated by X-ray Lithography", J. Vac. Sci. Technol. B 11, 2621-2624 (1993).
• JA-192. N. Gupta, S.D. Hector, K.W. Rhee, and H.I. Smith, "Fabrication of 100 nm T-Gates for Monolithic Microwave Integrated Circuits using X-ray Lithography", J. Vac. Sci. Technol. B 11, 2625-2628 (1993).
• JA-193. M.L. Schattenburg, N.A. Polce, and H.I. Smith, "Fabrication of Flip-Bonded Mesa Masks for X-ray Lithography", J. Vac. Sci. Technol. B 11, 2906-2909 (1993).
• JA-194. A.W. Yanof, G.L. Zipfel, and E.E. Moon, "X-ray Mask Membrane Motion in Narrow Gap Lithography: Hydrodynamic Model and Experiment", J. Vac. Sci. Technol. B 11, 2920-2925 (1993).
• JA-195. S.D. Hector, H.I. Smith, and M.L. Schattenburg, "Simultaneous Optimization of Spectrum, Spatial Coherence, Gap, Feature Bias, and Absorber Thickness in Synchrotron-Based X-ray Lithography", J. Vac. Sci. Technol. B 11, 2981-2985 (1993).
• JA-196. C.O. Bozler, C.T. Harris, S.Rabe, D.D. Rathman, W.D. Goodhue, M.A. Hollis, and H.I. Smith, "Arrays of Gated Field-Emitter Cones having 0.32 µm Tip-to-Tip Spacings", J. Vac. Sci. Technol. B 12, 629-632 (1994).
• JA-197. M. Burkhardt, H.I. Smith, D.A. Antoniadis, T.P. Orlando, M.R. Melloch, K.W. Rhee, and M.C. Peckerar, "Fabrication Using X-ray Nanolithography and Measurement of Coulomb Blockade in a Variable-Sized Quantum Dot", J. Vac. Sci. Technol. B 12, 3611-3613 (1994).
• JA-198. I.Y. Yang, H. Hu, L.T. Su, V.V. Wong, M. Burkhardt, E. Moon, J. Carter, D.A. Antoniadis, H.I. Smith, K.W. Rhee, and W. Chu, "High Performance Self-Aligned Sub-100 nm MOSFETs Using X-ray Lithography", J. Vac. Sci. Technol. B 12, 4051-4054 (1994).
• JA-199. M. Mondol, H. Li, G. Owen, and H.I. Smith, "Uniform-Stress Tungsten on X-ray Mask Membranes via He-Backside Temperature Homogenization", J. Vac. Sci. Technol. B 12, 4024-4027 (1994).
• JA-200. S.D. Hector, V.V. Wong, H.I. Smith, M.A. McCord, A. Wagner, and K.W. Rhee, "Printability of sub-150 nm features in X-ray Lithography: theory and experiments", J. Vac. Sci. Technol. B 12, 3965-3969 (1994).
• JA-201. V.V. Wong, J. Ferrera, J. Damask, J. Carter, E. Moon, H.A. Haus, H.I. Smith, and S. Rishton, "Spatial-Phase Locked E-Beam Lithography and X-ray Lithography for Fabricating First-Order Gratings on Rib Waveguides", J. Vac. Sci. Technol. B 12, 3741-3745 (1994).
• JA-202. J.Z.Y. Guo, G.K. Celler, J.R. Maldonado, and S.D. Hector, “Wavelength Dependence of Exposure Window and Resist Profile in X-Ray Lithography”, J. Vac. Sci. Technol. B 12, 4044-4050 (1994).
• JA-203. H. Hu, J.B. Jacobs, J.E. Chung, and D.A. Antoniadis, “The Correlation between Gate Current and Substrate current in 0.1 um NMOSFETs”, IEEE Elec. Dev. Lett. 11, 418 (1994).
• JA-204. Y. Zhao, D.C. Tsui, M.B. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, “Grating-Induced Cyclotron-Resonance Anomaly in GaAs/Al1Ga1-x As Heterostructures”, Phys. Rev. B51, 13174 (1995).
• JA-205. M. Grayson, D.C. Tsui, M. Shayegan, K. Hirakawa, R.A. Ghanbari, and H. I. Smith, “Far-infrared Emission from Hot Quasi-One-Dimensional Quantum Wires in GaAs”, Appl. Phys. Lett. 67. 1564 (1995).
• JA-206. T.A. Savas, S.N. Shah, M.L. Schattenburg, J.M. Carter, and H.I. Smith, "Achromatic-Interferometric Lithography for 100nm-Period Gratings and Grids", J. Vac. Sci. Technol. B 13(6), 2732-2735 (1995).
• JA-207. I.Y. Yang, S. Silverman, J. Ferrera, K. Jackson, J.M. Carter, D.A. Antoniadis, and H.I. Smith,, "Combining and Matching Optical, E-beam and X-ray Lithographies in the Fabrication of Si CMOS Circuits with 0.1 and Sub-0.1µm Features", J. Vac. Sci. Technol. B 13, 2741-2744 (1995).
• JA-208. R.J. Aucoin and M.L. Schattenburg, "Optically-Matched Tri-Level Resist Process for Nanostructure Fabrication", J. Vac. Sci. Technol. B 13, 3007-3011 (1995).
• JA-209. E.E. Moon, P.N. Everett, and H.I. Smith, “Immunity to Signal Degradation by Overlayers Using a Novel Spatial-Phase-Matching Alignment System”, J. Vac. Sci. Technol. B 13, 2648-2652 (1995).
• JA-210. V.V. Wong, J. Ferrera, J.N. Damask, T.E. Murphy, and H.I. Smith, “Distributed Bragg Grating Integrated Optical Filters; Synthesis and Fabrication”, J. Vac. Sci. Technol. B 13, 2859-2864 (1995).
• JA-211. V.V. Wong, A. Yasaka, and H.I. Smith, “Resist Planarization over Topography using Ion Implantation”, J. Vac. Sci. Technol. B 13, 2797-2800 (1995).
• JA-212. H.I. Smith, “100 Years of X-rays: Impact on Micro- and Nanofabrication”, J. Vac. Sci. Technol. B 13, 2323-2328 (1995).
• JA-213. M.J. Rooks, R.C. Tiberio, M. Chapman, T. Hammond, E. Smith, A. Lenef, R. Rubenstein, D. Pritchard, S. Adams, J. Ferrera, J.M. Carter, and H.I. Smith, "Coherence and Structural Design of Free-Standing Gratings for Atom-Wave Optics", Japan J. Appl. Phys. 34, 6935-6939 (1995).
• JA-214. H.I. Smith, “X-ray Lithography for Microelectronics”, Physics Scripta, 61, 26-31 (1996).
• JA-215. H.I. Smith, M.L. Schattenburg, S.D. Hector, J. Ferrera, E.E. Moon, I.Y. Yang, and M. Burkhardt, “X-ray Nanolithography: Extension to the Limits of the Lithographic Process”, Microelectronic Engineering 32, 143-158 (1996).
• JA-216. E.E. Moon, P.N. Everett, K. Rhee, and H.I. Smith, “Simultaneous Measurement of Gap and Superposition in a Precision Aligner for X-ray Nanolithography,” J. Vac. Sci. Technol. B 14, 3969-3973 (1996).
• JA-217. J. Ferrera, M.L. Schattenburg, and H.I. Smith, “Analysis of Distortion in Interferometric Lithography”, J. Vac. Sci. Technol. B 14, 4009-4013 (1996).
• JA-218. I.Y. Yang, D.A. Antoniadis, and H.I. Smith, “Fabrication of Back-gated CMOS Devices Using Mixed and Matched Optical and X-ray Lithographies,” J. Vac. Sci. Technol. B 14, 4024-4028 (1996).
• JA-219. T.A. Savas, M.L. Schattenburg, J.M. Carter, and H.I. Smith, “Large-Area Achromatic Interferometric Lithography for 100nm-Period Gratings and Grids; With Novel Applications,” J. Vac. Sci. Technol. B 14, 4167-4170 (1996).
• JA-220. H.I. Smith, “A Proposal for Maskless, Zone-Plate-Array Nanolithography,” J. Vac. Sci. Technol. B 14, 4318-4322 (1996).
• JA-221. J. Damask, “Practical Design of Side-Coupled Quarter-Wave Shifted Distributed-Bragg Resonant Filters,” J. Lightwave Tech. 14(5), 812-821 (1996).
• JA-222. H.I. Smith and F. Cerrina, "X-ray Lithography for ULSI manufacturing?" Microlithography World 6(1), 10-15 (1997).
• JA-223. J.S. Foresi, P.R. Villeneuve, J. Ferrera, E.R. Thoen, G. Steinmeyer, S. Fan, J.D. Joannopoulos, L.C. Kimerling, H.I. Smith, E.P. Ippen, “Photonic-Band-Gap Waveguide Microcavities,” Nature, 390, 143-145, (1997).
• JA-224. J. Goodberlet, J. Ferrera, and H.I. Smith, “An Analogue Delay-Locked Loop for Spatial-Phase Locking”, Electronics Letters, 33 (15) 1269-1270 (1997).
• JA-225. E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, H.I. Smith, K.M. Matney, G.D. U’Ren, and M.S. Goorsky, “Preservation of Rectangular-Patterned InP Gratings Overgrown by Gas Source Molecular Beam Epitaxy,” Appl. Phys. Lett. 71 (10), 1400-1402 (1997)
• JA-226. B.E. Little & T.Murphy, “Design Rules for Maximally Flat Wavelength-Insensitive Optical Power Dividers Using Mach-Zehnder Structures”, IEEE Photonics Technology Letters, 9 (12), 1607-1609 (1997).
• JA-227. J. Goodberlet, J. Ferrera, and H.I. Smith, “Spatial-phase-locked electron-beam lithography with a delay-locked loop,” J. Vac. Sci. Technol. B, 15(6), 2293-2297 (1997).
• JA-228. D.J.D. Carter, A. Pepin, M.R. Schweizer, and H.I. Smith, “Direct Measurement of the effect of substrate photoelectrons in x-ray nanolithography,” J. Vac. Sci. Technol. B, 15(6), 2509-2513 (1997).
• JA-229. D. Berman, N. Zhitenev, R.C. Ashoori, and H.I. Smith, “The Single Electron Transitor as a Charge Sensor in Semiconductor Applications,” J. Vac. Sci. Technol. B, 15(6), 2844-2847 (1997).
• JA-230. A.E. Franke, M.L. Schattenburg, E.M. Gillikson, J. Cottam, S.M. Kahn and A. Rasmussen, “Super-Smooth X-Ray Reflection Grating Fabrication,” J. Vac. Sci. Technol. B, 15(6), 2940-2945 (1997).
• JA-231. M. Farhoud, M.M. Hwang, H.I. Smith, J.M. Bae, K. Youcef-Toumi and C.A. Ross, “Fabrication of Large Area Nanostructured Magnets by Interferometric Lithography.” IEEE Trans. Magn. 34, 1087-1089 (1998). (MMM/Intermag Conference 1/98)
• JA-232. J. Goodberlet, J. Ferrera, M. Farhoud, V.Z. Chan, and H.I. Smith, “Extending Spatial-Phase-Locked Electron-Beam Lithography to Two Dimensions,” Japanese Journal of Applied Physics 36, 7557-7559 (1997), Part 1, No 12B (1997).
• JA-233. G.D. U’Ren, M.S. Goorsky, E.M. Koontz, M.H. Lim, G.S. Petrich, L.A. Kolodziejski, V. V. Wong, Henry I. Smith, K.M. Matney and. M Wormington, “Analysis of Lattice Distortions in High Quality InGaAsP Epitaxial Overgrowth of Rectangular-Patterned InP Gratings”, J. Vac. Sci. Technol. B 16(3), (1998).
• JA-234. C.A. Ross and H. I. Smith, “Patterned Media: 200 Gb/in2 or bust”, Data Storage, 5 (10), 41-48, (1998). (invited)
• JA-235. W. Schollkopf, J.P. Toennies, T.A. Savas and H.I. Smith, “A Cluster Size Nanofilter with Variable Openings between 2 and 50nm”, Journal of Chemical Physics, 109 (21), 9252-9257, (1998).
• JA-236. I. Djomehri, T. Savas, and H.I. Smith, “Zone-Plate-Array Lithography in the Deep Ultraviolet”, J. Vac Sci. Technol. B, 16(6), 3426-3429, (1998).
• JA-237. E. Moon, J. Lee, P. Everett and H.I. Smith, “Application of Interferometric Broadband Imaging Alignment on an Experimental X-ray Stepper”, J. Vac Sci. Technol. B 16(6), 3631-3636, (1998).
• JA-238. J. Goodberlet, J. Carter and H.I. Smith, “A Scintillating Global-Fiducial Grid for Electron-Beam Lithography”, J. Vac. Sci. Technol. B 16(6), 3672-3675, (1998).
• JA-239. J.T.M. Van Beek, R.C. Fleming, P.S. Hindle, J.D. Prentiss and M.L. Schattenburg, “Nano-scale freestanding gratings for UV blocking filters”, J. Vac. Sci. Technol. B 16(6), 3911-3916, (1998).
• JA-240. D.J. Twisselmann, M. Farhoud, H.I. Smith and C.A. Ross, “In-Plane Magnetic Anisotropy in CoCrPt and CoCrTa Films Deposited Onto Patterned Silicon Substrates”, J. Appl. Physics, 85, 4292-4294 (1999).
• JA-241. T.A. Savas, M. Farhoud, H. I. Smith, M. Hwang, and C.A. Ross, “Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography” J. Appl. Physics, 85, 6160-6162 (1999).
• JA-242. K-Y Lim, D.J. Ripin, G.S. Petrich, L.A. Kolodziejski, E.P. Ippen, M. Mondol, H.I. Smith, P.R. Villeneuve, S. Fan, J.D. Joannopoulos, “Photonic bandgap waveguide microcavities: monorails and air-bridges”, J. Vac. Sci. Technol. B 17(3), 1171--1174(1999)
• JA-243. E.M. Koontz, G.D. U’Ren, M.H. Lim, L.A. Kolodziejski, M.S. Goorsky, G.S. Petrich, and Henry I. Smith, “Overgrowth of (In,Ga)(As,P) on Rectangular-Patterned Surfaces Using Gas Source Molecular Beam Epitaxy”, J. Crystal Growth 198/199, 1104—1110 (1999).
• JA-244. J.O. Choi, H.S. Jeong, D.G. Pflug, A.I. Akinwande and H.I. Smith, “Fabrication of 0.1 ?m gate aperture Mo-tip field-emitter arrays using interferometric lithography” Appl. Phy. Lett., 74 (20), 3050-3052 (1999).
• JA-245. M.L. Schattenburg, C. Chen, P.N. Everett, J. Ferrera, P. Konkola, and Henry I. Smith, “Sub-100 nm metrology using interferometrically produced fiducials (invited), J. Vac. Sci. Technol. B 17(6), 2692-2697 (1999).
• JA-246. E.E. Moon, P. N. Everett, M. Meinhold, M. Mondol and Henry I. Smith, “A Novel Mask-Wafer Gap-Measurement Scheme with Nanometer-Level Detectivity”, J. Vac. Sci. Technol. B, 17(6), 2698-2702 (1999).
• JA-247. M.H. Lim, T.E. Murphy, J. Ferrera, J.N. Damask and Henry I. Smith, “Fabrication Techniques for Grating-Based Optical Devices”, J. Vac. Sci. Technol. B, 17(6), 3208-3211 (1999).
• JA-248. M.H. Lim, J. Ferrera, K.P. Pipe and Henry I. Smith, “A Holographic Phase-Shifting Interferometer Technique to Measure In-Plane Distortion”, J. Vac. Sci. Technol. B 17(6), 2703-2706 (1999).
• JA-249. D.J.D. Carter, D. Gil, R. Menon, M. Mondol and Henry I. Smith, “Maskless, Parallel Patterning with Zone-Plate Array Lithography (ZPAL), J. Vac. Sci. Technol. B 17(6) 3449-3452 (1999).
• JA-250. M. Farhoud, J. Ferrera, A.J. Lochtefeld, M.L. Schattenburg, C.A. Ross and Henry I. Smith, “Fabrication of 200 nm period nanomagnet arrays using interferometric lithography and a negative resist”, J. Vac. Sci. Technol. B, 17(6), 3182-3185 (1999).
• JA-251. C. A. Ross, H.I. Smith, T. Savas, M. Schattenburg, M. Farhoud, M. Hwang, M. Walsh, M. Abraham, R. Ram, “Fabrication of Patterned Media for High Density Magnetic Storage (invited)”, J. Vac. Sci. Technol. B, 17(6) 3168-3176 (1999).
• JA-252. R.E. Grisenti, W. Schollkopf, J.P. Toennies, G.C. Hegerfeldt and T. Kohler, “Determination of Atom-Surface van der Waals Potentials from Transmission-Grating Diffraction Intensities”, Phys,. Rev. Let., 83(9), 1755-1758 (1999).
• JA-253. C.A. Ross, T.A. Savas, H.I. Smith, M. Hwang and R. Chantrell, “Modelling of Hysteresis Loops of Arrays of 100 nm Period Nanomagnets”, IEEE. Trans. Magnetics, 35, 3781 (1999).
• JA-254. R.E. Grisenti, W. Schoellkopf, J.P. Toennies, J.R. Manson, T.A. Savas and H.I. Smith, “He Atom Diffraction from Nanostructured Transmission Gratings: The Role of Imperfections”, Phys. Rev. A. 61, 033608-1-033608-15 (2000).
• JA-255. James G. Goodberlet, “Patterning 100 nm features using deep-ultraviolet contact photolithography”, Appl. Phy. Lett. 76(6) 667-669, (2000).
• JA-256. M. Farhoud, H.I. Smith, M. Hwang and C.A. Ross, “The effect of aspect ratio on the magnetic anisotropy of particle arrays”, J. Appl. Phys., 87(9) 5120-5122 (2000).
• JA-257. R.E. Grisenti, W. Schollkopf, J.P. Toennis, G.C. Hegerfeldt, T. Kohler and M. Stoll, “Determination of the Bond Length and Binding Energy of the Helium Dimer by Diffraction from a Transmission Grating”, Phys. Rev. Let., 85(11), 2284—2287 (2000).
• JA-258. C.R. Canizares, D.P. Huenemoerder, D.S. Davis, D. Dewey, K.A. Flanagan, J. Houck, T.H. Markert, H.L. Marshall, M.L. Schattenburg, N.S. Schulz, M. Wise, J.J. Drake and N.S. Brickhouse, “High Resolution X-Ray Spectra of Capella: Initial Results from the Chandra High Energy Transmission Grating Spectrometer”, Astrophysical Journal Letters 539, L41-L44 (2000); also, proeedings from the Atomic Data Needs for X-ray Astronomy Meeting, NASA Publications, Vol. 1, Bautista, Kallman and Pradhan, eds. (2000).
• JA-259. Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann and Mark L. Schattenburg, “Beam Steering System and Spatial Filtering Applied to Interference Lithography”, J. Vac. Sci. Technol. B 18(6), 3282-3286, (2000).
• JA-260. Dario Gil, Rajesh Menon, D. J. D. Carter and Henry I. Smith, “Lithographic Patterning and Confocal Imaging with Zone Plates, ”J. Vac. Sci. Technol. B 18(6), 2881-2885, (2000).
• JA-261. Ken-Ichi Murooka, Michael H. Lim, and Henry I. Smith, “Membrane-mask distortion correction: Analytical and experimental results”, J. Vac. Sci. Technol. B 18(6), 2966- 2969, (2000).
• JA-262. J. T. Hastings, Feng Zhang, James Goodberlet, and Henry I. Smith, “Two-Dimensional Spatial-Phase-Locked Electron-Beam Lithography via sparse Sampling, ”, J. Vac. Sci. Technol. B 18(6), 3268-3271, (2000).
• JA-263. Thomas E. Murphy, Mark K. Mondol and Henry I. Smith, “Characterization of field stitching in e-beam lithography using moiré metrology”, J. Vac. Sci. Technol. B 18(6), 3287-3291, (2000).
• JA-264. Ralf K. Heilmann, Paul T. Konkola, Carl G. Chen and Mark L. Schattenburg, “Relativistic corrections in displacement measuring interferometry”, J. Vac. Sci. Technol. B 18(6), 3277-3281, (2000).
• JA-265. Michael E. Walsh, Yaowu Hao, Caroline A. Ross and Henry I. Smith, “Optimization of a lithographic and ion beam etching process for nanostructuring magnetic resistive thin film stacks”, J. Vac. Sci. Technol. B 18(6), 3539-3543, (2000).
• JA-266. C.A. Ross, R. Chantrell, M. Hwang, M. Farhoud, T.A. Savas, Y. Hao, Henry I. Smith, F.M. Ross, M. Redjdal, F. Humphrey, “Incoherent magnetization reversal observed in 30 nm Ni particles”, Phys. Rev. B. 62(21), 14 252- 14 258, (2000).
• JA-267. Carl G. Chen, Ralf K. Heilmann, Paul T. Konkola, Oliver Mongrard, Glen P. Monnelly, and Mark L. Schattenburg, “Microcomb Design and Fabrication for High Accuracy Optical Assembly”, J. Vac. Sci. Technol. B 18(6), 3272-3276, (2000).
• JA-268. C.A. Ross, M. Farhoud, M. Hwang, Henry I. Smith, M. Redjdal, F.B. Humphrey, “Micromagnetic behavior of conical ferromagnetic particles”, J. Appl. Phys, 89, 1310-1319, (2000).
  JA-269. M. Hwang, M.C. Abraham, T.A. Savas, H.I. Smith, R.J. Ram and C.A. Ross, “Magnetic force microscopy study of interactions in 100 nm period nanomagnet arrays”, J. Appl. Phys. 87 5108-10 (2000).
• JA-270. J-Q Wang, L. M. Malkinski, Y. Hao, C. A. Ross, J. A. Wiemann, C. J. O’Connor, “Fabrication of pseudo-spin-valves and 100 nm sized periodic elements for magnetic memory application”, Materials Science and Enginering B76, 1-5 (2000).
• JA-271. Douglas J. Twisselmann, Yuh-Jer Shine, and C. A. Ross, “Correlation of Stress and Magnetic Anisotropy in CoCrPt/Cr Films Grown on Textured Substrates”, IEEE Trans. Mag. 36(5), (2000).
• JA-272. C-C. Hsu, R. S. Indeck, A. Jander, M. W. Muller, C. A. Ross and D. J. Twisselmann, “MFM observation of magnetization reversal rocess in recording media with lithographically defined texture”, IEEE Trans. Magn. 36, 2327-2329, (2000).
• JA-273. C. A. Ross, S. Haratani, F. J. Castano, B. Vogeli, S. Sumita, “Fabrication of MRAM structure and their magnetic properties”, J. f the Society of Materials Engineering for Resources of Japan 14, 43-51, (2001).
• JA-274. H. I. Smith, "Japan could dominate industry with X-ray lithography", Semiconductor International, Vol. 24, No. 2, pp. 67--72 (2001)
• JA-275. S. S. Yi, P. D. Moran, X. Zhang, F. Cerrina, J. Carter, H.I. Smith, T.F. Kuech, "Oriented crystallization of GaSb on a patterned, amorphous Si substrate", App. Phys. Lett. 78(10), 1358-1360 (2001).
• JA-276. M.C. Abraham, H. Schmidt, T.A. Savas, Henry I. Smith, C.A. Ross, R.J. Ram, “Magnetic Properties and Interactions of Single Domain nanomagnets in a periodic array”, J. Appl. Phys. 89(10), 5667-5670, (2001).
• JA-277. T. E. Murphy, J. T. Hastings and Henry I. Smith, “Fabrication and Characterization of Narrow-Band Bragg-Reflection Filters in Silicon-on-Insulator Ridge Waveguides”, Journal of Lightwave Technology, 19(12) 1938-1942, (2001).
• JA-278. J. T. Hastings, J. G. Goodberlet and Henry I. Smith, "Performance of the Raith-150 Electron-Beam lithography System", J. Vac. Sci. Technol. B 19(6), 2499-2503 (2001).
• JA-279. Michael E. Walsh, Henry I. Smith, “Method for Reducing Hyperbolic Phase In Interference Lithography”, J. Vac. Sci. Technol. B 19(6), 2347-2352 (2001).
• JA-280. B. Vogeli and Henry I. Smith, "Patterning processes for fabricating sub-100 nm pseudo-spin valve structures", J. Vac. Sci. Technol. B 19(6), 2753-2756 (2001).
• JA-281. J.O. Choi, A.I. Akinwande and H. I. Smith, “100 nm gate hole openings for low voltage driving field emission display applications”, J. Vac. Sci. Technol. B 19(3), 900-903 (2001).
• JA-282. Ken-ichi Murooka, Michael H. Lim and Henry I. Smith, “Calculational study on membrane mask distortion and correction”, J. Vac. Sci. Technol. B 19(4), 1229-1234 (2001).
• JA-283. F. J. Castano, B. Vogeli, Y. Hao, S. Haratani, M. Hwang, H. I. Smith, and C. A. Ross, "Magnetization Reversal in Sub-100 nm Pseudo-Spin-Valve Element Arrays", Appl. Phys. Lett. 79(10), 1504-1506 (2001).
• JA-284. F. J. Castano, Y. Hao, S. Haratani, C. A. Ross, B. Vogeli, M. Walsh, Henry I. Smith, "Magnetic Switching in 100 nm Patterned Pseudo Spin Valves" IEEE Trans. Mag.37(4), 2073-2075 (2001).
• JA-285. H. I. Smith, "Low cost nanolithography with nanoaccuracy", Physica E, Vol. 11, 104-109 (2001).
• JA-286. A. A. Erchak, D. J. Ripin, S. Fan, P. Rakich, J.D. Joannopoulos, E. Ippen, G.S. Petrich and L. Kolodziejski, “Enhanced coupling to vertical radiation using a two-dimensional photonic crystal in a semiconductor light-emitting diode”, Appl. Phys. Let., 78(5), 563-565 (2001).
• JA-287. Mark L. Schattenburg, “From nanometers to gigaparsecs: The role of nanostructures in unraveling the mysteries of the cosmos”, J. Vac. Sci. Technol. B 19(6), 2319-2328, (2001).
• JA-288. J. Y. Cheng, C. A. ross, V. Z. H. Chan, E. L. Thomas, R. G. H. Lampertink and G. J. Vancso, “Fabrication of nanopatterned thin films using self-assembled block copolymer lithography”, Adv. Mater. 13, 1174-1178 (2001).
• JA-289. S. L. Whittenburg, N. Dao, C. A. Ross, “Micromagnetic studies of hysteresis in nickel pillars”, Physica B 306, 44-46 (2001).
• JA-290. C. A. Ross, M. Hwang, M. Shima, J. Y. Cheng, M. Farhoud, T. A. Savas, Henry I. Smith, W. Schwarzacher, F. M. Ross, M. Redjdal and F. B. Humphrey, “Micromagnetic behavior of electrodeposited cylinder arrays”, Physical Review B 65, 144417-1-144417-8 , (2002).
• JA-291. K-I. Murooka, M.H. Lim, Henry I. Smith, “Membrane Mask Magnification Correction: An Alternate Technique”, J. Vac. Sci. Technol. B 20(1), 370-372 , (2002).
• JA-292. K-I. Murooka, M.H. Lim, Henry I. Smith, “Effect of thermal diffusion on a membrane-mask-distortion correction and compensation method”, J. Vac. Sci. Technol. B 20(2), 721-724 (2002).
• JA-293. Masaki Yoshizawa and T. A. Savas, “A Feasibility Study of 50 nm Resolution with Low Energy Electron Beam Proximity Projection Lithography”, Jpn. J. Appl. Phys. 41, 87-88, (2002).
• JA-294. M. Peuker, M.H. Lim, Henry I. Smith, R. Morton, A.K. van Langen-Suurling, J. Romijn, E.W.J.M. van der Drife, F.C.M.J.M. van Delft, “Hydrogen Silses Quioxane, a High Resolution Negative Tone e-beam Resis, Investigated for its Applicability in Photon Based Lithographies”, Microelectronic Engineering, 61-62, 803-809, (2002).
• JA-295. C. A. Ross, S. Haratani, F. J. Castano, Y. Hao, B. Vogeli, M. Farhoud, M. Walsh and Henry I. Smith, “Magnetic behavior of lithographically patterned particle arrays (invited), J. Appl. Phys. 91(10), 6848-6853, (2002).
• JA-296. Hans-Jurgen Eisler, Vikram C. Sundar, Moungi G. Bawendi, Michael Walsh, Henry I. Smith, Victor Klimov, “Color-Selective Semiconductor Nanocrystal Laser”, Appl. Phy. Lett., 80(24) 4614-4616, (2002).
• JA-297. F. J. Castano, S. Haratani, Y. Hao, C. A. Ross, Henry I. Smith, “Giant magnetoresistance in 60-150-nm-wide pseudo-spin-valve nanowires”, Appl. Phys. Lett. 81(15), 2809-2811, (2002).
• JA-298. Y. Hao, F. J. Castano, C. A. Ross, b. Vogeli, M. E. Walsh, Henry I. Smith, “Magnetization reversal in lithographically patterned sub-200-nm Co particle arrays”, J. Appl. Phys. 91(10), 7989-7991, (2002).
• JA-299. F. J. Castano, Y. Hao, C. A. Ross, B. Vogeli S. Haratani, and Henry I. Smith, “Switching field trends in pseudo spin valve nanoelement arrays”, J. Appl. Phys. 91(10), 7317-7319, (2002).
• JA-300. James G. Goodberlet and Hamide Kavak, “Patterning Sub-50 nm features with near-field embedded-amplitude masks”, Appl. Phys. Lett. 81(7), 1315-1317, (2002).
• JA-301. C. A. Ross, M. Hwang, M. Shima, Henry I. Smith, M. Farhoud, T. A. Savas, W. Schwarzacher, J. Parrochon, W. Esoffier, H. Neal Bertram, F. B. Humphrey and M. Redjdal, “Magnetic properties of arrays of electrodeposited nanowires”, Journal of Magnetism and Magnetic Materials 249, 200-207, (2002).
• JA-302. J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, R.G.H. Lammertink and G.J. Vancso, “Magnetic Properties of Large-Area Particle Arrays Fabricated using Block Copolymer Lithography”, IEEE Transactions of Magnetics, Vol. 38(5) 2541-2543, (2002).
• JA-303. M. Qi and Henry I. Smith, “Achieving nanometer-scale, controllable pattern shifts in x-ray lithography using an assembly-tilting technique”, J. Vac. Sci. Technol. B 20(6), 2991 – 2994, (2002).
• JA-304. J.T. Hastings, M.H. Lim, J.G. Goodberlet and Henry Smith, “Optical Waveguides with Apodized Sidewall Gratings via spatial-phase-locked electron-beam lithography”, J. Vac. Sci. Technol. B 20(6), 2753-2757, (2002).
• JA-305. Chulmin Joo, G.S. Pati, P. K. Konkola, C. G. Chen, R. Heilmann, E.H. Anderson, Mark Schattenburg, “Precision fringe metrology using a Fresnel zone plate”, J. Vac. Sci. Technol. B 20(6), 3075-3079, (2002).
• JA-306. C. G. Chen, R. K. Heilmann, C. Joo, P. T. Konkola, G.S. Pati and Mark L. Schattenburg, “Beam alignment for scanning beam interference lithography”, J. Vac. Sci. Technol. B 20(6), 3071-3074, (2002).
• JA-307. G. S. Pati, P.T. Konkola, C. G. Chen, C. Joo, R. K. Heilmann and M. L. Scattenburg, “Generalized scanning beam interference lithography system for patterning gratings with variable period progressions”, J. Vac. Sci. Technol. B 20(6), 2617-2621, (2002).
• JA-308. Dario Gil, D.J.D. Carter, R. Menon, X. Tang and Henry I. Smith, “Parallel maskless optical lithography for prototyping, low-volume production, and research”, J. Vac. Sci. Technol. B 20(6), 2597-2601, (2002).
• JA-309. M. Yoshizawa, “Sub-50 nm Stencil Mask for Low-Energy Electron-Beam Projection Lithography, J. Vac. Sci. Technol. B 20(6), 3021-3024, (2002).
• JA-310. R.A. Forber, Z.W. Chen, S. Mrowka, C.G. Gaeta, K. Cassidy, H.I. Smith and I.C.E. Turcu, JMAR Research Inc., San Diego, CA, X-Ray Optical Systems, Albany, NY, and MIT, Cambridge, MA, “Collimated Point-Source X-ray Nanolithography”, J. Vac. Sci. Technol. B 20(6), 2984-2990, (2002).
• JA-311. Saul Griffith, Mark Mondol, David S. Kong, Joseph M. Jacobson, “Nanostructure Fabrication by Direct Electron-Beam Writing of Nanoparticles”, J. Vac. Sci. Technol. B 20(6), 2768-2772, (2002).
• JA-312. C. J. Gaeta, H. Rieger, I.E.E. Turcu, R.A. Forber, S.M. Campeau, K.L. Cassdy, M.F. Powers, J.R. Maldonado, G. French, J. Naungayan, C. Kelsy, P. Hark, J.H. Morris, R.M. Foster, H.I. Smith, M.H. Lim, “High Power Compact Laser-Plasma Source for X-Ray Lithography”, Jpn. J. Appl. Phys. Vol. 41, 4111-4121, (2002).
• JA-313. J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, G.J. Vancso "Fabrication of nanostructures with long-range order using block copolymer lithography", Appl. Phys. Letts., 81(19), 3657-3659, (2002).
• JA-314. N. Dao, S. L. Whittenburg, Y. Hao, C. A. Ross, L. M. Malkinski, J. Q. Wang, “Magnetization reversal of elliptical Co/Cu/Co pseudo-spin valve dots”, J. Appl. Phys. 91(10) 8293-8295, (2002).
• JA-315. Xiabin Zhu, P. Grutter, Y. Hao, F. J. Castano, S. Haratani, C.A. Ross, B. Vogeli and H.I. Smith, “Magnetization switching in 70 nm-wide pseudo-spin-valve nanoelements”, J. Appl. Phys. 93(2), 1132-1136. (2003).
• JA-316. John G. Hartley, Timothy R. Groves, Henry I. Smith, Mark K. Mondol, James G. Goodberlet, Mark L. Schattenburg, Juan Ferrera and Alexandr Bernshteyn, “Spatial-phase locking with shaped-beam lithography”, Review of Scientific Instruments, Vol. 74(3), 1377-1379, (2003).
• JA-317. F. J. Castano, C.A. Ross, C. Frandsen, A. Eilez, D. Gil, Henry I. Smith, M. Redjdal and F.B. Humphrey, “Metastable states in magnetic nanorings”, Physical Review B, 67, 184425, (2003).
• JA-318. Y. Hao, C. A. Ross, Henry I. Smith, “Thermal stability of lithographicaly patterned sub-200 nm NiFe elements”, J. Appl. Phys. 93(10), 7909-7911 (2003).
• JA-319. F.J. Castano, Y. Hao, S. Haratani, C. A. Ross, B. Vogeli, Henry I. Smith, C. Sanchez-Hanke, C.C. Kao, X. Zhu, P. Grutter, “Magnetic force microscopy and x-ray scattering study of 70 x 550 nm2 pseudo-spin-valve nanomagnets”, J. Appl. Pys. 93(10), 7927-7929, (2003)
• JA-320. X. Zhu, P. Grutter, V. Metlushko, Y. Hao, F. J. Castano, C. A. Ross, B. Ilic, H. I. Smith, “Construction of hysteresis loops of single domain elements and coupled permalloy ring arrays by magnetic force microscopy”, J. Appl. Phys. 93(10), 8540-8542, (2003).
• JA-321. J. Y. Cheng, C.A. Ross, E.L. Thomas, Henry I. Smith, G.J. Vancso, “Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography”, Adv. Mater. 2003, 15 No. 19, October 2. 1599-1602. (2003).
• JA-322. Euclid E. Moon, Lynn Chen, Patrick N. Everett and Henry I. Smith, “Interferometric-Spatial-Phase Imaging for 6-Axis Mask control”, J. Vac. Sci. Technol. B 21(6), 3112-3115 (2003).
• JA-323 Dario Gil, Rajesh Menon and Henry I. Smith, “The Case for Diffractive Optics in Maskless Lithography”, J. Vac. Sci. Technol. B 21(6), 2810-2814 (2003).
• JA-324 Dario Gil, Rajesh Menon and Henry I. Smith, “Fabrication of High-Numerical-Aperture Phase Zone Plates with a Single Lithography Exposure and no Etching”, J. Vac. Sci. Technol. B 21(6), 2956-2960 (2003).
• JA-325 X. Zhuang, D. Conkerton, A. Lal, M. Feldman, T. O’Reilly and H.I. Smith, “Adaptive Membrane Masks”, J. Vac. Sci. Technol. B 21(6), 3082-3085 (2003).
• JA-326 Tymon Barwicz, Henry I. Smith, “Evolution of line-edge roughness during fabrication of high-index-contrast microphotonic devices”, J. Vac. Sci. Technol. B 21(6), 2892-2896 (2003).
• JA-327 J. T. Hastings, Feng Zhang, and Henry I. Smith, “Nanometer-Level Stitching in raster-Scanning E-Beam Lithography Using Spatial-Phase Locking”, J. Vac. Sci. Technol. B 21(6), 2650-2656 (2003).
• JA-328 T. Barwicz, M.A. Popovic, P.T. Rakich, M.R. Watts, H.A. Haus, E.P. Ippen, and H.I. Smith “Microring-resonator-based add-drop filters in SiN: fabrication and analysis,” Optics Express, vol. 12, pp. 1437-1442, 2004.
• JA-329 JA-A F.J. Castano, C.A. Ross, A. Eilez, D. Gil and Henry I. Smith, "Magnetization reversal in lithographically defined elliptical-ring nanomagnets", Journal of Physics D: Applied Physics, 36, 2031-2035 (2003).
• JA-330 F. J. Castaño, C. A. Ross, A. Eilez, W. Jung, and C. Frandsen, "Magnetic configurations in 160-520 nm diameter ferromagnetic rings", Physical Review B, 69, 144421 (2004).
• JA-331 Minghao Qi, Elefterios Lidorikis, Peter T. Rakich, Steven G. Johnson, J.D. Joannopoulos, Erich P. Ippen and Henry I. Smith, “A three-dimensional optical photonic crystal with designed point defects” Nature Magazine, Vol. 429, 538-542, June 2004.

