Full Publications List

(last updated June 21, 2004 2:44 PM )

Journal Article

Journal Articles

• (JA-1). H.I. Smith and M.S. Gussenhoven, "Adhesion of Polished Quartz Crystals under Ultrahigh Vacuum", J. Appl. Phys. 36, 2326-2327 (1965).
• (JA-2). H.I. Smith, "Optical-Contact Bonding", J. Acoust. Soc. Amer. 37, 928-929 (1965).
• (JA-3). H. Van de Vaart and H.I. Smith, "High Efficiency Polarization Reversal of Magnetoelastic Waves in YIG by Optical-Contact Bonding of YAG Disks", Appl. Phys. Lett. 9, 439-441 (1966).
• (JA-4. H.I. Smith and A.B. Smith, "Transmission of Gigahertz Ultrasonic Waves through Optical-Contact Bonds at Room Temperature", J. Acoust. Soc. Amer. 44, 1737-1738 (1968).
• (JA-5. H.I. Smith, "Methods for Fabricating High Frequency Surface Wave Transducers", Rev. Sci. Inst. 40, 729-730 (1969).
• (JA-6. H.I. Smith, "The Physics and Technology of Surface Elastic Waves", International Journal of Nondestructive Testing 2, 31-59 (1970).
• (JA-7. B.E. Burke, A. Bers, H.I. Smith, R.A. Cohen, and R.W. Mountain, "Acoustic Surface Wave Amplification using an Accumuation Layer on Silicon", Proc. IEEE 58, 1775-1776 (1970).
• (JA-8. H.I. Smith, F.J. Bachner, and N. Efremow, "A High-Yield Photolithographic Technique for Surface Wave Devices", J. Electrochem. Soc. 118, 821-825 (1971).
• (JA-9. D.L. Spears and H.I. Smith, "High-Resolution Pattern Replication using Soft X-rays", Electronics Lett. 8, 102-104 (1972).
• (JA-10. D.L. Spears and H.I. Smith, "X-ray Lithography: A New High Resolution Replication Process", Solid State Technol. 15, No. 7, 21-26 (1972).
• (JA-11. R.C. Williamson and H.I. Smith, "Large-Time-Bandwidth-Product Surface-Wave Pulse Compressor Employing Reflective Gratings", Electronics Lett. 8, No. 16, 401-402 (1972).
• (JA-12. R.C. Williamson and H.I. Smith, "The use of Surface-Elastic-Wave Reflection Gratings in Large Time-Bandwidth Pulse-Compression Filters", IEEE Trans. Microwave Theory and Techniques MTT-21, 195-205 (1973).
• (JA-13. H.I. Smith, D.L. Spears, and S.E. Bernacki, "X-ray Lithography: A Complementary Technique to Electron Beam Lithography", J. Vac. Sci. Technol. 10, 913-917 (1973).
• (JA-14. R.J. Hawryluk, A.M. Hawryluk, and H.I. Smith, "Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering", J. Appl. Phys. 45, 2551-2556 (1974).
• (JA-15. H.I. Smith, "Fabrication Techniques for Surface-Acoustic Wave and Thin-Film Optical Devices", Proc. IEEE 62, 1361-1387 (1974).
• (JA-16. H.I. Smith, "Electron Beam, X-ray, and Optical Techniques for Fabricating Surface-Acoustic-Wave and Thin-Film Optical Devices", LeVide 29, No. 173, 364-370 (1974).
• (JA-17. H.I. Smith, N. Efremow, and P.L. Kelly, "Photolithographic Contact Printing of 4000Å Linewidth Patterns", J. Electrochem. Soc. 121, 1503-1506 (1974).
• (JA-18. R.J. Hawryluk, H.I. Smith, A. Soares, and A.M. Hawryluk, "Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering-Experiment", J. Appl. Phys. 46, 2528-2537 (1975).
• (JA-19. S.E. Bernacki and H.I. Smith, "Fabrication of Silicon MOS Devices using X-ray Lithography", IEEE Trans. Elec. Dev. ED22, 421-428 (1975).
• (JA-20. J. Melngailis, H.I. Smith, and N. Efremow, "Instrumentation for Conformable Photomask Lithography", IEEE Trans. Elec. Dev. ED22, 496-498 (1975).
• (JA-21. H.I. Smith, S.R. Chinn, and P.D. DeGraff, "Application of Moiré Techniques in Scanning Electron Beam Lithography and Microscopy", J. Vac. Sci. Technol. 12, 1262-1265 (1975).
• (JA-22. H.I. Smith and S.E. Bernacki, "Prospects for X-ray Fabrication of Silicon IC Devices", J. Vac. Sci. Technol. 12, 1321-1323 (1975).
• (JA-23. S.E. Bernacki and H.I. Smith, "Fabrication of Silicon MOS Devices using X-ray Lithography", (in Japanese), Nikkei Electronics 1-12, 139-157 (1976).
• (JA-24. H.I. Smith and D.C. Flanders, "X-ray Lithography", Japan J. Appl. Phys. 16, Supplement 16 1, 61-65 (1977).
• (JA-25. D.C. Flanders, H.I. Smith, and S. Austin, "A New Interferometric Alignment Technique", Appl. Phys. Lett. 31, 426-428 (1977).