AWAITING PUBLICATION:

• JA-A Christel Zanke, Minghao Qi and Henry I. Smith, “Large-area Patterning for 2D and 3D Photonic Crystals via Coherent Diffraction Lithography (CDL)”, submitted to the 48th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, June 1-4, 2004, San Diego, CA.
• JA-B Minghao Qi, J. D. Joannooulos and Henry I. Smith, “A Three-Dimensional Optical Photonic Crystal with Designed Point-Defects”, submitted to the 48th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-C Fernando J. Castano, Rajesh Menon, Wonjoon Jung, Caroline A. Ross, and Henry I. Smith, “Fabrication of exchange-biased Elliptical-Ring Arrays using Zone-Plate-Array Lithography”, submitted to the 48th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-D Rajesh Menon, Amil Patel, David Chao and Henry I. Smith, “An Alpha-Prototype System for Zone-Plate-Array Lithography (ZPAL), submitted to the 48th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, June 1-4, 2004 -San Diego, CA.
• JA-E Rajesh Menon, Euclid Moon, Mark Mondol and Henry I. Smith, “Scanning-Spatial-Phase Alignment for Zone-Plate-Array Lithography”, submitted to the 48th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, June 1-4, 2004 -San Diego, CA.
• JA-F Feng Zhang and Henry I. Smith, “Partial Blanking of an Electron Beam Using a quadrupole Lens”, Submitted to the 48th International Conference on Electron, Ionm Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-G Euclid E. Moon, Mark K. Mondol, Henry I. Smith, “Atomic-Level Alignment Detectivity Using Novel Interleaved Fringe Formation in Interferometric Spatial Phase Imaging”, Submitted to the 48th Internationa Conference on Electron, Ionm Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-H Solomon Assefa, Peter T. Rakich, Peter Bienstman, Steven G. Johnson, Gale S. Petrich, John D. Joannopoulos, Leslie A. Kolodziejski, Erich P. Ippen, and Henry I. Smith, “Guiding 1.5 ?m Light in Photonic Crystals Based on dielectric Rods”, submitted to Applied Physics Letters (2004).
• JA-I Tymon Barwicz, Milos¹ A. Popovc, Peter T. Rakich, Michael R. Watts, Hermann A. Haus, Erich P. Ippen, and Henry I. Smith, “Microring-resonator-based add-drop filters in SiN: fabrication and analysis”, To be published in the IEEE Photonics Technology Letters (2004).

Published Conference Proceedings

• (PCP-1) H.I. Smith, (The Dynamics of Pumping and Desorption in a Bayard-Alpert Ionization Gauge), Transactions 10th National Vacuum Symposium, 1963, pp. 263 MacMillian Company, New York, NY (1963).
• (PCP-2) H.I. Smith, (The Fabrication of Microsound Components), IEEE International Convention, New York, NY, Session 2-C, Convention Digest, pp. 90-91, March 24-27, 1969.
• (PCP-3) R.J. Hawryluk and H.I. Smith, (Electron Beam Exposure Profiles in Thin Polymer Films), pp. 51-67, 5th International Conference, Electron and Ion Beam Science and Technology, Houston, TX, May 7-11, 1972, Ed. R. Bakish 1972, The Electrochemical Society Inc.
• (PCP-4) D.L. Spears, H.I. Smith, and E. Stern, (X-ray Replication of Scanning Electron Microscopy Generated Patterns), pp. 80-91, 5th International Conference, Electron and Ion Beam Science and Technology, Houston, TX, May 7-11,1972, Ed. R. Bakish 1972, The Electrochemical Society Inc., Princeton, NJ.
• (PCP-5) H.I. Smith, R.C. Williamson, and W.T. Brogan, (Ion Beam Etching of Reflective Array Filters), pp. 198-201 Proceedings, 1972 Ultrasonics Symposium, Boston, MA, October 4-7, 1972, Ed. J. DeKlerk, Institute of Electrical and Electronics Engineers Inc., 345 E. 47th Street, New York, NY, Catalog #72CHO708-8SU.
• (PCP-6) C.K. Crawford and H.I. Smith, (Directly Heated LaB6 Cathodes Interchangeable with Standard SEM Filaments), Proceedings 8th National Meeting, Electron Microscope Society of America, New Orleans, LA, August 1973.
• (PCP-7) H.I. Smith, J. Melngailis, R.C. Williamson, and W.T. Brogan, (Ion-Beam Etching of Surface Gratings), Proceedings IEEE Ultrasonics Symposium, Monterey, CA, November 5-7, 1973, pp. 558-563, Ed. J. DeKlerk, IEEE Inc., New York, NY, Cat. #73CHO807-8SU.
• (PCP-8) R.C. Williamson, V.S. Dolat, and H.I.Smith, (L-Band Reflective-Array Compressor with a Compression Ratio of 5120), Proceedings Ultrasonics Symposium, Monterey, CA, November 5-7, 1973, pp. 490-493, Ed. J. DeKlerk, IEEE Inc., New York, NY, Cat. #73CHO807-8SU.
• (PCP-9) H.I. Smith, (Fabrication Techniques for Optical and Acoustical Microelectronic Devices), pp. 221-232, Proceedings of the Symposium on Optical and Acoustical Micro-electronics, New York, NY, April 16-18, 1974. Published by Polytechnic Press of the Polytechnic Institute of New York, 1975, Microwave Research Institute, Symposia Series, Vol. XXIII, Ed. Jerome Fox. (Invited paper)
• (PCP-10) R.J. Hawryluk, A. Soares, H.I. Smith, and A.M. Hawryluk, (Experimental Utilization of Monte Carlo Models for Electron Beam Lithography), pp. 87-94, Proceedings 6th International Conference, Electron and Ion Beam Science and Technology, May 13-16, 1974, San Francisco, CA, Ed. R. Bakish, The Electrochemical Society, Princeton, NJ.
• (PCP-11) S.E. Bernacki and H.I. Smith, (X-ray Lithography Applied to Silicon Device Fabrication), pp. 34-46, Proceedings 6th International Conference Electron and Ion Beam Science and Technology, May 13-16, 1974, San Francisco, CA. Ed. R. Bakish, The Electrochemical Society, Princeton, NJ.
• (PCP-12) H.I. Smith, (Electron Beam, Ion Beam, X-ray, and Optical Techniques for Fabricating Surface-Acoustic-Wave and Thin Film Optical Devices), Proceedings 6th Congress International AVISEM, Toulouse, FRANCE, October 8-11, 1974, Societe Francais du Vide. (Invited paper)
• (PCP-13) H.I. Smith, (Techniques for Making Gap-Coupled Acoustoelectric Devices), pp. 238-240, Ultrasonics Symposium Proceedings, Los Angeles, CA, September 22-24, 1975. Ed. J. DeKlerk, IEEE Inc., New York, NY.
• (PCP-14) H.I. Smith, (Ion Beam Etching), pp. 133-143, Proceedings Symposium on Etching for Pattern Definition, Eds. H.G. Hughes and M.J. Rand, The Electrochemical Society Inc., Washington, DC, May 3-4, 1976. (Invited paper)
• (PCP-15) H.I. Smith and D.C. Flanders, (X-ray Replication of Submicrometer Linewidth Patterns), Proc. 35th Annual Meeting Electron Microscope Society of America, p. 136, Boston, MA, August 22-26, 1977, Ed. G.W. Bailey, 1977 Calitor's Publishing Division, Baton Rouge, LA. (Invited paper)
• (PCP-16) N.M. Ceglio and H.I. Smith, (An Efficient Lensing Element for X-rays), Proc. 8th International Conference on X-ray Optics and Microanalysis, Boston, MA, August 18-24, 1977.
• (PCP-17) H.I. Smith and D.C. Flanders, (X-ray Lithography), Proc. 8th Conference 1976 International on Solid State Devices, pp. 61-65, Tokyo, Japan, September 1-3, 1976. Japan J. Appl. Phys. Vol. 16, Suppl. 16-1, pp. 61-65 (1977). (Invited paper)
• (PCP-18) H.I. Smith, D.C. Flanders, and D.C. Shaver, (New Applications of Submicrometer Structures in Materials Science and Biology), pp. 33-40, Scanning Electron Microscopy, Vol. 1, 1978, Ed. O. Johari, Scanning Electron Microscopy, Inc., AMF O'Hare, IL. (Invited paper)
• (PCP-19) H.I. Smith, (The Impact of Submicrometer Structures on Future Integrated Electronics), EASCON '79, pp. 296-297, Arlington, VA, October 8-11, 1979. IEEE Electronics and Aerospace Systems Conference, IEEE, New York, NY.
• (PCP-20) M.W. Geis, D.C. Flanders, D.A. Antoniadis, and H.I. Smith, (Crystalline Silicon on Insulators by Graphoepitaxy), IEEE International Electron Devices Meeting, pp. 210-212, Washington, DC, December 3-5, 1979.
• (PCP-21) H.I. Smith, (Equivalent Data Rate of X-ray Lithography Systems), Proc. 9th International Conference, Electron and Ion Beam Science and Technology, pp. 425-435, St. Louis, MO, May 1980, Ed. R. Bakish, The Electrochemical Society.
• (PCP-22) D.C. Flanders, D.C. Shaver, A.M. Hawryluk, and H.I. Smith, (Progress in the Fabrication of Artificial Microstructures for X-ray Imaging and Spectroscopy), Proc. Conf. Ultrasoft X-ray Microscopy, June 13-15, 1979, New York, NY. Annals of the New York Academy of Sciences, V342, 203-212 (1980).
• (PCP-23) M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, (Silicon Graphoepitaxy), Proceedings of 12th Conference on Solid State Devices, Tokyo, Japan (1980). Also, Japan J. Appl. Phys. 20, Supplement 20-1, 39 (1981). (Invited paper)
• (PCP-24) H.I. Smith, (The Impact of Submicrometer Structures in Research and Applications), Proc. of the International Conference on Microlithography, September 30 - October 2, 1980, Amsterdam. Ed. R. Kramer, DELFT University Press, The Netherlands (1981). (Invited paper)
• (PCP-25) A.M. Hawryluk, N.M. Ceglio, R.H. Price, J. Melngailis, and H.I. Smith, (Soft X-ray Spectroscopy using Thick Gold Transmission Gratings of 0.2 to 0.32 µm Spatial Periods), pp. 286-289, Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981. Eds. D.T. Atwood and B.L. Henke, Amer. Inst. of Physics Conference Proc. No. 75, New York, NY (1981).
• (PCP-26) H.I. Smith, (Fabrication of Diffractive Optical Elements for X-ray Diagnostics), pp. 223-224 Proc. Topical Conference on Low Energy Diagnostics, Monterey, CA, June 8-10, 1981. Eds. D.T.Atwood and B.L. Henke, Amer. Inst. of Physics, Conf. Proc. No. 75, New York, NY (1981). (Invited paper)
• (PCP-27) N.M. Ceglio, M. Roth, and A.M. Hawryluk, (A Streaked X-ray Transmission Grating Spectrometer), Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981; D.T. Atwood, Chairman, Amer. Inst. of Physics, Conference Proc. No. 75, p. 290 (1981).
• (PCP-28) R. Tatchyn, I. Lindau, E. Kallne, E. Spiller, R. Bartlett, J. Kallne, M. Hecht, J.H. Dijkstra, A.M. Hawryluk, and R.Z. Bachrach, (High Quality Fraunhofer Diffraction Spectra Taken at SSRL in the Soft X-ray Range), Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981; D.T. Atwood, Chairman. Amer. Inst. of Physics, Conference Proc. No. 75, p. 297 (1981).
• (PCP-29) M.W. Geis, H.I. Smith, J.C.C. Fan, B.Y. Tsaur, and J.P. Sallerno, (Preparation of Oriented Silicon Films on Insulating Substrates), 5th International Conference on Vapor Growth and Epitaxy/5th American Conference on Crystal Growth, Coronado, CA, July 19-24, 1981; A.L. Gentile, Conference Secretariat.
• (PCP-30) H.I. Smith, H.A. Atwater, and M.W. Geis, (Orientation Selection by Zone Melting Silicon Films through Planar Constrictions), Extended Abstract, 161st Meeting, Electrochemical Society, Montreal, Canada, May 9-14, 1982.
• (PCP-31) H.I. Smith and M.W. Geis, (The Mechanism of Orientation in Si Graphoepitaxy using a Strip-Heater Oven), Extended Abstract, 161st Meeting, Electrochemical Society, Montreal, Canada, May 9-14, 1982.
• (PCP-32) M.N. Islam, H.A. Haus, and J. Melngailis, (Radiation Loss for Normal and Oblique Incidence Gratings), IEEE Ultrasonics Symposium. Cat. #82CH1823-4, p. 92 (1982).
• (PCP-33) D.-P. Chen, J. Melngailis, and H.A. Haus, (Filters Based on Conversion of Surface Acoustic Waves to Bulk Plate Modes in Gratings), IEEE Ultrasonics Symposium. Cat. #82CH1823-4, p. 67 (1982).
• (PCP-34) D.T. Atwood, N.M. Ceglio, H.M. Medecki, H.I. Smith, A.M. Hawryluk, T.W. Barbee Jr., W.K. Warburton, J.H. Underwood, B.L. Henke, T.H.P. Chang, M. Hatzakis, D.P. Kern, P.J. Coane, W.W. Molzlen, A.J. Speth, G.L. Stradling, and D.W. Sweeney, (Current Developments in High Resolution X-ray Measurements), American Institute of Physics Conference Proceedings, Series Editor, H.C. Wolfe, No. 90, Subseries on Optical Science and Engineering No. 2. Topical Meeting on Laser Techniques for Extreme Ultraviolet Spectroscopy, Boulder, CO (1982). Eds. T.J. McIlrath and R.R. Freeman.
• (PCP-35) M.W. Geis, H.I. Smith, B.Y. Tsaur, J.C.C. Fan, D.J. Silversmith, R.W. Mountain, and R.L. Chapman, (Zone-Melting Recrystallization of Semiconductor Films), Laser-Solid Interactions and Transient Thermal Processing of Materials Symposium, Boston, MA, November 1982. Mat. Res. Soc. Symp. Proc. Vol. 13, 477 (1983), Eds. J. Narayan, W.L. Brown, and R.A. Lemons, North-Holland Publishing Co.
• (PCP-36) N.M. Johnson, M.D. Moyer, L.E. Fennell, E.W. Maby, and H.A. Atwater, (Detection of Electronic Defects in Strip-Heater Crystallized Silicon Thin Films), Laser-Solid Interactions and Transient Thermal Processing of Materials Symposium, Boston, MA, November 1982. Mat. Res. Soc. Symp. Proc. Vol. 13, 491 (1983), Eds. J. Narayan, W.L. Brown and R.A. Lemons, North-Holland Publishing Co.
• (PCP-37) C.J. Keavney, H.A. Atwater, H.I. Smith, and M.W. Geis, (Zone Melting Recrystallization of InSb on Oxidized Silicon Wafers), Electro-Chemical Society Symposium on III-V Opto-Electronics Epitaxy and Device-Related Processes, San Francisco, May 1983. Eds. V.G. Keramidas and S. Mahajan. Also, Extended Abstracts, 162nd Meeting, The Electrochemical Society, San Francisco, CA, May 8-13, 1983.
• (PCP-38) H.I. Smith, E.H. Anderson, A.M. Hawryluk, and M.L. Schattenburg, (Planar Techniques for Fabricating X-ray Diffraction Gratings and Zone Plates), Symposium on X-ray Microscopy, Gottingen, FRG, September 14-16, 1983. Springer Series in Optical Sciences Vol. 43: X-ray Microscopy, pp. 51-61. Eds. D. Rudolph and G. Schmahl, Springer-Verlag, Berlin, Heidelburg (1984). (Invited paper)
• (PCP-39) H.I. Smith, C.V. Thompson, M.W. Geis, H.A. Atwater, C.C. Wong, and T. Yonehara, (Zone Melting Recrystallization of Patterned Films and Low-Temperature Graphoepitaxy), Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, Boston, MA, November 1983. Mat. Res. Soc. Symp. Proc. 23, 459 (1984). Elsevier Science Publishers Co., Eds. N.M. Johnson and J.C.C. Fan (1984). (Invited paper)
• (PCP-40) C.C. Wong, C.J. Keavney, H.A. Atwater, C.V. Thompson, and H.I. Smith, (Zone Melting Recrystallization of InSb Films on Oxidized Si Wafers), Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, Boston, MA, November 1983. Mat. Res. Soc. Symp. Proc. 23, 627 (1984), Elsevier Science Publishing Co., Eds. N.M. Johnson and J.C.C. Fan.
• (PCP-41) T. Yonehara, C.V. Thompson, and H.I. Smith, (Abnormal Grain Growth in Ultra-Thin Films of Germanium on Insulator), Mat. Res. Soc. Symp. Proc. 25, 517 (1984). 'Thin-Films and Interfaces', Elsevier Science Publishing Co., Eds. J. Baglin and D. Campbell.
• (PCP-42) T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, (Surface- Energy-Driven Graphoepitaxy in Ultra-Thin Films of Ge), 1984 International Conference on Solid State Devices and Materials, Kobe, Japan, August 30 - September 1, 1984. Extended Abstracts of the 16th International Conference on Solid State Devices and Materials, B-10-1, 515-518 (1984).
• (PCP-43) M.W. Geis, H.I. Smith, C.K. Chen, R.W. Mountain, and C.L. Doherty, (The Characterization, Control and Reduction of Subboundaries in Silicon-on-Insulators), Mat. Res. Soc. Symp. Proc. 35, 575-582 (1985). Energy Beam-Solid Interactions and Transient Thermal Processing, Materials Research Society, Eds. D.K. Biegelson, G.A. Rozgonyi, C.V. Shank.
• (PCP-44) C.V. Thompson, (Solid Phase Processes for Semiconductor-On-Insulator), Mat. Res. Soc. Symp. Proc. 35, 711 (1985). Energy-Beam Solid Interactions and Transient Thermal, Eds. D.K. Biegelson, G.A. Rozgonyi, C.V. Shank.
• (PCP-45) A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, (Modification of Silicon Electronic Band Structure using Submicron Period Gate Electrodes), p. 866, IEEE International Electronic Device Meeting, San Francisco, CA, December 9-12, 1984.
• (PCP-46) M.W. Geis, C.K. Chen, H.I. Smith, R.W. Mountain, and C.L. Doherty, (Recent Advances in SOI Films Produced by Zone-Melting Recrystallization), Extended Abstracts of the 2nd International Workshop on Future Electron Devices. SOI Technology and Three-Dimensional Integration (FED SOI/3D Workshop), March 19-21, 1985, Shuzenji, Japan, p. 87, Research and Development Association for Future Electron Devices (1985).
• (PCP-47) C.C. Wong, H.I. Smith, and C.V. Thompson, (Room Temperature Grain Growth in Thin Au Films), 4th International Symposium on Grain Boundary Structure and Related Phenomena, Supplement to Trans. of Jap. Inst. of Metals 27, 641 (1986).
• (PCP-48) H.-J. Kim and C.V. Thompson, (The Effect of Dopants on Grain Boundary Mobility in Silicon), 4th International Symposium on Grain Boundary Structure and Related Phenomena), Japan Institute of Metals, Supplement to Trans. of Jap. Inst. of Metals 27, 495 (1986).
• (PCP-49) C.C. Wong, H.I. Smith, and C.V. Thompson, (Secondary Grain Growth and Graphoepitaxy in Thin Au Films on Submicrometer-Period Gratings), Mater. Res. Soc. Symp. Proc. 47, 35 (1985).
• (PCP-50) H.A. Atwater, H.I. Smith, and C.V. Thompson (Enhancement of Grain Growth in Ultra-Thin Germanium Films by Ion Bombardment), Mat. Res. Soc. Symp. Proc. 51, 337 (1986), Eds. H. Kurz, G.L. Olson, J.M. Poate. (Invited paper)
• (PCP-51) H.I. Smith, M.W. Geis, C.V. Thompson, and C.K. Chen, (Crystalline Films on Amorphous Substrates by Zone Melting and Surface-Energy-Driven Grain Growth in Conjunction with Patterning), Mat. Res. Soc. Symp. Proc. 53, 39 (1986). Eds. A. Chiang, M.W. Geis, L. Pfeiffer.
• (PCP-52) M.W. Geis, C.K. Chen, H.I. Smith, P.M. Nitishin, B.-Y. Tsaur, and R.W. Mountain, (Elimination of Subboundaries from Zone-Melting-Recrystallized Silicon-On-Insulator Films), Mat. Res. Soc. Symp. Proc. 53, 39 (1986).
• (PCP-53) C.V. Thompson and H.I. Smith, (Secondary Grain Growth in Thin Films), Phase Transitions in Condensed Systems - Experiment and Theory, Mat. Res. Soc. Symp. Proc. 57, 499 (1987). Eds. G.S. Cargill III, F. Spaepen K.N. Tu.
• (PCP-54) H.J. Kim and C.V. Thompson, (The Effects of Dopants on Surface-Energy-Driven Grain Growth in Ultrathin Si Films), presented at Fall Meeting of the Materials Research Society, Boston, MA, December 2-6, 1985, Mat. Res. Soc. Symp. Proc. 54, 730 (1986).
• (PCP-55) S.Y. Chou, D.A. Antoniadis, and H.I. Smith, (Application of the Shubnikov-de Haas Effect in Characterization of Sub-100 nm Channel Si MOSFETs), IEEE International Electron Devices Meeting, Washington, DC, December 1985, IEDM Technical Digest, 562-564 (1985).
• (PCP-56) D.A. Antoniadis, A.C. Warren, and H.I. Smith, (Quantum Mechanical Effects in Very Short and Very Narrow Channel MOSFETs), IEEE International Electron Devices Meeting, Washington, DC, December 1985, IEDM Technical Digest, 558-561 (1985).
• (PCP-57) C.R. Canizares, M.L. Schattenburg, and H.I. Smith, (High Energy Transmission Grating Spectrometer for AXAF), SPIE Vol. 597, 253 X-ray Instrumentation in Astronomy Society of Photo-Optical Instrumentation Engineers (1985).
• (PCP-58) S.Y. Chou, C.S. Lam, D.A. Antoniadis, H.I. Smith, and C.G. Fonstad, (Characterization of Modulation-Doped FET's using Shubnikov-de Haas Oscillations), Proc. 13th International Symposium on Gallium Arsenide and Related Compounds, Las Vegas, NV, September 28 - October 1, 1986, Ed. W.T. Lindley, Inst. Phys. Conf. Ser. No. 83, Chapter 4, p. 239-244.
• (PCP-59) H.I. Smith, (A Statistical Analysis of Microlithography), presented at the 18th International Conference on Solid State Devices & Materials, Tokyo, Japan, August 20-22, 1986. Also, in Extended Abstracts of the 18th (1986 International) Conference on Solid State Devices and Materials, p. 13 (1986), Japan Society of Applied Physics, Business Center for Academic Societies Japan, 40-14, Hongo-2-chome, Bunkyo-ku, Tokyo.
• (PCP-60) I. Plotnik, M.E. Porter, M. Toth, S. Akhtar, and H.I. Smith, (Ion-Implant Compensation of Tensile Stress in Tungsten Absorber for Low Distortion X-ray Masks), Proc. 1986 International Conference on Microlithography and Related Microelectronics Technologies, September 23-25, 1986, Interlaken, Switzerland p. 51, Eds. H.W. Lehmann and Ch. Bleiker, Elsevier, 1986. Also, Microelectronic Engineering 5, 51 (1986).
• (PCP-61) H.A. Atwater, H.I. Smith, and C.V. Thompson, (Ion Beam Enhanced Grain Growth in Thin Films), Beam-Solid Interactions and Transient Processes Symposium, Materials Research Society Meeting, December 1986. Mat. Res. Soc. Symp. Proc. 74, 499 (1987).
• (PCP-62) M.W. Geis, C.K. Chen, and H.I. Smith, (Elimination of Subboundaries in 0.5-µm-thick Si-on-Insulator Films Produced by ZMR), Beam-Solid Interactions and Transient Processes Symposium, Mat. Res. Soc. Meeting, December 1986.
• (PCP-62(a)) G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, (Electron Velocity Overhshoot at 300K and 77K in Silicon MOSFETs with Submicron Channel Lengths), IEEE International Electron Devices Meeting, Los Angeles, CA, December 1986, IEDM Technical Digest, 824 (1986).
• (PCP-63) J.S. Im, C.V. Thompson, and H. Tomita, (Solidification Morphologies in Zone-Melting Recrystallization), Beam-Solid Interactions and Transient Processes Symposium, Materials Research Society Meeting, December 1986, Mat. Res. Soc. Symp. Proc. 74, 555 (1987).
• (PCP-64) R.C. Cammarata, C.V. Thompson, and S.M. Garrison, (Secondary Grain Growth during Rapid Thermal Annealing of Doped Polysilicon Films), presented at Spring Materials Research Society Meeting, 1987 Mat. Res. Soc. Symp. Proc. 92, 335 (1987).
• (PCP-65) D.A. Antoniadis, (Quantum Mechanical and Non-Steady-State Transport Phenomena in Nanostructured Silicon Inversion Layers), Extended Abstracts, 19th Conference on Solid State Devices and Materials, August 25-27, 1987, The Japan Society of Applied Physics, Tokyo, Japan.
• (PCP-66) E.H. Anderson, D. Kern, and H.I. Smith, (Fabrication by Tri-Level Electron Beam Lithography of X-ray Masks with 50 nm Linewidths and Replication by X-ray Nanolithography), Microcircuit Engineering Proc. International Conference on Microlithography, September 22-25, l987, Paris, France, pg. 541, Eds. R. Castagne and J. Perrocheau, Elsevier, 1987. Also, Microelectronic Engineering 6, 541 (1987).
• (PCP-67) M.L. Schattenburg, I. Tanaka and H.I. Smith, (Microgap X-ray Nanolithography), Microcircuit Engineering Proc. International Conference on Microlithography, September 22-25, l987, Paris, France, pg. 273, Eds. R. Castagne and J. Perrocheau, Elsevier, 1987. Also, Microelectronic Engineering 6, 273 (1987).
• (PCP-68) H.A. Atwater, C.V. Thompson, and H.I. Smith, (Transition State Model for Grain Boundary Motion during Ion Bombardment), Mat. Res. Soc. Symp. Proc. 100, 345 (1988).
• (PCP-69) C.R. Canizares, M.L. Schattenburg, D. Dewey, A.M. Levine, T.H. Markert and H.I. Smith, (Transmission Grating Spectroscopy and The Advanced X-ray Astrophysics Facility (AXAF)), SPIE's 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, San Diego, CA, August 14-19, 1988.
• (PCP-70) K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, (Superlattice Effect in A Grid-Gate GaAs/AlGaAs MODFET Structure), Conference on Gallium Arsenide and Related Compounds, Atlanta, GA, September 12-14, 1988.
• (PCP-71) Y.C. Ku and H.I. Smith, (X-ray Mask Technology), Techcon '88, Semiconductor Research Corporation, Dallas, TX, October 12-14, 1988.
• (PCP-72) H. Kawata, J.M. Carter, A. Yen, and H.I. Smith, (Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity), Microcircuit Engineering '88, Vienna, Austria September 21-24, 1988. Microelectronic Engineering 9, 31-36 (1989).
• (PCP-73) H.I. Smith, K. Ismail, W. Chu, A. Yen, Y.C. Ku, and D.A. Antoniadis,)X-ray Nanolithography and Quantum-Effect Electronics), Molecular Electronics-Science and Technology, Engineering Foundation Conferences, Keauhou Kona, Hawaii, February 19-24, 1989. Molecular Electronics-Science and Technology, pp. 107-118, Ed. Ari Aviram, Engineering Foundation, New York, NY (1989).
• (PCP-74) H.I. Smith, K. Ismail, W. Chu, A. Yen, Y.C. Ku, M.L. Schattenburg, and D.A. Antoniadis, (Fabrication of Quantum-Effect Electronic Devices using X-ray Nanolithography), Proceedings of the International Symposium on Nanostructure Physics and Fabrication, pp. 57-65, Eds. M.A. Reed, and W.P. Kirk Academic Press, San Diego, CA (1989).
• (PCP-75) C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, (Far-Infrared Transmission Measurements on Grid-Gate GaAs/AlGaAs Lateral-Surface-Superlattice Structures), Proc. of the 4th International Conference on Modulated Semiconductor Structures, p. 819, Ann Arbor, MI (1989).
• (PCP-76) D.A. Antoniadis, K. Ismail, and H.I. Smith, (Lateral Surface Superlattices and Quasi-One-Dimensional Structures in GaAs), presented at the (Science and Engineering of One-and Zero-Dimensional Semiconductors), NATO Advanced Research Workshop, 29 March 29 - April 1, 1989, Cadiz, Spain, Science & Engineering of One-and Zero-Dimensional Semiconductors, Ed. S.P. Beaumont and C.M. Stotmajor Torres, Plenum Press, (1990).
• (PCP-77) H.I. Smith, K. Ismail, M.L. Schattenburg, and D.A. Antoniadis, (Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography), Microelectronic Engineering 11, 53-59 (1990).
• (PCP-78) Y.C. Ku, H.I. Smith, and I. Plotnik, (Low Stress Tungsten Absorber for X-ray Masks), Microelectronic Engineering 11, 303-308 (1990).
• (PCP-79) A. Yen, R.A. Ghanbari, E.H. Anderson, and H.I. Smith, (Fabrication of 100 nm Period Gratings using Achromatic Holographic Lithography), Microelectronic Engineering 11, 201-205 (1990).
• (PCP-80) K. Early, M.L. Schattenburg, and H.I. Smith, (Absence of Resolution Degradation in X-ray Lithography for l from 4.5 nm to 0.83 nm). Microelectronic Engineering 11, 317-321 (1990).
• (PCP-81) J.A. Floro and C.V. Thompson, (Epitaxial Grain Growth and Orientation Metals Metastability in Heteroepitaxial Thin Films), Mat. Res. Soc. Symp. Proceedings 187, 273 (1990).
• (PCP-82) C.T. Liu, D.C. Tsui, M. Santos, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, (Magnetoresistance of Two-Dimensional Electrons in a Two-Dimensional Lateral Surface Superlattice), Materials Research Society Fall Meeting, Boston, MA 1990, Mat. Res. Soc. Extended Abstract EA-26, 95 (1990).
• (PCP-83) C.C. Eugster, J.A. del Alamo, P.A. Belk, and M.J. Rooks, (Criteria for One-Dimensional Transport in Split-Gate Field-Effect Transistors), International Electron Devices Meeting (IEDM) 1990, Technical Digest 90, 335 (1990).
• (PCP-84) T. H. Markert, M.L. Schattenburg, T. Isobe, J. Bauer, C. Canizares, J. O'Connor, J. Porter, and H.I. Smith, (Investigations of Materials for Ultra-Thin Window X-ray Detectors), presented at 177th Meeting of the American Astronomical Society, Philadelphia, PA, January 13-17, 1991. Abstract in Bull. Am. Astron. Soc. 22, 1260 (1990).
• (PCP-85) C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, (Observation of Landau Level Splitting in Two-Dimensional Lateral Surface Superlattices), 20th International Conference on (The Physics of Semiconductors), Thessaloniki, Greece, August 6-10, 1990, Vol. 2, eds. E.M. Anastassakis, J.D. Joannopoulos, World Scientific Publishing Co.
• (PCP-86) A. Toriumi, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, (Resonant Magneto-Conductance in a Two-Dimensional Lateral-Surface-Superlattice), 20th International Conference on the (The Physics of Semiconductors), Thessaloniki, Greece, August 6-10, 1990, Vol. 2, eds. E.M. Anastassakis, J.D. Joannopoulos, World Scientific Publishing Co.
• (PCP-87) A. Yen, R.A. Ghanbari, Y.-C. Ku, W. Chu, M.L. Schattenburg, J.M. Carter, and H. I. Smith, (X-ray Masks with Large-Area 100 nm Period Gratings for Quantum-Effect Device Applications), Microelectronic Engineering 13, 271-274 (1991).
• (PCP-88) M. L. Schattenburg and H.I. Smith, (X-ray Nanolithography - the Clearest Path to 0.1 and Sub-0.1 µm ULSI), Proc. of International MicroProcess Conf., Kanazawa, Japan, July 15-18, 1991, JJAP Series 5, pp. 63-70 (1991).
• (PCP-89) N.H. Karam, V. Haven, K. Ismail, F. Legoues, J. Carter, and H.I. Smith, (A New Approach for Low Defect Density GaAs on Patterned Si Substrates by MOCVD), Materials Research Society Spring Meeting, Anaheim, CA, April 29, 1991, Mat. Res. Soc. Symp. Proc. 221, 309 (1991).
• (PCP-90) D.A. Antoniadis and J.E. Chung, (Physics and Technology of Ultra Short Channel MOSFET Devices), International Electron Devices Meeting (IEDM), Technical Digest, 21 (Dec. 1991).
• (PCP-91) H.I. Smith and M.L. Schattenburg, (Proximity X-ray Nanolithography), OSA Proceedings on Soft X-ray Projection Lithography, Jeffrey Bokor, ed. (Optical Society of America, Washington, DC), 12, 148-149 (1991).
• (PCP-92) T.H. Markert, J.M. Bauer, C.R. Canizares, T. Isobe, S. Nenonen, J. O'Connor, M.L. Schattenburg, H.I. Smith, K.A. Flanagan, M.V. Zombeck, (Proportional Counter Windows for the Bragg Crystal Spectrometer on AXAF), SPIE Conference on EUV, X-ray and Gamma Instruments for Astronomy II, San Diego, CA, July 24-26, (1991).
• (PCP-93) Y. Zhao, D.C. Tsui, K. Hirakawa, M. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, (Far Infrared Magneto-Absorption by the 2DEG in GaAs/AlGaAs Heterostructures with Grid Gates), presented at 21st International Conference on the Phyiscs of Semiconductors, Aug. 10-14, 1992 Bejing, China.
• (PCP-94) K. Early, M.L. Schattenburg, D.B. Olster, M.I. Shepard, and H.I. Smith, (Diffraction in Proximity X-ray Lithography: Comparing Theory and Experiment for Gratings, Lines, and Spaces), Microelectronic Engineering 17, 149-152 (1992).
• (PCP-95) W. Chu, M.L. Schattenburg, and H.I. Smith, (Low-Stress Gold Electroplating for X-ray Masks), Microelectronic Engineering 17, 223-226 (1992).
• (PCP-96) H.I. Smith and M.L. Schattenburg, (Lithography for Manufacturing at 0.25 Micrometer and Below), Crucial Issues in Semiconductor Materials and Processing Technologies, NATO ASI Series E, Applied Sciences -Vol. 222, p. 153, eds. S. Coffa, F. Priolo, E. Rimini, and J.M. Poate (Kluwer: Dordrecht, The Netherlands), 1992.
• (PCP-97) P.F. Bagwell, A. Kumar, and R. Lake, (Scattering and Quantum Localization of Electrons in a Waveguide by Static and Time-Varying Potentials), Chapter 2, p 45, Quantum-Effect Physics Electronics & Applications, Inst. of Physics Publishing Ltd., Bristol England, and Philadelphia, ed. by K. Ismail, T. Ikoma, and H.I. Smith (1992).
• (PCP-98) H.I. Smith and M.L. Schattenburg, (Why Bother with X-ray Lithography?) Proc. SPIE Symposium Microlithography, 1671, 228-298, San Jose, CA, March 8-9, 1992.
• (PCP-99) M.L. Schattenburg, J. Carter, W. Chu, R.C. Fleming, R.A. Ghanbari, M. Mondol, N. Polce, and H.I. Smith, (Mask Technology for X-ray Nanolithography), Mat. Res. Soc. Symp. Proc. 306, 63-68 (1993).
• (PCP-100) S.D. Hector and H.I. Smith, (Soft X-ray Projection Lithography using Two Arrays of Phase Zone Plates), OSA Proceedings on Soft X-ray Projection Lithography, Andrew M. Hawryluk and Richard H. Stulen, eds. (Optical Society of America, Washington, DC), 18, 202-206 (1993).
• (PCP-101) S.D. Hector, H.I. Smith, N. Gupta, and M.L. Schattenburg, (Optimizing Synchrotron-Based X-ray Lithography for 0.1 µm Lithography). Microelectronic Engineering, 23, 203-206 (1994).
• (PCP-102) H.I. Smith and M.L. Schattenburg, (X-ray Nanolithography: Limits, and Application to Sub-100 nm Manufacturing), presented at the NATO Workshop on Nanolithography, Rome, Italy April 6-8, 1993; Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies, pp. 103-119, Eds. M. Gentili, et al, Kluwer Academic Publishers, Netherlands (1994).
• (PCP-103) Y. Zhao, D.C. Tsui, M.B. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, H.I. Smith, and K. Kempa, (Mode Softening of Coupled Quantum Wires), submitted to 10th International Conference on the Electronic Properties of Two-Dimensional Systems Salva Regina University, Newport, Rhode Island May 31-June 4, 1993.
• (PCP-104) H. Hu, L.T. Su, I.Y. Yang, D.A. Antoniadis, and H.I. Smith, (Channel and Source/Drain Engineering in High-Performance Sub-0.1 µm NMOSFETs using X-ray Lithography), 1994 Symposium on VLSI Technology Digest of Technical Papers, pp. 17-18, (IEEE cat. No. 94CH3433-0, JSAP cat. No. AP 941211) Honolulu, Hawaii, June 7-9, 1994.
• (PCP-105) M.L. Schattenburg, R.J. Aucoin, R.C. Fleming, I. Plotnik, J. Porter and H.I. Smith, (Fabrication of High Energy X-Ray Transmission Gratings for AXAF), submitted to SPIE Proceedings 2280, EUV, X-ray and Gamma-Ray Instrumentation for Astronomy V, San Diego, CA, July 24-29, 1994.
• (PCP-106) J.N. Damask, J. Ferrera, V.V. Wong, H.I. Smith, and H.A. Haus, (Limitations and Solutions for the Use of Integrated l/4-Shifted Distributed Bragg Resonators in Wavelength-Division Multiplexing Applications), International Symposium on Integrated Optics '94, Lindau, Germany, April 13-14, 1994, proceedings titled Nanofabrication Technologies and Device Integration, Wolfgang Karthe, Chair/Editor; SPIE, v 2213, pp. 137-151 (1994).
• (PCP-107) M. Burkhardt, S. Silverman, H.I. Smith, D.A. Antoniadis, K.W. Rhee, and M.C. Peckerar, (Gap Control in the Fabrication of Quantum-Effect Devices Using X-Ray Nanolithography), Microelectronic Engineering, 27, 307-310 (1995).
• (PCP-108) I.Y. Yang, C. Vieri, A. Chandrakasan, and D.A. Antoniadis, ``Back Gated CMOS on SOIAS for Dynamic Threshold Voltage Control'', IEDM Technical Digest, p. 877, 1995.
• (PCP-109) C. Vieri, I.Y. Yang, C. Chandrakasan, and D.A. Antoniadis, ``SOIAS: Dynamically Variable Threshold SOI with Active Substrate'', Symposium on Low Power Electronics, Digest of Technical Papers, p.86, 1995.
• (PCP-110) A. Chandrakasan, I. Yang, C. Vieri, and D.A. Antoniadis, (Design Considerations and Tools for Low-voltage Digital System Design), IEEE/ACM Design Automation Conference, pp. 113-118, June 1996.
• (PCP-111) D. Berman, R.C. Ashoori, and H.I. Smith, (Single Electron Transistors for Charge Sensing in Semiconductors), Proceedings of the International Conference on Quantum Devices and Circuits, K. Ismail, S. Bandyopadhyay, and J.P. Leburton, eds., (World Scientific, New Jersey) p. 217-223, 1996.
• (PCP-112) E.M. Koontz, G.S. Petrich, L.A. Kolodziejski, M.H. Lim, V.V. Wong, H.I. Smith, and M.S. Goorsky and K.M Matney, (Overgrowth of InGaAsP Materials on Rectangular-Patterned Gratings using GSMBE,) Proceedings of the Ninth International Conference on InP and Related materials, IEEE, Piscataway, NJ, p. 62-65, (1997).
• (PCP-113) J. Goodberlet, S. Silverman, J. Ferrera, M. Mondol, M.L. Schattenburg, and H.I. Smith, (A One-Dimensional Demonstration of Spatial-Phase-Locked Electron-Beam Lithography), Microelectronic Engineering 35, pp. 473-476, (1997).
• (PCP-114) J.S. Foresi, P.R. Villeneuve, J. Ferrera, E.R. Thoen, G. Steinmeyer, S. Fan, J.D. Joannopoulos, L.C. Kimerling, H.I. Smith, E.P. Ippen, (Measurements of Photonic Band Gap Waveguide Microcavities at l=1.564 mm,) CLEO, Baltimore, Maryland, 1997.
• (PCP-115) H.I. Smith, (Recent Progress in X-ray Technology at MIT), 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, Pacifico Yokohama, Japan, July 13-15, 1997.
• (PCP-116) D.J. Twisselmann, B.T. Adekor, M. Farhoud, Henry I. Smith, P.C. Dorsey and C.A. Ross, (In-Plane Anisotropy in CoCr(Ta,Pt)/Cr Films Deposited Onto Substrates With Controlled Topography), in press, Proc. Materials Research Society 571 193-8, (1998). (MRS Spring, 3/98)
• (PCP-117) D.G. Pflug, M. Schattenburg, H.I. Smith and A.I. Akinwande, (100nm Aperture field Emitter Arrays for Low Voltage Applications), IEDM Technical Digest, San Francisco, CA. pp. 855Ñ858, 1998.
• (PCP-118) C.A. Ross, T.A. Savas, H.I. Smith, M. Hwang and R. Chantrell, (Modelling of Hysteresis Loops of Arrays of 100 nm Period Nanomagnets), Intermag 99, Korea, May 1999.
• (PCP-119) J.Goodberlet, (A Very-High-Density Scintillation-Data-Storage Device), Microelectronic Engineering 46 (1999) 145-148.
• (PCP-120) D.J.D. Carter, H.I. Smith, K.W. Rhee and C. Marrian, (Sub-40nm pattern replication with +/- 20% process latitude by soft contact x-ray lithography), Proceedings of SPIE's 24th Annual International Symposium on Microlithography, Emerging Lithographic Technologies III, 14-19 March 1999, Santa Clara, CA. SPIE 3676, pp.70-78 (1999).
• (PCP-121) D.J.D. Carter, D. Gil, R. Menon, I. J. Djomehri and Henry I. Smith, (Zone-Plate Array Lithography (ZPAL): A new maskless approach), Proceedings of SPIE's 24th Annual International Symposium on Microlithography, Emerging Lithographic Technologies III 14-19 March 1999, Santa Clara, CA. SPIE 3676, pp.324-332 (1999).
• (PCP-122) T. E. Murphy, B. E. Little and H. I. Smith, (Wavelength-and Polarization-Insensitive Integrated Directional Couplers using Mach-Zehnder Structures,) in Integrated Photonics Research, OSA Technical Digest, pp. 138-140 (1999).
• (PCP-123) J.G. Goodberlet, B.L. Dunn ,)Deep-Ultraviolet Contact Photolithography), Micro & Nano Engineering, 1999., 11-12. (1999).
• (PCP-124) R. Menon, D.J.D. Carter, D. Gil and H.I. Smith, (Zone-plate-array lighography (ZPAL): Simulations for System Design), In X-Ray Microscopy: Proceedings of the Sixth International Conference, Berkeley, CA, 2-6 August 1999., 647-651 American Institute of Physics, 2000.
• (PCP-125) J.T. Hastings, F. Zhang, J.G. Goodberlet and H.I. Smith, (Improved Pattern-Placement Accuracy in E-Beam Lithography Via Sparse-Sample Spatial-Phase Locking), Microelectronic Engineering 53, 361Ñ364, 2000.
• (PCP-126) H. I. Smith, D. J. D. Carter, M. Meinhold, E.E. Moon, M.H. Lim, J. Ferrera, M. Walsh, D. Gil, R. Menon, (Soft X-Rays for Deep Sub-100 nm Lithography, with and without masks), Microelectronic Engineering 53, 77Ñ84, 2000.
• (PCP-127) Euclid E. Moon, Patrick N. Everett, Mitchell W. Meinhold and Henry I. Smith, (Dynamic three-Dimensional Mask-Wafer Positioning with Nanometer Exposure Overlay Accuracy), Jpn. J. Appl. Phys. Vol. 39, pp. 7040-7043, Part 1, No. 12B, December 2000.
• (PCP-128) Henry I. Smith, (Patterning Accuracy in X-ray Lithography, New Approaches and Applications), XEL 2000 Conference, Yokohama, Japan, M1-3, November, 2000.
• (PCP-129) H. I. Smith, D. Carter, D. Gil and R. Menon, (Zone-Plate Array Lighography (ZPAL): A Maskless Approach Extendible to 20 nm), XEL 2000 Conference, Yokohama, Japan, 7-1, November, 2000.
• (PCP-130) Henry Smith, (The Role of Lithography and the Planar Process), Proceedings, Korea-U.S. Forum on Nano Science and Technology, p. 58-71, Cambridge. September, 2000.
• (PCP-131) M. Hwang, M. Farhoud, Y. Hao, M. Walsh, T.A. Savas, H.I. Smith and C. A. Ross, (Major hysteresis loop modelling of two-dimensional arrays of single-domain particles), IEEE Transactions on Magnetics, 36(5), pp. 3173-3175, September 2000.
• (PCP-132) H. Bergner, L.M. Cohen, M.L. Schattenburg and G. Monnelly, (Precision assembly station for high-resolution segmented optics), Proc. SPIE 4138, X-Ray Optics, Instruments and Missions IV, Eds. R. B. Hoover and A.B.C. Walker, 134-145 (2000).
• (PCP-133) Glen P. Monnelly, Olivier Mongrard, David Breslau, Nat Butler, Carl G. Chen, Lester Cohen, Wendy Gu, Ralf K. Heilmann, Paul T. Konkola, George R. Ricker, and Mark L. Schattenburg, (High-Accuracy X-ray Foil Optic Assembly), Proc. SPIE 4138, X-Ray Optics, Instruments and Missions IV, eds. R.B. Hoover and A.B.C. Walker, 164-173 (2000).
• (PCP-134) K.A. Flanagan, T.H. Markert, J.E. Davis, M.L. Schattenburg, R.L. Blake, F. Scholze, P. Bulicke, R. Fliegauf, S. Kraft, G. Ulm, E.M. Gullikson, (Modeling the Chandra High Energy Transmission Gratings below 2 keV) Proc. SPIE 4140, X ÐRay and Gamma-Ray Instrumentation for Astronomy XI, pp. 111-122, Eds. K.A. Flanagan and O.H.W. Siegmund, 2000.
• (PCP-135) R. Petre, L.M. Cohen, D.A. Content, J.D. Hein, T. Saha, M. Schattenburg, and W. Zhang, (Progress towards Meeting the Constellation-X Performance Goals using segmented X-ray Mirrors), Proc. SPIE 4138 pp. 16-24, 2000.
• (PCP-136) Y. Hao, M. Walsh, C.A. Ross, H.I. Smith, J. Wang, L. Malkinski, (In-plane anisotropy in arrays of magnetic ellipses), IEEE Trans. Magn. 36(5), 2996-2998. (2000).
• (PCP-137) David G. Pflug, Mark Schattenburg, Henry I. Smith and Akintunde I. Akinwande, (Field Emitter Arrays for Low Voltage Applications with sub 100 nm apertures and 200 nm period). Presented at the 2001 IEDM, 2-5 December, Washington, DC pp. 179-182.
• (PCP-138) M.L. Schattenburg, C.G. Chen, R.K. Heilmann, P.T. Konkola and G.S. Pati, (Progress towards a general grating patterning technology using phase-locked scanning beams), Proceedings of the SPIE, Vol. 4485, 378-384 (2002).
• (PCP-139) Mark L. Schattenburg and Henry I. Smith, (The critical role of metrology in nanotechnology), Proceedings of the SPIE, Nanostructure Science, Metrology, and Technology, Martin C. Peckerar and Michael T. Postek, Jr. Chairs/Editors, Vol. 4608, pages 116-124, Gaithersburg, MD, 2001.
• PCP-140 M. Shima, M. Hwang. M. Farhoud, T. A. Savas, A. Tkzacyk, H. I. Smith, C. A. Ross, W. Schwarzacher, “Fabrication and magnetic properties of arrays of electrodeposited cylinders”, Proc. Electrochem. Soc. PV2000-29 p.111 (2001)
• PCP-141 C. G. Chen, P. T. Konkola, R. K. Heilmann, C. Joo and Mark Schattenburg, “Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography”, Published in Proc. SPIE 4936, pp. 126-134, (2003).
• PCP-142 R. Menon, D. Gil, H. I. Smith, "Zone-plate-array lithography: a maskless fast-turn-around system for microoptic device fabrication", Invited Paper at the Photonics West 2003, 25-31 January 2003, San Jose Convention Center, San Jose, CA USA, Published in the Proceedings of Micromachining and Microfabrication, San Jose, CA, January 25-31, 2003. SPIE vol. 4984, pp.10-17, 2003
• PCP-143 S. M. Jurga, C. Hidrovo, J. Niemczura, H. I. Smith, and G. Barbastathis, Nanostructured origami,IEEE Nanotechology 2003, San Francisco, CA, Aug 12-14 (paper TR-4).

AWAITING PUBLICATION:

• PCP-A G.D. U’Ren, K.M. Matney, M.S. Goorsky, M. Wormington, E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, and H.I. Smith, “Triple Axis diffraction Studies of InGaAsP/InP Epitaxial Overgrowth Grating Structures”, to be published in The 46th Annual Denver X-ray Conference Proceedings.
• PCP-B Minghao Qi, Steven G. Johnson, John D. Joannopoulos and Henry Smith, “Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 um”, Conference on Lasers and Electro-Optics", June 1-6, Baltimore, Maryland 2003.
• PCP-C Tymon Barwicz, Milos A. Popoviae, Peter T. Rakich, Michael R. Watts, Hermann Haus, Erich Ippen and Henry I. Smith, “Fabrication and analysis of add-drop filters based on microring resonators in SiN”, submitted to OFC:04 (Optical Fiber Communication Conference) in Los Angeles CA from Feb 22-27, 2004.
• PCP-D Ytshak Avrahami, Milos A. Popovic, Tymon Barwicz, Peter T. Rakich, Michael R. Watts, Francisco Lopez-Royo, Fabrizio Giancometti, Mark Beals, Lionel C. Kimerling, Henry I. Smith, Hermann A. Haus, Harry L. Tuller, George Barbastathis, “MEMS enabled optical switching with high-index contrast ring resonator filters. (submittedto OFC:04 (Optical Fiber commnication Conference) in Los Angeles, CA. Feb 22-27, 2004.
• PCP-E Hyun Jin In, Will Arora, Tilman Buchner, Stanley M. Jurga, Henry I. Smith, George Barbastathis, “The Nanostructured Origami 3D Fabrication and Assembly Process for Nanomanufacturing”, IEEE Nano 04, Munich, Germany.

Conference Presentations (Abstract Only)

• (CP-1) H.I. Smith, (The Fabrication of Microsound Components), IEEE International Conv. Digest, p. 90-91 (1969). (Report MS-2457; ESD-TR-70-88).
• (CP-2) R.C. Williamson and H.I. Smith, (The Reflection of Elastic Surface Waves from Periodic Arrays on YX LiNbO3), IEEE Ultrasonics Symposium, Miami, FL, December 6-8, 197l.
• (CP-3) R.C. Williamson and H.I. Smith, (Large Time Bandwidth Product Surface Wave Pulse Compressor Employing Reflective Gratings), Ultrasonics Symposium, Boston, MA, October 4-7, 1972.
• (CP-4) D.L. Spears and H.I. Smith, (High Frequency Surface Wave Transducers Fabricated by X-ray Lithography), IEEE Ultrasonics Symposium, Boston, MA, October 6, 1972.
• (CP-5) H.I. Smith, J. Melngailis, R.C. Williamson, and W.T. Brogan, (Ion Beam Etching of Surface Gratings), J. Vac. Sci. Technol. 10, 1127 (1973).
• (CP-6) H.I. Smith, (X-ray and Optical Replication of Electron Beam Generated Masks), IEEE Digests of the Intermag. Conference, Toronto, Canada, May 14-17, 1974. Also, IEEE Boston Section of Sonics & Ultrasonics, February 5, 1974.
• (CP-7) S.E. Bernacki and H.I. Smith, (X-ray Lithography Applied to Silicon Device Fabrication), Electrochemical Society Meeting, San Francisco, CA, May 12-17, 1974.
• (CP-8) R.J. Hawryluk, A. Soares, H.I. Smith, and A.M. Hawryluk, (Experimental Evaluation of Electron Scattering Models), Electrochemical Society Meeting, San Francisco, CA, May 12-17, 1974.
• (CP-9) D.C. Flanders, H.I. Smith, and S.E. Bernacki, (X-ray Lithographic Replication of 1000? Linewidth Patterns using CuL Radiation), Electrochemical Society Spring Meeting, Washington, DC, May 2-7, 1976.
• (CP-10) D.C. Flanders and H.I. Smith, (X-ray Lithographic and Processing Technologies for Fabricating Surface Relief Gratings with Profile Control < 400?), 14th Symposium on Electron, Ion & Photon Beam Technol., Palo Alto, CA, May 27, 1977.
• (CP-11) D.C. Flanders, D.C. Shaver, and H.I. Smith, (Submicrometer Spatial-Period Surface-Relief Gratings for Orienting Crystalline Overlayers), 8th International Conference Electron & Ion Beam Science & Technology, Seattle, WA, May 1978.
• (CP-12) H.I. Smith, D.C. Flanders, and M.W. Geis, (Fabrication and Application of Submicrometer Structures), Dry Etching Seminar, Danvers, MA, October 1978. (Invited)
• (CP-13) H.I. Smith and D.C. Flanders, (X-ray Lithography - A Review and Assessment of Future Applications), Semicon East, Boston, MA, September 1979. H.I. Smith and D.C. Flanders, (X-ray Lithography - A Review and Assessment of Future Applications), Semicon East, Boston, MA, October 1979. (Invited)
• (CP-14) H.I. Smith and D.C. Flanders, (X-ray Lithography - A Review and Assessment of Future Applications), 26th National Vacuum Symposium, New York, NY, October 1979. (Invited)
• (CP-15) M.W. Geis, D.A. Antoniadis, D.C. Flanders, and H.I. Smith, (Crystallographic and Electrical Properties of Silicon Produced by Graphoepitaxy), Mat. Res. Soc., Boston, MA, November 26-30, 1979.
• (CP-16) H.I. Smith, (Artificial Microstructure Research and Its Impact on Future Integrated Circuits), Conference on Advanced Research in Integrated Circuits, MIT, Cambridge, MA, January 1980. (Invited)
• (CP-17) H.I. Smith, (Microfabrication for Guided-Wave Optical Devices), Topical Meeting on Integrated and Guided-Wave Optics, Incline Village, NV, January 1980. Integrated and Guided Wave Optics Technical Digest, IEEE (1980). (Invited)
• (CP-18) H.I. Smith, (Microlithography and New Materials for VLSI), Workshop on Microprocessors in Military and Industrial Systems, Johns Hopkins University, MD, January 15-16, 1980. (Invited)
• (CP-19) H.I. Smith and D.C. Flanders, (A Review of X-ray Lithography), Electrochemical Society Meeting, May 1980.
• (CP-20) H.I. Smith, (Graphoepitaxy of Silicon on Amorphous Substrates), March Meeting of the American Physical Society, New York, NY, (1980). (Invited)
• (CP-21) P.F. Liao and J.G. Bergman, (Surface Enhanced Raman Spectroscopy on Lithographically Produced Silver Microstructures), Annual Meeting of the Optical Society, Chicago, IL, October 1980. Abstract in J. Opt. Soc. Amer.
• (CP-22) H.I. Smith, (Submicrometer Structures Technology), Symposium uber Mikrostrukturforschung, Institut fur Halbleitertechnik, Aachen, FRG, March 5-6, 1981. (Invited)
• (CP-23) H.I. Smith, (Review of Conventional Submicrometer Fabrication Techniques), Workshop on the Interaction of Laser Radiation with Surfaces for Application to Microelectronics, MIT, Cambridge, MA, May 4-5, 1981. (Invited)
• (CP-24) M.W. Geis, D.J. Silversmith, J.C.C. Fan, B.Y. Tsaur, H.I. Smith and D.A. Antoniadis, (Preparation of Oriented Silicon Films on Insulating Amorphous Substrates), Electronic Materials Conference, Santa Barbara, CA, June 24-26, 1981.
• (CP-25) S.S. Dana and H.I. Smith, (Studies of Graphoepitaxy by CVD and Solution Growth), 5th International Conference on Vapor Growth and Epitaxy/5th American Conference on Crystal Growth, Coronado, CA, July 19-24, 1981; A.L. Gentile, Conference Secretariat.
• (CP-26) R. Tatchyn, I. Lindau, M. Hecht, E. Kallne, E. Spiller, R. Bartlett, J. Kallne, J.H. Dijkstra, A.M. Hawryluk, and R.Z. Bachrach, (The First use of Transmission Gratings for Measurements of Optical Constants in the Soft X-ray Range), presented at Cornell Synchrotron Meeting, July 1981. (To be published, Nuclear Instruments and Methods).
• (CP-27) N.M. Ceglio, M. Roth, and A.M. Hawryluk, (Time Resolved X-ray Spectra from Laser Fusion Plasmas), Bulletin American Physical Society, October 1981.
• (CP-28) M.W. Geis, H.I. Smith, B.Y. Tsaur, and J.C.C. Fan, (Crystallographic Characteristics of Si Films Recrystallized by Zone Melting), Materials Research Society Conference, Boston, MA, November 1981.
• (CP-29) N.M. Ceglio, A.M. Hawryluk, and R.H. Price, (Space & Time Resolved Soft X-ray Spectra using X-ray Transmission Gratings), Brookhaven Conference on High Resolution Soft X-ray Optics, SPIE, E. Spiller, Chairman, November 16-20, 1981.
• (CP-30) R.F. Kwasnick, M.A. Kastner, and J. Melngailis, (Electronic Conduction in Ultra-Narrow Silicon Inversion Layers), post-deadline poster presented at March Meeting of the American Physical Society (1982).
• (CP-31) M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, D.J. Silversmith, and R.W. Mountain, (Control of Subboundaries in Zone-Melted Recrystallized Si Films), presented at 24th Electronics Materials Conference, Colorado State University, Fort Collins, CO, June 23-25, 1982.
• (CP-32) C.V. Thompson, (Graphoepitaxy), Gordon Research Conference on Crystal Growth, NH, July 12-16, 1982.
• (CP-33) M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, D.J. Silversmith, and R.W. Mountain, (Entrainment of Subboundaries in Zone-Melting Recrystallized Si Films), SOS/SOI Technology Workshop, Provincetown, MA, October 5-7, 1982.
• (CP-34) M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, D.J. Silversmith, and R.W. Mountain, (Entrainment of Subboundaries in Zone-Melted Recrystallized Si Films), Materials Research Symposium, Boston, MA, November 1, 1982.
• (CP-35) R.J. Hawryluk, G.L. Schmidt, R.J. Fonck, R.J. Goldston, T. McBride, D. McCune, and A.M. Hawryluk, (Contribution of Fast Charge Exchange Neutrals to Bolometric Measurements on PDX), 24th Annual Meeting Division of Plasma Physics, November 1-5, 1982.
• (CP-36) R.F. Kwasnick, M.A. Kastner, and J. Melngailis, (Electronic Conduction in Ultra-Narrow Si Inversion Layers), presented at March Meeting of the American Physical Society, Bulletin American Physical Society 28, 322 (1983).
• (CP-37) A.C. Warren, D.A. Antoniadis, J. Melngailis, and H.I. Smith, (Submicrometer-Period Channel Modulation of a MOSFET), presented at the International Symposium on Electron, Ion and Photon Beams, Los Angeles, CA, May 31 - June 3, 1983.
• (CP-38) M.L. Schattenburg, C.R. Canizares, H.I. Smith, and A.M. Hawryluk, (Submicrometer-Period Transmission Diffraction Gratings for X-ray Astronomy), presented at the International Symposium on Electron, Ion and Photon Beams, Los Angeles, CA, May 31 - June 3, 1983.
• (CP-39) E.H. Anderson and H.I. Smith, (TEM Analysis of Vertical-Slab Cross Section of Submicrometer Structures), presented at the International Symposium on Electron, Ion and Photon Beams, Los Angeles, CA, May 31 - June 3, 1983.
• (CP-40) H.A. Atwater, C.V. Thompson, H.I. Smith, and M.W. Geis, (Orientation Filtering by Growth Velocity Competition in Zone-Melting Recrystallization of Si on SiO2), Electronic Materials Conference, Burlington, VT, June 23-25, 1983.
• (CP-41) C.V. Thompson and H.I. Smith, (Silicon-on-Insulator by Solid State Surface-Energy-Driven Secondary Recrystallization), Electronic Materials Conference, Burlington, VT, June 1983.
• (CP-42) H.I. Smith, (Graphoepitaxy to Circumvent Lattice Matching Constraints), 4th International Conference on Integrated Optics and Optical Fiber Communication (Post-Conference Meeting), Tokyo, Japan, July 2, 1983. (Invited)
• (CP-43) H.I. Smith, (Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films), 7th International Conference on Crystal Growth, Stuttgart, FRG, September 12-16, 1983. (Invited)
• (CP-44) C.V. Thompson and H.I. Smith, (Silicon-on-Insulator by Surface-Energy-Driven Secondary Recrystallization with Patterning), 7th International Conference on Crystal Growth, Stuttgart, FRG, September 12-16, 1983.
• (CP-45) M.W. Geis, H.I. Smith, C.K. Chen, B.-Y. Tsaur, R.W. Mountain, and D.J. Silversmith, (Subboundary Entrainment in Strip-Heater Recrystallized Si Films), Materials Research Society Spring Meeting, Albuquerque, NM, February 27-29, 1984.
• (CP-46) T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, (Graphoepitaxy of Ge by Solid-State Surface-Energy-Driven Secondary Grain Growth), 6th American Conference on Crystal Growth and 6th International Conference on Vapor Growth and Epitaxy, Atlantic City, NJ, July 15-20, 1984.
• (CP-47) C.V. Thompson, (Secondary Grain Growth in Ultra-Thin (< 100 nm) Films of Silicon and Germanium), Interface Migration and Control of Microstructure Symposium of the Annual American Society of Metals Congress, Detroit, MI, September 1984. (Invited)
• (CP-48) G.G. Shahidi, E.P. Ippen, and J. Melngailis, (Submicron-gap High-Mobility Picosecond Photodetectors), Topical Meeting on Picosecond Electronics and Optoelectronics, Lake Tahoe, NV, March 13-15, 1985.
• (CP-49) S.Y. Chou, D.A. Antoniadis, and H.I. Smith, (Observation of Velocity Overshoot in Deep Submicron (0.08 µm) Channel MOSFETS in Si), 43rd Annual Device Research Conference, Boulder, CO, June 17-19, 1985.
• (CP-50) A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, (One-Dimensional Conductivity in Multiple, Parallel Inversion Lines), 43rd Annual Device Research Conference, Boulder, CO, June 17-19, 1985.
• (CP-51) A.C. Warren, D.A. Antoniadis, and H.I. Smith, (Modelling Quantum Confinement and Quasi-1D Conduction in the Silicon Grating-Gate FET), presented at the Yamada Conference XIII on Electronic Properties of Two-Dimensional Systems, Kyoto, Japan, September 9-13, 1985.
• (CP-52) S.Y. Chou, H.I. Smith, and D.A. Antoniadis, (Drain Current Oscillations in Sub-100 nm Channel Si MOSFET's Fabricated using X-ray Lithography), 30th International Symposium on Electron, Ion and Photon Beams, Boston, MA, May 27-30, 1986.
• (CP-53) H.I. Smith, (X-ray Nanolithography for Sub-100 nm Devices), American Physical Society Spring Meeting, New York, NY, March 17, 1987. (Invited Paper)
• (CP-54) G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, (Reduction of Hot-Electron Effects in Sub-100 nm Channel Length Si MOSFETs), presented 5th International Conference on Hot Carrier Effects, July 20-24, 1987, Boston, MA, Proc. to be published Pergamon Press.
• (CP-55) H.I. Smith, (Fabrication and Performance of Sub-100 nm Electronic Devices), presented Workshop on Chemical Concepts for Ultrasmall Electronic Devices, Cambridge, MA, October 27-29, 1987.
• (CP-56) P.F. Bagwell and T.P. Orlando, (Conductance of Quasi-One-Dimensional Wires and Superlattices), Bulletin American Physical Society 33, 366 (1988).
• (CP-57) S.L. Park, M.A. Kastner, S.B. Field, (Temperature Dependence of the Magnetoconductance in Narrow Inversion Layers), Bulletin American Physical Society 33, 489 (1988).
• (CP-58) J. Scott-Thomas, M.A. Kastner, S.B. Field, D.A. Antoniadis, and H.I. Smith, (Conductance Measurements of a Novel 1-Dimensional MOSFET), Bulletin American Physical Society 33, 489 (1988).
• (CP-59) H.A. Atwater, C.V. Thompson, and H.I. Smith, (Strain and Thin Film Grain Growth during Ion Bombardment), Bulletin American Physical Society 33, 743 (1988).
• (CP-60) G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, (Reduction of Hot-Electron-Generated Substrate Current in Sub-100 nm Channel Lengths Si MOSFETS), Device Research Conference, Boulder, CO, June 1988.
• (CP-61) H.A. Atwater, C.V. Thompson, and H.J. Kim, (The Role of Point Defects in Ion Bombardment Enhanced Grain Growth and Dopant Enhanced), IBMM 6th International Conference on Ion Beam Modification of Materials, The Jap Soc. of Appl. Phys. Tokyo, Japan, June 12-17, 1988.
• (CP-62) T.P. Orlando, P.F. Bagwell, H.I. Smith, and D.A. Antoniadis, (Quantum Mechanical Effects in Field-Effect Transistors with Nanostructured Geometries), The Electrochemical Society Fall Meeting, Chicago, IL (1988). (Invited).
• (CP-63) P.F. Bagwell and T.P. Orlando, (Finite Voltage Tunneling in Ballistic Devices), presented at the March American Physical Society Meeting, St. Louis, MO. Bulletin American Physical Society, 34, 502 (1989).
• (CP-64) H.I. Smith, (X-ray Lithography and Nanostructure Fabrication), Meeting of the American Physical Society, St. Louis, MO, March 20-24, 1989. (Invited).
• (CP-65) D.A. Antoniadis, (Surface Superlattice and Quasi-One-Dimensional Devices in GaAs), Meeting of the American Physical Society, St. Louis, MO, March 20-24, 1989. (Invited)
• (CP-66) C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, (Far-Infrared and Magneto-Capacitance Measurements on GaAs/AlGaAs Lateral Surface Superlattice), presented at American Physical Society Meeting, St. Louis, MO, March (1989).
• (CP-67) P.F. Bagwell, K. Ismail, R. Ghanbari, W. Chu, A. Yen, D.A. Antoniadis, H.I. Smith, and T.P. Orlando, (A Simple Explanation of Quantum Oscillations in the Conductance of Quasi One-Dimensional and Superlattice HEMT Transistors), presented at the 47th Device Research Conference, Boston, MA (1989).
• (CP-68) K. Ismail, D.A. Antoniadis, and H. I. Smith, (Fabrication Challenges of Surface-Structured Quantum-Effect Devices), presented at Symposium on (New Phenomena in Microscopic Structures, Kona, Hawaii, December 6-9, 1989.
• (CP-69) P.F. Bagwell, A. Kumar, and T.P. Orlando, ("Evanescent Modes and Scattering in Quasi-One-Dimensional Wires), Bull. Am. Phys. Soc. 35, 493 (1990).
• (CP-70) T.P.E. Broekaert, P.F. Bagwell, T.P. Orlando, and C.G. Fonstad, (Resonant Tunneling Diodes and Transistors with a One, Two, or Three Dimensional Electron Emitter), Bull. Am. Phys. Soc. 35, 298 (1990).
• (CP-71) C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, (Observation of Landau Level Splitting in Magneto-Capacitance Measurements on GaAs/AlGaAs Two-Dimensional Surface Superlattice Structures), Bull. Am. Phys. Soc. B 35, 597 (1990).
• (CP-72) U. Meirav, M.A. Kastner, M. Heiblum, and S.J. Wind, (Single Electron Charging and Conductance Oscillations in GaAs Nanostructures), Bull. Am. Phys. Soc. 35, 721 (1990).
• (CP-73) J.H.F. Scott-Thomas, M.A. Kastner, S.B. Field, H.I. Smith, and D.A. Antoniadis, (Conductance Oscillations of 1-Dimensional Hole and Electron Gases), Bull. Am. Phys. Soc. 35, 731 (1990).
• (CP-74) P.F. Bagwell, T.P. Orlando, and A. Kumar, (Low-Dimensional Resonant Tunneling), presented at the NATO Advanced Research Workshop on Resonant Tunneling in Semiconductors: Physics and Applications, El Escorial, Spain (1990).
• (CP-75) C.C. Eugster, J.A. del Alamo, and M.J. Rooks, (Ballistic Transport in a Novel Grated Quantum Wire), presented at the 48th Annual Device Research Conference, Santa Barbara, CA, June 25-27, 1990.
• (CP-76) A. Kumar and P.F. Bagwell, (Resonant Tunneling in a Q1-Dimensional Wire), presented at Techcon, October (1990).
• (CP-77) H.I. Smith, K. Ismail, and D.A. Antoniadis, (Investigations of Field-Effect-Controlled Mesoscopic Structures Fabricated with X-ray Nanolithography), presented at the Advanced Heterostructure Transistors Conference, Kona, Hawaii, December (1990).
• (CP-78) M.W. Geis and H.I. Smith, (Production of Large-Area Mosaic Diamond Films Approaching Single-Crystal Quality), ECS Fall Meeting, #179 Washington, DC (1990).
• (CP-79) S.L. Park, P.F. Bagwell, A. Yen, D.A. Antoniadis, H.I. Smith, T.P. Orlando, and M.A. Kastner, (Magnetotransport in Multiple Narrow Si Inversion Channels Opened Electrostatically Into a Two-Dimensional Electron Gas), Bull. Am. Phys. Soc. 36, 360 (1991).
• (CP-80) P.F. Bagwell and A. Kumar, (Evolution of the Quantized Ballistic Conductance with Increasing Disorder in Narrow Wire Arrays), Bull. Am. Phys. Soc. 36, 359 (1991).
• (CP-81) Y. Zhao, D.C. Tsui, S.J. Allen, K. Ismail, H.I. Smith, and D.A. Antoniadis, (Spectroscopy of 2-Deg in a Grid Gate Patterned Heterostructure), presented at March 18-26 Meeting of the American Physical Society, Cleveland, O, Bull. Am. Phys. Soc. (1991).
• (CP-82) M.L. Schattenburg, K. Li, R.T. Shin, J.A. Kong, and H.I. Smith, (Calculation of Soft X-ray Diffraction from Nanometer-Scale Gold Structures using a Finite-Element Time-Domain Method), Progress in Electromagnetics Research Symposium, Cambridge, MA, July 1-5, (1991).
• (CP-83) G. Rittenhouse, H.I. Smith, J.M. Graybeal, B. Meyerson, (A Novel Structure for a Three-Terminal Superconducting Resonant Tunneling Device), presented at March 18-26 Meeting of the American Physical Society, Cleveland, O, Bull. Am. Phys. Soc. (1991).
• (CP-84) C.C. Eugster, J.A. del Alamo, and M.J. Rooks, (Planar Field-Effect Coupled Quantum Wires), Device Research Conf., Boulder, CO, June (1991).
• (CP-86) Y. Zhao, D.C. Tsui, M. Santos, M. Shayegan, R. Ghanbari, H.I. Smith, (Magneto-optical Absorption in a Two Dimensional Electron Grid), Bull. Am. Phys. Soc. 37, 234 (1992).
• (CP-87) Y. Zhao, D.C. Tsui, K. Hirakawa, M. Santos, M. Shayegan, R. Ghanbari, D.A. Antoniadis, and H.I. Smith, (Far Infrared Magneto-Absorption by the 2 DEG in GaAs/AlGaAs Heterostructures with Grid Gates), Amer. Phys. Soc., Indiannapolis, IN, March 16-20, 1992.
• (CP-88) C.R. Canizares, D. Dewey, E.B. Galton, T.H. Markert, H.I. Smith, M.L. Schattenburg, B.E. Woodgate, and S. Jordan, (The MIT Resolution X-ray Spectroscopy Instruments on AXAF), presented at AIAA Space Programs & Technologies Conference, Huntsville, AL, March 24-27, 1992.
• (CP-89) H.I. Smith and D.A. Antoniadis, (Mesoscopic Devices: Will they Supersede Transistors in ULSI?), presented International Conference on Solid State Devices and Materials, Tsukuba, Japan, August 26-28, 1992.
• (CP-90) A. Kumar, (Electron States and Potentials in Quantum Dot Structures), presented at Amer. Phys. Soc. Meeting (Symposium on Charging Effects in Quantum Dots), Indianapolis, ID American Physical Society Bull. 37, 429 (1992).
• (CP-91) H.I. Smith, (History of X-ray Lithography), presented at Optcon '92, Boston, MA, November 15-20, 1992.
• (CP-92) H.I. Smith and M.L. Schattenburg, (Proximity X-ray Nanolithography-Current Performance and Theoretical Limits, presented at the Amer. Vac. Society 39th National Symposium, Hyatt Regency, Chicago IL , November 9-13, 1992.
• (CP-93) C.O. Bozler, C.T. Harris, S.Rabe, D.D. Rathman, W.D. Goodhue, M.A. Hollis, and H.I. Smith, (Arrays of Gated Feild-Emitter Cones having 0.32 µm Tip-to-Tip Spacings), presented 6th International Vac. Microelectronics Conference, Newport, R.I., July 12-15, 1993.
• (CP-94) C.O. Bozler, C.T. Harris, S.Rabe, D.D. Rathman, W.D. Goodhue, M.A. Hollis, and H.I. Smith, (Fabrication and Performance of Gated Field-Emitter Arrays having 0.32 µm Tip-to-Tip Spacings), presented at the Electrochemical Society Meeting, New Orleans, LA, October 10-15, 1993.
• (CP-96) J.N. Damask, V.V. Wong, J. Ferrera, H.I. Smith, and H.A. Haus, (Optical Distributed-Feedback Channel-Dropping Filters: Design and Fabrication), LEOS '93 6th Annual Meeting, San Jose, CA, November 15-18, 1993. (Invited Paper)
• (CP-97) J.N. Damask, V.V. Wong, J. Ferrera, H.I. Smith, and H.A. Haus, (High-Coherence QWS Gratings for Optoelectronic Devices: Why Spatial-Phase-Locked E-Beam Lithography is Necessary), Fiber Communications Conference '94, San Jose, CA, February 20-25, 1994.
• (CP-98) H.I. Smith, (X-ray Lithography: the Past and the Future), Forum on X-ray Lithography, held at NTT, Japan, June 16-17, 1994 (Invited).
• (CP-99) J.N. Damask, V.V. Wong, J. Ferrera, H.I. Smith, and H.A. Haus, (Highly-Coherent Electron-Beam-Written Quarter-Wave-Shifted Distributed Bragg Resonators for Channel-Dropping Filters), Optical Fiber Communications Conference '95, San Diego, CA, February 26 - March 3, 1995.
• (CP-100) M. Burkhardt, D.J. Carter, D.A. Antoniadis, T.P. Orlando, Henry I. Smith and M.R. Melloch, (Coulomb BLockade Effects in Double Quantum Dots), Meeting of The American Physical Society, San Jose, CA, March 20-24, 1995.
• (CP-101) I.Y. Yang, V.V. Wong, J.N. Damask, J. Ferrera, M. Burkhardt, S. Silverman, D.A. Antoniadis, and H.I. Smith, (Sub-100nm Electronic, Optoelectronic, and Quantum-effect Device Fabrication), 1995 International Workshop on X-ray and Extreme Ultraviolet Lithography, Osaka, Japan, July 23-26, 1995.
• (CP-102) H.I. Smith, (Lithographic Approaches and Their Limitations,) International Symposium on Future Information Processing Technologies, held at Haikko Manor Hotel, Porvoo, Finland, Sept. 4-8, 1995.
• (CP-103) A. Franke and M.L. Schattenburg, (Super-smooth x-ray reflection grating technology,) High Throughput X-ray Spectroscopy Workshop, Cambridge, Massachusetts, September 30-October 1, 1996.
• (CP-104) M.H. Lim, M.L. Schattenburg, and H.I. Smith, (An Inverted X-Ray Mask Configuration Compatible with Pellicle Protection,) 1997 International Conference on Elect. Ion and Photon Beam Technology and Nanofabrication, Dana Point, CA. May/June 1997.
• (CP-105) H.I. Smith, (Sub-100nm electronic devices and lithographic technologies-present and prospects for the next 15 years), Japan Society for the Promotion of Science (JSPS), Kyoto, Japan, July 17, 1997.
• (CP-106) E.M. Koontz, G.S. Petrich, L.A. Kolodziejski, M.H. Lim, V.V. Wong, H.I. Smith, and M.S. Goorsky and K.M Matney, (Overgrowth of InGaAsP Materials on Rectangular-Patterned Gratings using GSMBE,) Presented at the Ninth International Conference on InP and Related Materials, Hyannis, MA, May 11-15, 1997.
• (CP-107) G.D. UÕRen, K.M. Matney, M.S. Goorsky, M. Wormington, E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, and H.I. Smith, (Triple Axis Diffraction Studies of InGaAsP/InP Epitaxial Overgrowth Grating Structures), Presented at the 46th Annual Denver x-ray Conference, Steamboat Springs, CO, August 4-8, 1997.
• (CP-108) G.D. UÕRen, M.S. Goorsky, K.M. Matney, E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziesjki, Henry I. Smith, and M. Wormington, (Analysis of Lattice Distortions in High Qualty InGaAsP Epitaxial Overgrowth of Rectangular-Patterned InP gratings), Presented at the 16th North American Conference on Molecular Beam Epitaxy, Ann Arbor, MI, October 5-8, 1997.
• (CP-109) H.I. Smith, (Nanofabrication: The role of feedback, templates, lithography and self organization), Second Beckman/Hitachi/RIKEN International Workshop on Molecular & Electronic Nanostructures, Hitachi Advanced Res. Lab., Hatoyama, Saitama, Japan, Nov. 13-14, 1997.
• (CP-110) E. Moon, P.N. Everett and H.I. Smith, (A Robust, Feedback-Stabilized, Sub-1nm Detectivity Mask-Alignment System), Techcon Õ98 Conference held in Alexis Park Resort, Las Vegas, Nevada, September 9-11, 1998.
• (CP-111) J. Ferrera, (Spatial-Phase-Locked E-beam Lithography), Techcon Õ98 Conference held in Alexis Park Resort, Las Vegas, Nevada, September 9-11, 1998.
• (CP-113) H.I. Smith, (Nanofabrication: The role of feedback, templates, lithography and self organization), Fifth International Symposium on Quantum Confinement 194th meeting of the Electrochemical Society, Boston, MA. November 2-5, 1998.
• (CP-114) C.A. Ross, M. Farhoud, M. Hwang, H.I. Smith, (Fabrication of large area periodic magnet arrays using interferometric lithography), APS March Meeting (1998).
• (CP-115) C.A. Ross and H.I. Smith, (Interferometric lithography and x-ray nanolithography for MRAM applications), Proceedings of DARPA Spintronics Workshop, Minneapolis, July (1998).
• (CP-116) David Carter, (Sub-40 nm X-ray Lithography.) Poster presented at the Gordon Research Conference on Nanostructure Fabrication, Tilton, NH, June 21-26, 1998.
• (CP-117) C.A. Ross and H.I. Smith, (Patterned magnetic recording media), abstract submitted to International MRS Conference, China, 1999
• (CP-118) D.J.D. Carter, (X-ray lithography in the Deep Sub-100 nm Regime) The 1998 International Workshop on Proximity X-Ray Lithography, XEL Ô98, Yokohama, Japan, November 9-10, 1998
• (CP-119) C-C. Hsu, R.S. Indeck, A. jander, M.w. Muller, C.A. Ross, D.J. Twisselmann, (MFM Observation of Magnetization Reversal Process in Recording Media with Lithographically Defined Texture), submitted to the MMM conference, November 1999.
• (CP-120) K. Murooka, M. H. Lim, J. Ferrera, and Henry I. Smith, (X-ray lithography below 100 nm: An approach to eliminating distortion), XEL 1999, Yokohama, Japan, November 1999.
• (CP-121) M. J. Khan, M. Lim, C. Joyner, t. Murphy, A. Haus, Henry I. Smith, (Integrated Bragg Grating Structures), 2001 IEEE/LEOS Summer Topical Meetings, Copper Mountain Resort, Copper Mountain, Colorado, 30 July - 1 August, 2001.
• (CP-122) D. J. D Carter, D. Gil, R. Menon, X. Tang, H.I. Smith, (Functional Prototype Maskless Zone-Plate-Lithography (ZPAL) System), Opt. Soc. Amer., Long Beach, CA. October 15-17, 2001.
• (CP-123) D. Gil, R. Menon, M. Peuker, D.J.D. Carter, X. Tang, and H.I. Smith, (High Numerical-Aperture UV Fresnel Phase Zone Plates for Lithography and Imaging), Opt. Soc. Amer., Long Beach, CA. October 15-17, 2001.
• (CP-124) E. Lavallee, J. Beauvais, D. Drouin, M. Cloutier, L. K. Mun, Y. Awad, Henry I. Smith, M. H. Lim, J. Carter, M. Schattenburg, (Evaporated electron beam sensitive organic resist for the back-patterning of x-ray lithography masks), to be presented at NNC in Yokohama, Japan.
• (CP-125) D. Mascaro, J. Zartman, Henry I. Smith, V. Bulovic, (Forming Oriented Organic Crystal Needles by Solvent Vapor Annealing of Amorphous Thin Film On Nano-Patterned Substrates), Submitted to the Organic and Polymeric Materials and Devices) symposium at the Spring 2003 MRS Meeting.
• (CP-126) Henry I. Smith, (Templated Self Assembly: The Role of Nanolithography in the Nanotechnology revolution), CMSE Colloquium Series, Fall 2002.
• (CP-127) J. Todd Hastings, Mark L. Schattenburg, Paul Konkola, Euclid E. Moon and Henry I. Smith, (Nanoaccuracy: an Essential Element of Nanotechnology), Japan-US Symposium on Tools and Metrology for NanoTechnology, Cornell University, 21-24, January, 2003.
• CP-125 C.A. Ross, J.Y. Cheng, Henry I. Smith, E.L. Thomas and G. Vancso, “Magnetic Nanostructures made by self-assembled block copolymer lithography”, AVS 2003 Meeting, November 2-7, 2003, Baltimore Convention Center, Baltimore, Maryland.
• CP-126 T. Barwicz, H. Haus, Henry I. Smith, "A three-dimensional analysis of scattering losses due to sidewall roughness in integrated optical waveguides", Presented at the Conference on Lasers and Electro-optics (CLEO), Baltimore MD, June 2003.
• CP-127 R. Krishnan, K. Nielsch, Henry I. Smith, C. A. Ross, C. V. Thompson, “Highly ordered, single-domain alumina nanopore arrays and metallic nanowire arrays on silicon for on-chip integration of semiconductor devices, Submitted to the electrochemical society conference to be held in November 2003.
• CP-128 Y. Shao-Horn, C. Hidrovo, S. M. Jurga, H. I. Smith, and G. Barbastathis, Origami fabrication of electrochemical device on the micrometer scale, 204th Meeting of the Electrochemical Society, Orlando, FL, October 2003 (abstract 1279).
• CP-129 H. Smith, “The role of lithography and metrology in nanophoonics fabrication”, 2003 Optics in Computing, Technical Digest, June 18-20, 2003, Wyndham City Center, Washington, DC.
• CP-130 R. Krishnan, K. Nielsch, Henry Smith, C. Ross, C. Thompson, “Fabrication of Highly-Ordered Nanopores and Metallic Nanowire Arrays on Silicon for Nanoscale Electronic Device Applications”, Fall 2003 MRS.
• CP-131 M. Qi, E. Lidorikis, J. D. Joannopoulos and Henry I. Smith, “3D Photonic Crystals with Point Defects at Near-Infrared”, Submitted to MRS, April 12-16, 2004, San Francisco, CA.
• CP-132 A. L. Giermann, C. V. Thompson andHenry I. Smith, “Templated formation of ordered metallic nano-particle arrays”, Submitted to MRS, April 12-16, 2004, San Francisco, CA.
• CP-133 R. Krishnan, K. Nielsch, Henry I. Smith, C. A. Ross, C. V. Thompson, “Single-domain A lumina Nanopore and Metallic Nanowire Arrays on Silicon for On-Chip Integration of Nano-devices”, 204th Meeting of The Electrochemical Society, Co-sponsored in Part by the Electronics Division of The American Ceramic Society, October 12-October 16, 2003: session: - Nanostructured Materials (on wednesday Oct 15, 2003)
• CP-134 Tymon Barwicz, Milos A. Popovic, Peter T. Rakich, Michael R. Watts, Hermann A. Haus, Erich P. Ippen and Henry I. Smith, "Fabrication and analysis of add-drop filters based on microring resonators in SiN", Paper TuL4, The 2004 Optical Fiber Communication Conference (OFC:04), Los Angeles, California, February 22-27, 2004.
• CP-135 M. Qi, E. Lidorikis, J. D. Joannopoulos, Henry I. Smith, “Characterization of a three-dimensional photonic crystal with point defects at near-infrared wavelengths”, CLEO/IQEC, or Conference on Lasers and Electron Optics/International Quantum Electronics Conference, May 18-20, San Francisco, CA.
• CP-136 George Barbastathis, Hyun Jin In, Will Arora, Henry I. Smith, “Nanostructured Origami”, SPIE Annual Meeting, Denver, CO. August 2004.
• CP-137 Minghao Qi, “3D Photonic Crystals with Point Defects at Near-Infrared”, Materials Research Society, April 13, 2004
  CP-138 Rajesh Menon, Dario Gil, Amil Patel and Henry I. Smith, > "Proximity-Effect Correction in Zone-Plate-Array Lithography", Micro > and Nano engineering International Conference, Cambridge, UK, 22-25, > September 2003.
• CP-139 Dario Gil, Rajesh Menon, Todd Hastings and Henry I. Smith, "The Promise of diffractive Optics in Maskless Lithography", to be Published in the Proceedings of the 28th International Conference on Micro- and Nano-Engineering 2003, Cambridge, UK 22-25 September 2003.
• CP-140 Amanda L. Giermann, Carl V. Thompson and H. I. Smith, “The Effects of Topography on the Formation of Ordered Arrays of Metallic Nano-particles” To be presented at the 2004 Electrochemical Society meeting.
• CP-141 Bibiana Onoa (a), Michael Walsh (b), Thomas B. O'Reilly(b), Henry Smith(b), “Carbon nanotubes with prescribed lengths and unaltered properties”MRS meeting, Boston, 2004.
• CP-142 Ross, Caroline; Castano, F.J.; Jung, W. 1; Morecroft, D. ; Cheng, J.Y. ; Ilievski, F. ; Shnayderman, M. ; Nielsch, K. ; Krishnan, R. ; Robinson, J.W.A.; Smith, Henry I., “Fabrication of magnetic tubes, rings and dots using novel processes”, MRS meeting, Boston, MA. Dec. 2004.

Books

• (B-1) H.I. Smith, (Surface Wave Device Fabrication), Chap. 4 in Surface Wave Filters, John Wiley & Sons, Chichester, England, 1977, pp. 165-217, Ed. Herbert Matthews.
• (B-2) H.I. Smith, (Fabrication Techniques for Surface Wave Devices), Chap. 7 in Topics in Applied Physics, Vol. 24, Acoustic Surface Waves, Springer-Verlag, Berlin, 1978, pp. 305-324, Ed. A.A. Oliner.
• (B-3) P.F. Bagwell, D.A. Antoniadis, and T.P. Orlando, (Quantum Mechanical and Nonstationary Transport Phenomena in Nanostructured Silicon Inversion Layers), Chap. 8 in Advanced MOS Device Physics, Vol. 18, Academic Press, 1989, pp. 306-355, Eds. N.G. Einspruch and G. Gildenblat.
• (B-4) T.P. Orlando, P.F. Bagwell, R.A. Ghanbari, K. Ismail, (Quantum Device Modeling with the Convolution Method), in Electronic Properties of Multilayers and Low Dimensional Semiconductor Structures, Eds. J.M. Chamberlain, L. Eaves and J.C. Portal, Plenum Press, London 1990, pp. 191-210.
• (B-5) P.F. Bagwell, T.P. Orlando, and A. Kumar, (Low-Dimensional Resonant Tunneling), in Resonant Tunneling in Semiconductors: Physics and Applications, Eds. L.L. Chang and E.E. Mendez, Plenum, London, in press.
• (B-6) M.A. Kastner, E.B. Foxman, P.L. McEuen, U. Meirav, A. Kumar, and S.J. Wind, (Transport Spectroscopy of a Coulomb Island), Nanostructures and Mesoscopic Systems, Edited by Wiley P. Kirk and Mark A. Reed, Academic Press, San Diego, CA, 239-253 (1992).
• (B-7) K. Ismail, T.Ikoma, and H.I. Smith, (Quantum Effect Physics, Electronics and Applications), Institute of Physics Conference Series #127, Institute of Physics Publishing, Ltd., Bristol, England and Philadelphia (1992).
• (B-8) H.I. Smith, (Microlithography), Encyclopedia of Applied Physics Vol. 10, Ed. G.L. Trigg, pp.281-295, VCH Publishers, Weinheim, Germany and New York, in collaboration with the American Institute of Physics, the German Physical Society, the Japan Society of Applied Physics, and the Physical Society of Japan (1994).
• (B-9) H.I. Smith, Submicron- and Nanometer-Structures Technology, NanoStructures Press, Sudbury, MA (1994).

Theses

• (T-1) R.J. Hawryluk, (Energy Dissipation by Electron Beam Scattering in Thin Polymer Films), Ph.D. Thesis, Physics Department, MIT, May 1974. (Also, Technical Report 511, MIT Lincoln Laboratory 1974).
• (T-2) S.E. Bernacki, (The Application of X-ray Lithography to Microelectronic Devices), Ph.D. Thesis, Division of Engineering and Applied Physics, Harvard University, April 1975.
• (T-3) D.C. Flanders, (Orientation of Crystalline Overlayers on Amorphous Substrates by Artificially Produced Surface Relief Structures), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, January 1978. (Also, Technical Report 533, MIT Lincoln Laboratory 1978).
• (T-4) D.C. Shaver, (Alignment of Liquid Crystals by Surface Gratings), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1978. (Also, Technical Report 538, MIT Lincoln Laboratory 1979).
• (T-5) D.C. Shaver, (Electron Beam Techniques for Testing and Restructuring of Wafer-Scale Integrated Circuits), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1981.
• (T-6) A.M. Hawryluk, (Transmission Diffraction Gratings for Soft X-ray Spectroscopy and Spatial Period Division), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1981. (Also, VLSI Memo 81-69, MIT, October 1981).
• (T-7) C.J. Keavney, (Zone-Melting Recrystallization of InSb on Oxidized Silicon Wafers), S.M. Thesis, Department of Materials Science and Engineering, MIT, June 1983. (Also, VLSI Memo 83-143, June 1983).
• (T-8) E.D. Ahlers, (Method of Photolithographic Projection System Characterization), B.S./M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1983 (VI-A, General Electric, Schenectady, NY).
• (T-9) H.A. Atwater, (Control of Silicon Film Recrystallization using Lithography with Application to Photovoltaics), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1983. (Also, VLSI Memo 83-149, July 1983).
• (T-10) S.S. Dana, (Nucleation on Surface Relief Structures by Chemical Vapor Deposition), Ph.D. Thesis, Department of Physics, MIT, September 1983.
• (T-11) L.F.A. Mougel, (Solar Cells Fabricated from Zone-Recrystallized Silicon), B.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1984.
• (T-12) M.L. Schattenburg, (Astronomical X-ray Spectroscopy: Studies of the Crab Nebula and Development of Ultra-Fine Transmission Gratings), Ph.D. Thesis, Department of Physics, MIT, June 1984. (Also, reprinted by Center for Space Research, MIT).
• (T-13) H.J. Lezec, (Photoresist Characterization System), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1984.
• (T-14) R.F. Kwasnick, (Electronic Conduction in Extremely Narrow Silicon Inversion Layers), Ph.D. Thesis, Department of Physics, MIT, June 1984.
• (T-15) J.M.A. Palella, (Silicon Photovoltaic Cells Prepared by Zone Melting Recrystallization), B.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, September 1984.
• (T-16) I. Plotnik, (Reactive-Ion Etching of Tungsten for Sub-50 Nanometer High-Contrast X-ray Mask Fabrication), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1985. (Also, VLSI Memo No. 85-246, May 1985).
• (T-17) E.H. Anderson, (Surface Gratings with Sub-100 nm Linewidths), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1984. (Also, VLSI Memo 85-251, June 1985).
• (T-18) A.C. Warren, (Surface Superlattices and Quasi-One-Dimensional Conduction in Silicon Inversion Layers), Ph.D. Thesis, Department of Physics, MIT, June 1985.
• (T-19) N.C. Us, (Ion Bombardment in Plasma Processing of Electronic Materials), M.S. Thesis, Department of Materials Science, MIT, June 1985. (VI-A, IBM, San Jose, CA).
• (T-20) S.C. Schott, (The Behavior of Germanium during Zone-Melting Recrystalization on Various Substrates), M.S. Thesis, Department of Materials Science, MIT, June 1985.
• (T-21) J.A. Stein, (A Micromechanical Optical Switch Based on Zero Order Diffraction for Flat Panel Displays), Ph.D. Thesis, Department of Mechanical Engineering, MIT, June 1985.
• (T-22) D.A. Suma, (An Investigation of Forming of Diffraction Gratings in Thin Polymer Films), M.S. Thesis, Department of Mechanical Engineering, MIT, June 1985.
• (T-23) J.E. Palmer, (Secondary Grain Growth in Ultra Thin Germanium Films on Silicon Dioxide), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, August 1985.
• (T-24) C.C. Wong, (Secondary Grain Growth and Graphoepitaxy in Thin Au Films), Ph.D. Thesis, Department of Materials Science and Engineering, MIT, February 1986.
• (T-25) G.G. Wong, (Fast Sub-100 nm Alignment for X-ray Lithography: Fresnel Zone Plates and Reduced Scanning Field), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1986.
• (T-26) J.E. Murguia, (Design, Fabrication and Testing of a Planar Silicon Permeable Base Transistor), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1986.
• (T-27) S.Y. Chou, (Electronic Conduction in Ultra-Short Channel Si MOSFET's), Ph.D. Thesis, Department of Physics, MIT, June 1986.
• (T-28) S.M. Garrison, (The Kinetics of Secondary Grain Growth in Rapidly Thermal Annealed Thin Silicon Films), S.M. Thesis, Department of Materials Science and Engineering, MIT, June 1986.
• (T-29) T. Yonehara, (Low Temperature-Growth of Semiconductor Films Over Amorphous Insulating Substrates), Ph.D. Thesis, Waseda University, June 1986.
• (T-30) J.C. Licini, (Quantum Conductance Fluctuations in Extremely Narrow Inversion Layers in Silicon), Ph.D. Thesis, Department of Physics, MIT, February 1987.
• (T-31) H.A. Atwater, (Ion Beam Enhanced Grain Growth in Thin Films), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1987.
• (T-32) A. Yen, (Grating Gate Si MOSFET for Study of Quantum Transport Effects), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, August 1987.
• (T-33) A.M. Modiano, (Real Time Control, Acquisition, and Image Processing for the Scanning Tunneling Microscope), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, December 1987.
• (T-34) P.F. Bagwell, (Quantum Mechanical Transport Phenomena in Nanostructured Inversion Layers), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, February 1988.
• (T-35) E.H. Anderson, (Fabrication and Electromagnetic Applications of Periodic Nanostructures), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1988.
• (T-36) W. Chu, (Fabrication of Lateral-Surface-Superlattice MODFETs using X-ray Lithography), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, September 1988.
• (T-37) G. Shahidi, (Non-Stationary Transport Effects in Deep Sub-Micron Channel Si MOSFET's), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1989.
• (T-38) J.E. Palmer, (Evolution of Microstructures in Ultra-Thin Films of GaAs and CaF2 on Single Crystal Silicon), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1989.
• (T-39) K. Ismail, (The Study of Electron Transport in Field-Induced Quantum Wells on GaAs/GaAlAs), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1989.
• (T-40) R. Carpenter, (Material Characterization Techniques for SOI Devices), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1989.
• (T-41) P.G. Meyer, (Fabrication of Deep Submicron MOSFETs using a Self-Aligned Cobalt Disilicide Process), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1989.
• (T-42) S.A. Ajuria, (Photon Enhanced Grain Growth), S.M. Thesis, Department of Materials Science and Engineering, MIT, June 1989.
• (T-43) H.M. Quek, (An Investigation of Graphoepitaxy in Thin Au and Bi Films), S.M. Thesis, Department of Materials Science and Engineering, MIT, June 1989.
• (T-44) L.A. Clevenger, (Controlled and Explosive Silicidation of Metal/Amorphous-Silicon Multilayer Thin Films), Ph.D. Thesis, Department of Materials Science and Engineering, MIT, August 1989.
• (T-45) S.L. Park, (The Anomalous Magnetoresistance of the Electron Gas in a Restricted Geometry), Ph.D. Thesis, Department of Physics, MIT, April 1990.
• (T-46) J. Scott-Thomas, (Conductance Oscillations Periodic in the Charge Density of One-Dimensional MOSFET Structures), Ph.D. Thesis, Department of Physics, MIT, August 1990.
• (T-47) U. Meirav, (Single Electron Charging and Periodic Conductance Oscillations in Gallium Arsenide Nanostructures), Ph.D. Thesis, Department of Physics, MIT, May 1990.
• (T-48) S.C. The, (A Self-Aligned NMOS Process using X-ray Lithography), S.M. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1990.
• (T-49) P.H. Bagwell, (Quantum Mechanical Transport in Submicron Electronic Devices), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, December 1990.
• (T-50) F.S. Tsai, (Characterization of Mechanical & Optical Properties of X-ray Mask Membranes), B.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1991.
• (T-51) K.R. Early, (Experimental Characterization and Physical Modeling of Resolution Limits in Proximity Printing X-ray Lithography), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1991. (Also, RLE Technical Report No. 565, August 1991, and MTL Memo 91-638, October 1991.
• (T-52) Y.-C. Ku, (Fabrication of Distortion Free X-ray Masks using Low Stress Tungsten), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1991.
• (T-53) A. Yen, (Fabrication of Large-Area 100 nm-Period Gratings using Achromatic Holographic Lithography), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1991.
• (T-54) A.M. Modiano, (An Aligner for X-ray Nanolithography, Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1992. (Also, MTL Memo 93-698, May 1993).
• (T-55) D.B. Olster, (Refining the Process of Achromatic Holographic Lithography), B.S .Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1992.
• (T-56) R.A. Ghanbari, (Physics and Fabrication of Quasi-One-Dimensional Conductors), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993. (Also, RLE Technical Report No. 578, April 1993, and MTL Memo 93-700, May 1993).
• (T-57) W. Chu, (Inorganic X-ray Mask Technology for Quantum-Effect Devices), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993. (Also, RLE Technical Report No. 577, April 1993, and MTL Memo 93-699, May 1993).
• (T-58) G.E. Rittenhouse, (Mesoscopic Transport of Cooper Pairs through Ballistic Superconductor-Normal Metal-Superconductor Junctions), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993. (Also, MTL Memo 93-701, May 1993).
• (T-59) C.C. Eugster, (Electron Waveguide Devices), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993.
• (T-60) J.N. Damask, (A New Photonic Device: The Integrated Resonant Channel-Dropping Filter), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993.
• (T-61) M.H. Lim, (Measurement of In-Plane Distortion using Holographic Interferometric Techniques), B.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993.
• (T-62) S.N. Shah, (A White Light Interferometer for Improved Achromatic Holographic Lithography), B.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993.
• (T-63) J.C. Lew, (Fabrication of Free-Standing Silicon Nitride Gratings of 200 nm Period for Atom Interferometry), B.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1993.
• (T-64) N. Gupta, (Fabrication of 100 nm T-Gates for Monolithic Microwave Integrated Circuits using X-ray Lithography), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, August 1993.
• (T-65) A. Kumar, (Single Electron Charging Effects in Quantum Dot Nanostructures), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1994.
• (T-66) H. Li, (Temperature Homogenization with Tungsten Absorber on X-Ray Mask), B.S. and M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1994.
• (T-67) S.D. Hector, (Optimization of Image Formation in X-Ray Lithography Using Rigorous Electromagnetic Theory and Experiments), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1994.
• (T-68) G.M. Owen, (Optical and Mechanical Characterization of Thin Membranes for X-Ray Lithography), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1994.
• (T-69) J. Ferrera, (Highly Coherent Gratings for Optoelectronics: An Application of Spatial-Phase-Locked Electron Beam Lithography), B.S. and M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1994.
• (T-70) H. Hu, (Experimental Study of Electron Velocity Overshoot in Silicon Inversion Layers), Ph.D. Thesis, Department of Physics, MIT, September 1994.
• (T-71) S. Shah, (Free-standing 100 nm Period Gratings Produced by Achromatic Holographic Lithography), M.E. Thesis, Department of Electrical Engineering and Computer Science, MIT, February 1995.
• (T-72) M. Burkhardt, (Fabrication Technology and Measurement of Coupled Quantum Dot Devices), Ph.D Thesis, Department of Electrical Engineering and Computer Science, MIT, February 1995.
• (T-73) A. Yasaka, (Feasibility Study of Spatial-Phase-Locked Focused-Ion-Beam Lithography), M.S. Thesis, Department of Materials Science and Engineering, MIT, June 1995.
• (T-74) V.V. Wong, (Fabrication of Distributed Feedback Devices Using X-ray Lithography), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, August 1995.
• (T-75) J.G. Goodberlet, (An Experimental Investigation of a Table-Top, Laser-Driven Extreme Ultraviolet Laser), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, February 1996.
• (T-76) J.N. Damask, (Integrated-Optic Grating-Based Filters for Optical Communication Systems), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, May 1996.
• (T-77) K.W. Yee, (Gold-Electroplating Technology for X-Ray-Mask Fabrication), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1996.
• (T-78) K.M. Jackson, (Laterally Non-Uniform Doping Profiles in MOSFETs: Modeling and Analysis), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, August 1996.
• (T-79) I. Yang, (Study of Sub-0.5 mm SOI-with-Active Substrate (SOIAS) Technology for Ultra-Low Power Applications), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, September 1996.
• (T-80) M. Meinhold, (Aligned T-gate Fabrication Using X-ray Lithography), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1996.
• (T-81) T. Murphy, (Integrated Optical Grating-Based Matched Filters for Fiber-Optic Communications), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1996.
• (T-82) A. Franke, (Fabrication of Extremely Smooth Nanostructures Using Anisotropic Etching), M. S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June, 1997.
• (T-83) M. Farhoud, (Interferometric Lithography and Selected Applications), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1997.
• (T-84) J. Foresi, (Optical Confinement and Light Guiding in High Dielectric Contrast Materials Systems), Ph.D. Thesis, Department of Materials Science and Engineering, MIT, June 1997.
• (T-85) M. Schweizer, (Fabrication and Measurement of Lateral-Surface-Superlattice Devices), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, September 1997.
• (T-86) D. Berman, (The Aluminum Single-Electron Transistor for Ultrasensitive Electrometry of Semiconductor Quantum-Confined Systems), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1998.
• (T-87) D. Carter, (Sub-50 nm X-ray Lithography with Application to a Coupled Quantum Dot Device), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1998.
• (T-88) M. Qi, (Micro-fabrication of 3-D Si/Air and Si/SiO2/Air PBG structures), M. S. Thesis, Department of Electrical Engineering and Computer Science, MIT, June 1998.
• (T-89) E. Moon, (Dynamic Nanometer Alignment for Nanofabrication and Metrology), M.S. Thesis, Department of Electrical Engineering and Computer Science, MIT, September 1998.
• (T-90) I. Djomehri, (Zone Plate Array Lithography in the Deep UV), M. S. Thesis, Department of Electrical Engineering and Computer Science, MIT, September 1998.
• (T-91) J. Bae, (A Data Storage System Based on Patterned Magnetic Media and Magnetic Force Microscopy), M.S. Thesis, Department of Mechanical Engineering, MIT, May 1999.
• (T-92) V. Chan, (Ceramic Nanostructures from Block Copolymers), Ph.D. Thesis, Department of Materials Science and Engineering, MIT, October 1999.
• (T-93) J. Ferrera, (Nanometer-Scale Placement in Electron-Beam Lithography), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, October 1999.
• (T-94) O. Stolz, (Experimental and theoretical investigation on polarization-dependence in Silicon-on-Insulator waveguides), Diplom-Ingenieur (FH), University of Technology and business in Aalen, May 2000.
• (T-97) M. Walsh, (Nanostructuring Magnetic thin Films Using Interference Lithography), M. S. Thesis, Department of Electrical Engineering and Computer Science, 2000.
• (T-95) T. Murphy, (Design, Fabrication and Measurement of Interated Bragg Grating Optical filters), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, November 2000.
• (T-96) M. Farhoud, (Fabrication and Characterization of Nanostructured Magnetic Particles for Applications in Data Storage), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, December 2000.
• (T-97) D. Twisselmann, (The Origins of Substrate Topography-Induced Anisotropy in Co-alloy Films, Ph.D. Thesis, Department of Electrical Engineering and Computer Science, 2001.
• (T-98) J. Khan, (Integrated Optical Filters using Bragg Gratings and Resonators),Ph.D. Thesis, Department of Electrical Engineering and Computer Science, 2001.
• (T-99) M. Finlayson, (Development of a Scintillating Reference grid for Spatial-Phase-Locked Electron-Beam Lithography) M.S. Thesis, Department of Electrical Engineering and Computer Science, 2001.
• (T-100) M. Hwang, (Fabrication, Characterization, and Micromagnetic Analysis of Lithographically-defined Particle Arrays for Applications in Data Storage, Ph.D. Thesis, Department of Materials Science and Engineering, June 2001.
• (T-101) A. Lochtefeld, (Toward the End of the MOSFET Roadmap; Investigating Fundamental Transport Limits and Device Architecture Alternatives), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, May 2001.
• (T-102) K. Jackson, (Optimal MOSFET Design for Low Temperature Operation), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, June 2001.
• (T-103) M. Lim, (Development of x-ray Lithography and Nanofabrication techniques for III-V Optical Devices), Ph.D. Thesis, Department of Electrical Engineering and Computer Science, MIT, February 2002.
• (T-104) A. A. Erchak, (Enhanced Performance of Optical Sources in III-V Materials Using Photonic Crystals), Ph.D. Thesis, Department of Materials Science and Engineering, June 2002.
• (T-105) P. Konkola, (Scanning Beam Inferference Lithography), Ph.D. Thesis, Department of Mechanical Engineering, June 2003.

• T-109 M. W. Meinhold, “X-ray Lithographic Alignment and Overlay Applied to Double-Gate MOSFET Fabrication”, Ph.D. Thesis, Department of Electrical Engineering and Computer Science, May 2003.
• T-110 D. Gil, “Maskless Nanolithography and Imaging with Diffractive Optical Arrays”, Ph.D. Thesis, Department of Electrical Engineering and Computer Science, June 2003.
• T-111 J. Cheng, “Fabrication and Characterization of Nanostructures from Sef-assembled Block Copolymers, Ph.D. Thesis, Department of Materials Science and Engineering, June 2003.
• T-112 T. Hastings, “Nanometer-Precision Electron-Beam Lithography with Applications in Integrated Optics”, Ph.D. Thesis, Department of Electrical Engineering and Computer Science, June 2003.
• T-113 T. Savas, “Achromatic Interference Lithography”, Ph.D. Thesis, Physics Department. May 2003
• T-114 R. Menon, “Diffractive Optics for Maskless Lithography and Imaging”, Ph.D. Thesis, Department of Electrical Engineering and Computer Science, June 2003.
• T-115 S. Smits, “ Photosensitive Dry Etching of Aluminum with applications in Nanolithography”, M. S. Thesis, Leiden University, Leiden, Netherlands. August, 2003

Miscellaneous Reports

• (MR-1) R.B. Holt, H.I. Smith, and M.S. Gussenhoven, (Research on Optical Contact Bonding), (Final Report May 15, 1963 - May 30, 1986), Report No. AFCRL-66-649.
• (MR-2) J.H. Chen and H.I. Smith, (High Pressure and Dielectric Investigations of the Alkaline Earth Fluorides), (Final Report. October 1964 - June 1966), Report No. AFCRL-66-601.
• (MR-3) R.A. Cohen, R.W. Mountain, H.I. Smith, M.A. Lemma, and D.L. Spears, (Fabrication Procedure for Silicon Membrane X-ray Lithography Masks), September 20, 1973, Report No. TN-1973-38; ESD-TR-73-248.
• (MR-4) H.I. Smith, (Proposal for National Research and Resource Facility for Submicrometer Structures), submitted to the National Science Foundation, MIT Lincoln Lab, Lexington, MA, July 1, 1977.
• (MR-5) H.I. Smith, (Graphoepitaxy), Semiannual Technical Summary Report. (January 1 - June 30, 1979), MIT Lincoln Lab, Lexington, MA, Report No. ESD-TR-79-311.
• (MR-6) D.C. Shaver, D.C. Flanders, and H.I. Smith, (The Alignment of Masks Substrates for X-ray Lithography), Lithography/Microscopy Beam Line Design Workshop, Stanford, CA, February 21-22, 1979, Ed. C. Ray Dannemiller, SSRL Report No. 79/02. (Invited)
• (MR-7) H.I. Smith, (Graphoepitaxy), Semiannual Technical Summary Report. July 1 - December 31, 1979, MIT Lincoln Lab, Lexington, MA, Report No. ESD-TR-80-214.
• (MR-8) K.A. Bezjian, S.S. Dana, J. Melngailis, and H.I. Smith, (Microstructure Fabrication Research), RLE Progress Report No. 122, Section 19, p. 89-91, January 1980.
• (MR-9) H.I. Smith, A.M. Hawryluk, J. Melngailis, S.S. Dana, and K.A. Bezdjian, (Development of Microfabrication Techniques), RLE Progress Report No. 123, Section 19, p. 109-111, January 1981.
• (MR-10) T. Yonehara, C.V. Thompson, and H.I. Smith, (Abnormal Grain Growth in Ultra-Thin Films of Germanium on Insulator), VLSI Memo No. 84-163, February 1984.
• (MR-11) H. I. Smith, (X-ray Lithography), A white paper prepared for the Semiconductor Research Corp. - June 1991.
• (MR-12) H.I. Smith and R.F. Pease, (Report on Optimal Strategy for Developing a Mask Writer), March 6, 1995.
• (MR-13) J. Bokor, I. McCord, W.G. Oldham, and H.I. Smith, (Lithography Technology Options at 100nm and Beyond), A white paper prepared for the Semiconductor Research Corp. - August 1997.
• (MR-14) H.I. Smith, (From Nanostructures to Nanoaccuracy: A Vision for Future Industries), A white paper. (1997)
• (MR-15) M.C. Abraham, H. Schmidt, T.A. Savas, Henry I. Smith, C.A. Ross, R.J. Ram, (Magnetic Properties and Interactions of Single Domain nanomagnets in a periodic array), J. App. Phys., 89(10), pp. 5667-5670, 2001.

Miscellaneous Presentations

• (MP-1) H.I. Smith, (Ion Beam Etching), 3rd Annual Symposium on Advances in Sputtering, Etching and Related Vac. Technol., Burlington, May 9 - June 1; May 17, 1976, 10 pp., 33 references.
• (MP-2) H.I. Smith, (New Applications of Submicrometer Structures), Stanford University Colloquium, April 1978; California Institute of Technology, Pasadena, CA, April 1978. (Invited)
• (MP-3) H.I. Smith, (E-Beam and X-ray Lithography), SPIE 31st Annual Conference, Washington, DC, May 1978. (Invited)
• (MP-4) M.W. Geis, D.C. Flanders, and H.I. Smith, (Orientation of Silicon on an Amorphous Substrate using Artificial Surface Relief Gratings and Laser Crystallization), Gordon Research Conference, January 1979. (Invited)
• (MP-5) H.I. Smith, (Fabrication and Applications of Artificial Microstructures), NRL Seminar, Washington, DC, February 1979. (Invited)
• (MP-6) H.I. Smith, (Fabrication and Applications of Submicrometer Structures), Harvard University, Cambridge, MA, April 1979. (Invited)
• (MP-7) H.I. Smith, (Applications of Artificial Microstructures to Optics), MIT, Optics Seminar, Cambridge, MA, October 1979. (Invited)
• (MP-8) H.I. Smith, (Fabrication and Applications of Artificial Microstructures), Raytheon Research Laboratory Seminar, GTE Laboratories, Waltham, MA, November 1979. (Invited)
• (MP-9) H.I. Smith, (Fabrication and Applications of Submicrometer Structures), GTE Sylvania, Sigma Xi Meeting, Waltham, MA, November 1979. (Invited)
• (MP-10) M.W. Geis, D.C. Flanders, D.A. Antoniadis, and H.I. Smith, (Crystallographic Orientation of Silicon on Amorphous Substrates by Graphoepitaxy), ILO Symposium on Solar Energy, MIT, December 4, 1979. (Invited)
• (MP-11) H.I. Smith, (Artificial Microstructures for Integrated Electronics), Applied Physics Seminar, California Institute of Technology, Pasadena, CA, February 1980. (Invited)
• (MP-12) H.I. Smith, (Application of Artificial Microstructures to Chemistry), Chemistry Seminar, MIT, Cambridge, MA, February 1980. (Invited)
• (MP-13) H.I. Smith, (Submicrometer Structures Research and Application), Digital Equipment Corporation Seminar, Westboro, MA, April 1980. (Invited)
• (MP-14) H.I. Smith, A Series of Invited Lectures on Microfabrication, Shaanxi Microelectronics Research Institute, Xian, The People's Republic of China, May-June 1980.
• (MP-15) J. Melngailis, (Summary of Submicron Structures Research at MIT), Standard Telecommunication Lab, Harlow, Essex, England, September 1980. (Invited)
• (MP-16) J. Melngailis, (Fabrication of Submicron Size Structures), American Ceramics Society Meeting, October 1980. (Invited)
• (MP-17) J. Melngailis, (Submicron Structures Research, and Surface Acoustic Wave Coupling to Bulk Plate Modes), Bell Telephone Laboratories, Holmdel, NJ, October 1980. (Invited)
• (MP-18) J. Melngailis, (Submicron Structures Research at MIT), Fall 1980 MIT VLSI Research Review, December 1980.
• (MP-19) H.I. Smith, (Submicron Structures Research at MIT), IBM Research Laboratory Seminar, Yorktown Heights, NY, January 1981. (Invited)
• (MP-20) J. Melngailis, (Submicron Structures Research at MIT: Reactive Sputter Etching, Enhanced Raman Effect, and SAW Coupling to Bulk Plate Modes), Yale University Solid State Seminar, January 1981. (Invited)
• (MP-21) H.I. Smith, (Submicron Structures Research at MIT), IBM, T.J. Watson Research Laboratory Seminar, Yorktown Heights, NY, January 19, 1981. (Invited)
• (MP-22) H.I. Smith, (The use of Artificial Surface Structures to Study and Control Nucleation, Growth and Orientation in Thin Films), Lecture Series, Department of Materials Science and Engineering, MIT, Cambridge, MA, February 1981. (Invited)
• (MP-23) H.I. Smith, (Submicron Structures Research at MIT), IBM, T.J. Watson Research Laboratory Seminar, Yorktown Heights, NY, January 19, 1981.
• (MP-24) H.I. Smith, (Submicron Structures Research at MIT), presented at Corporate Research Labs, Exxon Research and Engineering Co., Linden, NJ, April 20, 1981.
• (MP-25) H.I. Smith, (Fabrication Techniques for Submicron-Period Diffractive Optical Elements), Seminar on Modern Optics and Spectroscopy, MIT, Cambridge, MA, May 4-5, 1981. (Invited)
• (MP-26) H.I. Smith, (Impact of Submicron Structures in Research and Applications), presented at 1981 Spring Meeting of the National Research Council, Solid State Sciences Committee and Panel, MIT, Cambridge, MA, May 19, 1981.
• (MP-27) J. Melngailis, (Surface Acoustic Wave Grating Devices), Solid State Physics Institute, University of Riga, August 1981. (Invited)
• (MP-28) J. Melngailis, (Research at Small Dimensions), Latvian Academy of Sciences, Physic Energetic Institute, August 198l. (Invited)
• (MP-29) H.I. Smith, (New Approaches to Single-Crystal Thin Films for Devices and Systems using Surface Patterns), NATO Advanced Research Institute, Microelectronics Studies and Complexities, Les Deux Alps, France, March 14-20, 1982.
• (MP-30) R.F. Kwasnick, M.A. Kastner, and J. Melngailis, (Quantum Size Effect in the Conductance of Sub-100 nm Wide FETs), VLSI Research Review, MIT, Cambridge, MA, May 1982.
• (MP-31) H.I. Smith, (Graphoepitaxy), presented at the Institute of Crystallography, Moscow; Ioffa Institute, Leningrad; Tashkent, USSR, September 1982. (Invited)
• (MP-32) J. Melngailis, (Submicron Structures Research Projects), RCA Laboratories, Zurich, Switzerland, November 1982. (Invited)
• (MP-33) J. Melngailis, (Submicron Structures Fabrication Methods and Applications), Digital Equipment Corp., Hudson, MA, March 1983. (Invited)
• (MP-34) H.I. Smith, (Silicon-on-Anything for Future Systems), Fairchild Corp., Key Technologists Seminar, Palo Alto, CA, March 30-31, 1983.
• (MP-35) H.I. Smith, (Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films), ILP Seminar, Keidanren Hall, Tokyo, Japan, July 1983.
• (MP-36) C.V. Thompson, (Control of Crystal Size and Orientation in Thin Films on Amorphous Substrates), Seminar, Department of Metallurgy and Materials Science, Cambridge University, Cambridge, England, September 1983. (Invited)
• (MP-37) R.F. Kwasnick, M.A. Kastner, and J. Melngailis, (Electronic Conduction in Ultra-Narrow Si Inversion Layers), Physics/Industry Forum, Cambridge, MA, October 1983.
• (MP-38) C.C. Wong, C.J. Keavney, H.A. Atwater, C.V. Thompson, and H.I. Smith, (Zone Melting Recrystallization of InSb on Oxidized Silicon Wafers), Fall VLSI Research Review, MIT, December 1983.
• (MP-39) E.H. Anderson and H.I. Smith, (Fabrication of Periodic Submicron Structures), Fall VLSI Research Review, MIT, December 1983.
• (MP-40) H.I. Smith, (Zone Melting Recrystallization of Patterned Films and Low Temperature Graphoepitaxy for SOI), GTE Laboratories, February 2, 1984.
• (MP-41) H.I. Smith, (Submicron Structures Fabrication and Its Impact on Crystalline Thin Film), MIT, ILP Symposium on Electronic Materials Processing, February 14, 1984.
• (MP-42) C.V. Thompson, (Control of Crystal Size and Orientation in Thin Films on Amorphous Substrates), Division of Applied Science, Harvard University, Cambridge, MA, March 1984. (Invited)
• (MP-43) H.I. Smith, (Zone Melting Recrystallization of Patterned Films and Low Temperature Graphoepitaxy for Silicon on Insulator), IEEE Meeting, Xerox Corp., Rochester, NY, March 26, 1984.
• (MP-44) T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, (Graphoepitaxy of Ge on SiO2 by Solid-State Surface-Energy-Driven Grain Growth), Spring VLSI Research Review, MIT, May 21, 1984.
• (MP-45) H.I. Smith, (Single-Crystal Silicon Films on Amorphous Substrates by Zone-Melting Recrystallization), SOHIO Corp., Cleveland, OH, June 18, 1984.
• (MP-46) H.I. Smith, (Patterning and Crystalline Film Formation), Gordon Research Conference, Brewster Academy, NH, July 8-13, 1984.
• (MP-47) H.I. Smith, (Submicron-Structure Research at MIT), Tektronix, Beaverton, OR, August 10, 1984.
• (MP-48) A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, (Superlattices and One-Dimensional Physics in Inversion Layers using Submicron Period Gate Electrodes), presented at the MIT Fall VLSI Research Review, Cambridge, MA, December 17, 1984.
• (MP-49) H.I. Smith, (Application of 0.1 Im Structures to Crystalline Films on Amorphous Substrates and Planar Superlattice Devices in Si), Bell Laboratories, Holmdel, NJ, January 7, 1985.
• (MP-50) A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, (Modification of Silicon Electronic Band Structure using Submicron Period Gate Electrodes), SRC Workshop on Post-Shrink Silicon Devices, Chapel Hill, NC, January 10-11, 1985.
• (MP-51) H.I. Smith, (Research with Submicron Structures), EECS Colloquium Series, Spring MIT, April 1, 1985.
• (MP-52) H.I. Smith, (Submicron-Structures Research at MIT), presented at the NSF Workshop on (The Future of Microstructure Technology), October 13-16, 1985, Seabrook Island, SC. (Also, VLSI Memo No. 85-293 MIT, December 1985).
• (MP-53) H.A. Atwater, H.I. Smith, and C.V. Thompson, (Enhancement of Grain Growth in Ultra-Thin Germanium Films by Ion Bombardment), VLSI Review, MIT, December 1985.
• (MP-54) S.Y. Chou, D.A. Antoniadis, and H.I. Smith, (Application of the Shubnikov-de Haas Effect in Characterization of Sub-100 nm Channel Si MOSFETs), VLSI Review, MIT, December 1985.
• (MP-55) H.I. Smith, (Submicron Structures and Quantum-Effect Devices), Brown Building dedication, MIT, December 6, 1985.
• (MP-56) H.I. Smith, (Submicron Holographic Lithography), IAP presentation for Spectroscopy Lab, January 1986.
• (MP-57) H.I. Smith, (Submicron Structures and Quantum-Effect Devices), presented at the VLSI Symposium, Santa Clara, CA, January 30, 1986.
• (MP-58) H.I. Smith, (Submicron Structures and Quantum-Effect Devices), presented at Hughes Research Laboratory, Malibu, CA, January 31, 1986.
• (MP-59) H.I. Smith, (The use of Submicron Patterning in Controlling Crystalline Films on Amorphous Substrates), presented at the Materials Processing Center. Industry Colloquium Workshop for (Thin Film Processing), C.V. Thompson Chairperson, April 7, 1986.
• (MP-60) H.A. Atwater, (Device Quality Crystalline Films on Amorphous Substrates by Zone-Melting Recrystallization and Grain Growth Processes), presented at the Sohio Research Ctr. Cleveland, OH, April 1986.
• (MP-61) H.I. Smith, (Submicron Structures Research at MIT), presented at the Naval Research Laboratory, Washington, DC, July 16, 1986.
• (MP-62) H.I. Smith, (Fabrication and Physics of Very Short, Very Narrow, and Planar Superlattice MOSFET's), MIT Physics/Industry Forum on (Physics in One and Two Dimensions), Cambridge, MA, October 29-30, 1986.
• (MP-63) H.I. Smith, Submicron Structures Technology and Future Electronics, presented at Research Laboratory of Electronics MIT, 40th Anniversary Symposium: Future Directions in Electronics, Cambridge, MA, October 30, 1986.
• (MP-64) H.I. Smith, (A Comparison of Process Latitude in UV, Deep UV and X-ray Lithography), IBM Research Center, Yorktown Heights, NY, May 6, 1987.
• (MP-65) H.I. Smith, (Random Events and Line-edge Control in UV, X-ray and Charged Particle Lithographies), Gordon Research Conference on Chemistry and Physics of Microstructures, Wolfboro, NH, June 24, 1986.
• (MP-66) M.A. Kastner, S.B. Field, J.C. Licini, and S.L. Park, (Anomalous Magnetoresistance of the Electron Gas in a Restricted Geometry), MIT, Fall 1987 Research Review, December 14, 1987.
• (MP-67) G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, (Reduction of Channel-Hot-Electron-Generated Substrate Current in Sub-150 nm Channel Length Si MOSFETS), MIT, Fall VLSI Research Review, December 14, 1987.
• (MP-68) M.L. Schattenburg, I. Tanaka, and H.I. Smith, (Microgap X-ray Nanolithography), MIT, Fall VLSI Research Review, December 14, 1987.
• (MP-69) E.H. Anderson and H.I. Smith, (Progress in X-ray Nanolithography Pattern Generation), MIT, Fall VLSI Research Review, December 14, 1987.
• (MP-70) H.I. Smith, (Quantum-Effect Electronics: Sub-100 nm Design Rules), the Karl Suss 1988 Seminar Series, Bedford, MA, March 8, 1988.
• (MP-71) H.I. Smith, (X-ray Nanolithography for Quantum-Effect Electronics), Talk at the ATT Bell Labs, May 6, 1988.
• (MP-72) H.I. Smith, (Submicron and Nanometer Structures Research: From Quantum-Effect Electronics to X-ray Optics), MIT, The Microsystems Technology Laboratories, May 16, 1988.
• (MP-73) Y.C. Ku and H.I. Smith, (X-ray Mask Technology), SRC - Techcon 88, Dallas, TX, October 12-14, 1988.
• (MP-74) H.I. Smith, (X-ray Nanolithography), Amer. Vac. Soc., Symposium on Nanostructures and Nanofabrication, IBM T.J. Watson Research Center, November 16, 1988.
• (MP-75) K. Ismail, W. Chu, A. Yen, D.A. Antoniadis, and H.I. Smith, (Surface Superlattice and Quasi-One-Dimensional Quantum Effects in GaAs/AlGaAs Modulation-Doped FETs), Fall 1988, VLSI Research Review, MIT, December 19, 1988.
• (MP-76) H. Kawata, J.M. Carter, A. Yen, and H.I. Smith, (Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity), Fall, VLSI Research Review, MIT, December 19, 1988.
• (MP-77) H.I. Smith, (Toward 100 nm Feature Technologies: Device and Fabrication Issues), Northern Telecom Electronics, Ltd., Technology Day Symposium, December 16, 1988.
• (MP-78) H.I. Smith and D.A. Antoniadis, (Lateral Surface Superlattices and Quasi-One-Dimensional Structures in GaAs), MIT Physics/Industry Forum on (Physics in Semiconductor Microstructures), Cambridge, MA, February 27-28, 1989.
• (MP-79) H.I. Smith, (Sub-100 nm Electronic Devices - Fabrication and Transport Studies), Talk at University of Mass, Boston, MA, April 12, 1989.
• (MP-80) H.I. Smith, (X-ray Nanolithography), Talk at the First Canadian Workshop on X-ray Lithography, in Quebec, Canada, April 28, 1989.
• (MP-81) H.I. Smith, (Recent Advances in Microlithography: Problems and Solutions), Guest Speaker at Avco Research TEXTRON, July 12, 1989.
• (MP-82) H.I. Smith, (Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography), presented at University of Glasgow, September 22, 1989.
• (MP-83) H.I. Smith, (Quantum Effect Electronics), presented at University of Illinois at Urbana-Champaign, October 26, 1989.
• (MP-84) H.I. Smith, (Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography), presented at University of Tokyo, February 1990.
• (MP-85) H.I. Smith, (Quantum Effect Electronics using X-ray Lithography), presented Max Plank Institute, Stuttgart, Germany, May 7, 1990.
• (MP-86) H.I. Smith, (Electronics from half-micron to 10 nm; How will we manufacture?) Presented at AT&T Bell Labs, Murray Hill, NJ, June 25, 1990.
• (MP-87) H.I. Smith, (Electronics from half-micron to 10 nm; How will we manufacture?) Presented at AT&T Holmdel, NJ, July 18, 1990.
• (MP-88) H.I. Smith, (Electronics from half-micron to 10 nm; How will we manufacture?) Presented at Lawrence Berkeley Laborarory, CA, October 17,1990.
• (MP-89) H.I. Smith, (Electronics from Half-Micron to 10 nm; How will we manufacture)? Presented at IBM, Almaden Research Center, San Jose, CA, April 11, 1991.
• (MP-90) H.I. Smith, (Nanolithography: Some paths less well traveled), presented at Gordon Conference on the Chemistry and Physics of Microstructure Fabrication), July 27-31, 1992.
• (MP-91) A. Kumar, (Coupled Single-Electron Quantum-Dot Devices), presented at the SRC Graduate Fellows Conference, Research Triangle Park, NC January 27-28, 1993.
• (MP-92) H.I. Smith, (Nanolithographic Techniques for Optoelectronics), presented at GTE Laboratories, Waltham, MA, February 11, 1993.
• (MP-93) H.I. Smith, (Nanostructures Engineering: Precision, Accuracy, and Manufacturability), presented at MIT-EECS May 3, 1993.
• (MP-94) H.I. Smith, (Lithography and the Push to 0.1 µm and Beyond), presented at IBM Yorktown Heights, NY, June 25, 1993.
• (MP-95) H.I. Smith, (Present Status and Future Perspective of NanoLithography), presented at Advanced Research Laboratory, Hitachi, Ltd., June 15, 1994.
• (MP-96) H.I. Smith, (Sub-100nm Devices, Circuits, and Systems via X-ray Lithography: Technology advancements), presented at ARPA's Advanced Lithography Program Review, Scottsdale, AZ January 23-26, 1995.
• (MP-97) H.I. Smith, (Spatial-Phase-Locked E-beam Lithography Combined With X-ray Lithography), presented at ARPA's Advanced Lithography Program Review, Scottsdale, AZ January 23-26, 1995.
• (MP-98) C.O. Bozler, D.D. Rathman, C.T. Harris, G.A. Lincoln, R.H. Matthews, S. Rabe, R.A. Murphy, M.A. Hollis, and H.I. Smith, (High-Density Gated-Field-Emitter Arrays for Microwave Power Tubes), presented at VE Program Review, June 1995.
• (MP-98A) H.I. Smith, R. F. Pease, (Report on Optimal Strategy for Developing a Mask Writer) (1995).
• (MP-99) H.I. Smith, (The Role of Optical Interference in Lithography from 200nm to 10nm), presented at MIT-EECS/RLE Seminar Series on Optics and Quantum Electronics, May 1, 1996.
• (MP-100) H.I. Smith, (A White Paper on Charged Particle Approaches to Lithography), presented at the SRC Workshop on Charged Beam Patterning, IBM East Fishkill, NY, June 18, 1996.
• (MP-101) H.I. Smith, ( Lithography with Nanometer-level Precision and Accuracy, Do We Need It?), presented at IBM East Fishkill, NY, September 11, 1996.
• (MP-102) H.I. Smith,) Maskless, massless sub-50 nm lithography), presented at Eberhard-Karls-Univerversitþt, T¾bingen (Germany), September 1996.
• (MP-103) H.I. Smith, (Nanolithography, Not Yet a General Engineering Discipline. What Remains to be Invented?) presented at the University of Maryland, October 18, 1996.
• (MP-104) M. Farhoud, (Nano-Structures Research at MIT), presented at the American University of Beirut, Beirut (Lebanon), December 16, 1996.
• (MP-105) A. Pepin, (Fabrication of lateral superlattices in GaAs/AlGaAs grid-gated MODFETs by X-ray nanolithography,) Seminar, Physics Department, Boston College, Chestnut Hill, MA, February 14, 1996.
• (MP-106) H.I. Smith, (X-Ray Nanolithography: Extension to the Limits of the Lithographic Process), MIT American Nuclear Society Student Chapter Meeting, Massachusetts Institute of Technology, Cambridge, MA, March 3, 1997.
• (MP-107) H.I. Smith, (The Limits and Role of Lithography in Future Nanotechnology,) Lecture, NIST, Gaithersburg, MD, April 30, 1997.
• (MP-108) H.I. Smith, (Fabrication of Spatially-Coherent Planar Optical Devices,) Workshop on High Dielectric Contrast Structure for Microphotonics, Cambridge, MA, June 16, 1997.
• (MP-109) M. Farhoud, (Patterned Magnetic Media for Ultra High Density Data Storage,) presented at RWTH-Aachen, Germany on July 3, 1997.
• (MP-110) H.I. Smith, (The Role of Lithography, Feedback, Templates and Self Organization), University of Nebraska-Lincoln Corporate Sponsored Electrical Engineering Colloquium Program, April 2, 1998.
• (MP-111) H.I. Smith, (X-ray mask alignment for MMIC via IBBI), Technical Interchange Meeting on Next Generation GaAs Industry Lithography Needs held at Sanders Company in Nashua, NH, May 8, 1998.
• (MP-112) H.I. Smith, (Interferometric Broad-Band Imaging (IBBI), presentation given to Lockheed Sanders in Nashua, NH, October 21, 1998.
• (MP-113) D.J.D. Carter, (X-Ray Lithography in the Deep Sub-100 nm Regime.) Presented at the Naval Research Laboratory, Washington, DC, December 15, 1998.
• (MP-114) D.J.D. Carter, (Lithography in the Deep Sub-100 nm Regime.) Talk presented at NTT on 11/11/1998.
• (MP-115) D.J.D. Carter, (Lithography in the Deep Sub-100 nm Regime), Talk presented at Toshiba on 11/12/1998.
• (MP-116) D.J.D. Carter, (Lithography in the Deep Sub-100 nm Regime), Talk presented at NEC on 11/13/1998.
• (MP-117) Henry I. Smith, (Nanolithography on limited budgets; why this is important), University of Canterbury, Department of Electronic and Electrical Engineering, January 25, 1999.
• (MP-118) D. Gil, (ZPAL: A New Maskless Approach), presented at the MTL poster session, January 11, 1999.
• (MP-119) H. I. Smith, (Nanostructures at MIT Ð why I came to G¨ttingen), Forschungseinrichtung R¨ntgenphysik, Gottingen, Germany, March 24, 1999.
• (MP-120) H. I. Smith, (Nanolithography in the next century: How will it be done and for what applications), Max-Planck-Institute Fur Str¨mungsforschung, G¨ttingen, Germany, April 16, 1999.
• (MP-121) M. Jalal Khan, M. Lim, Thomas E. Murphy, (Innovative Design and Fabrication Techniques for Integrated Bragg Gratings Filters), Talk presented at MPC Materials Unlimited, MIT, 5/8/2000.
• (MP-122) Henry Smith, (Nanolithography for Integrated Microphtonics: What Can and Cannot be Done), Talk presented at the Microphotonics seminar on July 13, 2000, MIT.
• (MP-123) Henry Smith, (Nano-lithography), SVG Optics Tutorial Workshop, MIT Campus, August 11, 2000.
• (MP-124) Henry Smith, (Nanostructures Technology, Research and Applications), Materials Processing Center, MIT, 2000.
• (MP-125) Henry Smith, (Nanolithography in the next century: How will it be done and for what applications), Max-Planck-Institut fur Stromungsforschung, April, 1999.
• (MP-126) Henry Smith, (Nanostructures Technology: WhatÕs Behind all the Hype?), The MIT Report, July/August, 2000.
• (MP-127) Henry Smith, (The Role of Lithography and the Planar Process), Innovations in Nanotechnology, MIT Series on Technology and the Corporation, September, 2000.
• (MP-128) Henry Smith, (The Role of Lithography and the Planar Process), Korea-U.S. Forum on Nano Science and Technology, Killian Hall, MIT, September, 2000.
• (MP-129) Henry I. Smith, (The Role of Lithography in Nanotechnology), Northeastern University Seminar, April 13, 2001.
• (MP-130) Henry I. Smith, (Nanotechnology & MEMS), Research Directors Conference 2001, Kresge auditorium, MIT, 4/19/2001.
• (MP-131) Henry I. Smith, (The Scanning Electron Microscope), Image and Meaning Conference, Kersge Auditorium, MIT, Cambridge, MA, June 13-16, 2001.
• (MP-132) Henry I. Smith, (The Role of Lithography for Nanotechnology), The MIT Report, July/August 2001.
• (MP-133) Henry I. Smith, (Nanostructures), Workshop on Nanostructure Science, Metrology, and Technology, Gaithersburg, MD, September 5-6, 2001.
• (MP-134) Henry I. Smith, (Building Bridges Between Lithography and Nanotechnology), University of Illinois, March 1, 2002.
• (MP-135) Henry I. Smith, (Large-area lithography for microphotonics), Microphotonics Industry Consortium, MIT Student Center, April 22, 2002.
• (MP-136) Henry I. Smith, (Templated Self Assembly; the role of nanolithography in the nanotechnology revolution), CMSE Workshop, MIT 2002.
• (MP-137) Henry I. Smith, (Templated Self Assembly; the role of nanolithography in the nanotechnology revolution), Institute for Nanoscience Colloquium, Washington, DC. 1/15/03.

Domestic Patents

• (P-1) (X-ray Lithographic Apparatus and Process), H.I. Smith, D.L. Spears, and E. Stern, filed January 14, 1972. Patent 3,743,842, July 3, 1973.
• (P-2) (Soft X-ray Mask Support Substrate), D.L. Spears, H.I. Smith, and E. Stern. Patent 3,742,230, June 25, 1973.
• (P-3) (Soft X-ray Alignment System), H.I. Smith, D.L. Spears, and E. Stern. Patent 3,742,229, June 26, 1973.
• (P-4) (Soft X-ray Mask Alignment System), H.I. Smith, filed October 14, 1975. Patent 3,984,680, October 5, 1976.
• (P-5) (Enhancing Epitaxy and Preferred Orientation), H.I. Smith, Serial No. 756, 358 filed January 3, 1977, continuation in part filed April 9, 1979. Patent 4,333,792, June 8, 1982.
• (P-6) (Supported Membrane Composite Structure and Its Method of Manufacture), D.C. Flanders, H.I. Smith, and M. DaLomba, filed March 29, 1977. Patent 4,170,512, March 3, 1981.
• (P-7) (Alignment of Diffraction Gratings), H.I. Smith, S.S. Austin, and D.C. Flanders, filed May 3, 1977. Patent 4,200,395, April 29, 1980.
• (P-8) (Surface Wave Devices for Processing Signals), E. Stern, R.C. Williamson, and H.I. Smith. Patent 4,075,706, February 21, 1978.
• (P-9) (The Orientation of Ordered Liquids and Their use in Devices), D.C. Shaver, D.C. Flanders, and H.I. Smith, filed May 1978. Patent 4,256,787, March 17, 1981. (MIT Case No. 3078L)
• (P-10) (Spatial-Period-Division Exposing), D.C. Flanders and H.I. Smith, Serial No. 43,310, filed May 1979. Patent 4,360,586, November 23, 1982.
• (P-11) (Plate Aligning), H.I. Smith, Stewart S. Austin, and D.C. Flanders, filed December 26, 1979. Patent 4,340,305, July 20, 1982.
• (P-12) (Process for Selectively Etching Silicon), C.M. Horwitz, filed May 25, 1982. Patent 4,422,897, December 27, 1983.
• (P-13) (Method of Entraining Dislocations and Other Crystalline Defects in Heated Film Contacting Patterned Region), H.I. Smith, and M.W. Geis, filed June 23, 1982. Patent 4,479,846, October 30, 1984. (MIT Case No. 3682)
• (P-14) (Orientation Filtering for Crystalline Films), H.I. Smith, H.A. Atwater, C.V. Thompson, and M.W. Geis, Serial No. 481096, filed March 31, 1983. Patent 4,632,723, December 30, 1986.
• (P-15) (Thick Crystalline Films on Foreign Substrates), H.I. Smith, H.A. Atwater, and M.W. Geis, filed May 24, 1983. Patent 4,576,676, March 18, 1986.
• (P-16) (Product Made by Method of Entraining Dislocations and Other Crystalline Defects), M.W. Geis, and H.I. Smith, filed June 4, 1984, Patent 4,562,106, December 31, 1985; Division of Serial No. 391,130, June 23, 1982. Patent 4,479,846. (MIT Case No. 3682)
• (P-17) (Graphoepitaxy by Encapsulation), M.W. Geis, H.I. Smith, D.A. Antoniadis, and D.C. Flanders, filed December 10, 1984. Patent 4,565,599, January 21, 1986. Continuation of Serial No. 332,553 (December 21, 1981); Serial No. 181,102 (August 25, 1980). (MIT Case No. 80.21L).
• (P-18) (A Lithography Mask with ¹-Phase Shifting Attenuator), H.I. Smith, E.H. Anderson, and M.L. Schattenburg, filed February 25, 1987, Serial No. 18587. Patent 4,890,309, December 26, 1989. (MIT Case No. 4283).
• (P-19) (Epitaxy with Reusable Template), H.I. Smith and C.V. Thompson, Patent 5,639,300, June, 1997. (MIT Case No. 4576).
• (P-20) (Holographic Lithography),H.I. Smith, E.H. Anderson, and M.L. Schattenburg, Patent 5,142,385, August 25, 1992. (MIT Case No. 4778).
• (P-21) (Energy Beam Locating), H. I. Smith, E.H. Anderson, and M.L. Schattenburg, filed April 5, 1991. Patent 5,136,169, August 4, 1992. (MIT Case No. 5492).
• (P-22) (Graphoepitaxy using Energy Beams), H.I. Smith, M.W. Geis, and D.C. Flanders, filed August 7, 1990, Serial #06/680,238, Patent 5,122,223, June 16, 1992. (MIT Case No. 79.13L),
• (P-23) (On-Axis Interferometric Alignment of Plates Using the Spatial Phase of Interference Patterns ), H.I. Smith, A.M. Modiano, and E. Moon, filed June 1, 1993, Patent 5,414,514, May 9, 1995. (MIT Case No. 6284).
• (P-24) (Interferometric Broadband Imaging), H.I. Smith, E.E. Moon, and P.N. Everett, filed May 28, 1996, Serial #08/654 287. (MIT Case No. 7025)
• (P-25) (Wavelength-Selective Optical Add/Drop Switch), J.N. Damask, T.E. Murphy, J. Ferrera, M.H. Lim, H.I. Smith, and H.A. Haus, Patent # 5,915,051, June 22, 1999, filed January 21, 1997. (MIT Case No. 7264).
• (P-26) (Maskless Lithography Using a Multiplexed Array of Fresnel Zone Plates), H.I. Smith, US Patent No., 5,900,637, May 4, 1999, filed May 30, 1997, Serial #08/866,550. (MIT Case No. 7731).
• (P-27) (Scintillating Fiducial Patterns), J.G. Goodberlet, H.I. Smith, US Patent No., 5,892,230, filed May 29, 1997, Serial #08/865,095. (MIT Case No. 7671).
• (P-28) (X-ray Lithography Masking), H.I. Smith, M.L. Schattenburg, J.M. Carter, and M.H. Lim, U.S. Patent No. 5,809,103, September 15, 1998, filed December 20, 1996, Serial #08/770,678. (MIT Case No. 7384).
• (P-29) (Optical Alignment Apparatus Having Multiple Parallel Alignment Marks), P.N. Everett, E.E. Moon, H.I. Smith, U.S. Patent No. 5,808,742, September 15, 1998, filed May 28, 1996. (MIT Case No. 7025).
• (P-30) (Optical Gap Sensing), P.N. Everett, E.E. Moon, H.I. Smith, US Patent No. 6,088,103, filed 9/9/98. (MIT Case No. 7025).
• (P-31) (A Method and System for Interference Lithography Utilizing Phase-Locked Scanning Beams), Mark Schattenburg and Patrick N. Everett, (MIT Case No. 8564).
• (P-32) (Near-Field Optical Masks With Embedded Attenuators), James Goodberlet, submitted 7/10/01, (MIT Case No. 9381).
• (P-33) (Method for Fabricating Small Magnetic Elements), Michael Walsh, Joy Cheng, Bernhard Vogeli, Henry Smith, submitted 10/01. MIT Case #9511
• (P-34) (Distributed Feedback Nanocrystal Laser), Moungi Bawendi, Hans J. Eisler, Henry I. Smith, Vikram C. Sundar and Michael Walsh, submitted 10/1/01 (MIT Case No. 9495).
• (P-35) (Self-Aligned Process for Magnetic Random Access Memories), H.I. Smith, (MIT Case #9506) (2001).
• (P-36) (Adaptive Lithography Membrane Masks), M. Feldman, H. Smith, K. Murooka, and Mike Lim, US Patent No. #6,404,481, issued June 11, 2002 (MIT Case No. 8882).
• (P-37) (Dual Level Mask for Pattern Transfer in Lithography), Caroline A. Ross, Timothy Savas, Henry I. Smith and Bernhard Vogeli, (MIT Case No. 9520) (2001).
• (P-38) (Maskless Arrayed Lithography Systems), David J. Carter, Dario Gil, Rajesh Menon and Henry I. Smith, (MIT Case No. 9887) (2002).
• (P-39) (Holographic Fabrication and Replication of Diffractive Optical Elements), George Barbastathis, David J. Carter, Dario Gil, Rajesh Menon and Henry I. Smith, (MIT Case No. 9299) (2002).
• (P-40) (Maskless Lithography Using an array of improved diffractive-focusing elements), George Barbastathis, David J. Carter, Dario Gil, Rajesh Menon and Henry I. Smith, (MIT Case No. 9922) (2002).
• (P-41) (Diffractive Optics Fabrication Procedures), by George Barbastathis, David J. Carter, Dario Gil, James G. Goodberlet, Jeffrey T. Hastings, Rajesh Menon and Henry I. Smith, (MIT Case No. 9996) (2002).
• (P-42) (Optical Gap Measuring Apparatus and Method Having 2-Dimensional Grating Mark with Chirp in one Direction), E.E. Moon, P.N. Everett and Henry I. Smith, US Patent No. #6,522,411, filed 5/25/00, appl. 09/578,578. (MIT Case No. 8449), date of patent 2/18/03.