• (JA-26. D.C. Flanders, H.I. Smith, H.W. Lehmann, R. Widmer, and D.C. Shaver, "Surface Relief Structures with Linewidths Below 2000Å", Appl. Phys. Lett. 32, 112-114 (1978).
• JA-27. N.M. Ceglio and H.I. Smith, "Micro Fresnel Zone Plates for Coded Imaging Applications", Rev. Sci. Instr. 49, 15-20 (1978).
• JA-28. H.I. Smith and D.C. Flanders, "Oriented Crystal Growth on Amorphous Substrates using Artificial Surface-Relief Gratings", Appl. Phys. Lett. 32, 349-350 (1978).
• JA-29. D.C. Flanders, D.C. Shaver, and H.I. Smith, "Alignment of Liquid Crystals using Submicrometer Periodicity Gratings", Appl. Phys. Lett. 32, 597-598 (1978).
• JA-30. S. Austin, H.I. Smith, and D.C. Flanders, "Alignment of X-ray Lithography Masks using a New Interferometric Technique - Experimental Results", J. Vac. Sci. Technol. 15, 984 (1978).
• JA-31. D.C. Flanders and H.I. Smith, "Polyimide Membrane X-ray Lithography Masks - Fabrication and Distortion Measurements", J. Vac. Sci. Technol. 15, 995-997 (1978).
• JA-32. D.C. Flanders and H.I. Smith, "Surface Relief Gratings of 3200Å-Period-Fabrication and Influence on Thin-Film Growth", J. Vac. Sci. Technol. 15, 1001 (1978).
• JA-33. M.W. Geis, D.C. Flanders, and H.I. Smith, "Crystallographic Orientation of Silicon on an Amorphous Substrate using an Artificial Surface-Relief Grating and Laser Crystallization", Appl. Phys. Lett. 35, 71 (1979).
• JA-34. J. Melngailis, H.A. Haus, and A. Lattes, "Efficient Conversion of Surface Acoustic Waves in Shallow Gratings to Bulk Plate Modes", Appl. Phys. Lett. 35, 324 (1979).
• JA-35. D.C. Shaver, D.C. Flanders, N.M. Ceglio, and H.I. Smith, "X-ray Zone Plates Fabricated using Electron-Beam and X-ray Lithography", J. Vac. Sci. Technol. 16, 1626 (1979).
• JA-36. M.W. Geis, D.C. Flanders, H.I. Smith, and D.A. Antoniadis, "Graphoepitaxy of Silicon on Fused Silica using Surface Micropatterns and Laser Crystallization", J. Vac. Sci. Technol. 16, 1640 (1979).
• JA-37. D.C. Flanders, A.M. Hawryluk, and H.I. Smith, "Spatial-Period-Division - A New Technique for Exposing Submicrometer-Linewidth Periodic and Quasi-Periodic Patterns", J. Vac. Sci. Technol. 16, 1949 (1979).
• JA-38. H.I. Smith and D.C. Flanders, "X-ray Lithography - A Review and Assessment of Future Applications", J. Vac. Sci. Technol. 17, 533 (1980).
• JA-39. M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, "Silicon Graphoepitaxy using a Strip-Heater Oven", Appl. Phys. Lett. 37, 454 (1980).
• JA-40. H.A. Haus, A. Lattes, and J. Melngailis, "Grating Coupling Between Surface Acoustic Waves and Plate Modes", IEEE Trans. Sonics and Ultrasonics SU27, 258 September 1980.
• JA-41. H.V. Kanel and J.D. Litster, "Light Scattering Studies on Single-Layer Smectic p Butoxybenzilidene p-Octylaniline", Phys. Rev. A 23, 3251 (1981).
• JA-42. M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, "Silicon Graphoepitaxy", J. Vac. Sci. Technol. 18, 229 (1981).
• JA-43. H.V. Kanel, J.D. Litster, J. Melngailis, and H.I. Smith, "Alignment of Nematic Butoxybenzilidene Octylaniline by Surface Relief Gratings", Phys. Rev. A 24, 2713 (l98l).
• JA-44. N.M. Ceglio, C.F. Stone, and A.M. Hawryluk, "Microstructures for High Energy X-ray and Particle Imaging Applications", J. Vac. Sci. Technol. 19, 886 (1981).
• JA-45. A.M. Hawryluk, N.M. Ceglio, R.H. Price, J. Melngailis, and H.I. Smith, "Gold Transmission Gratings with Submicrometer Periods and Thicknesses > 0.5 µm", J. Vac. Sci. Technol. 19, 897 (1981).
• JA-46. N. Tsumita, J. Melngailis, A.M. Hawryluk, and H.I. Smith, "Fabrication of X-ray Masks using Anisotropic Etching of (110) Si and Shadowing Techniques", J. Vac. Sci. Technol. 19, 1211 (1981).
• JA-47. N.N. Efremow, N.P. Economou, K. Bezjian, S.S. Dana, and H.I. Smith, "A Simple Technique for Modifying the Profile of Resist Exposed by Holographic Lithography", J. Vac. Sci. Technol. 19, 1234 (1981).
• JA-48. C.M. Horowitz and J. Melngailis, "Reactive Sputter Etching of Si, SiO2, Cr, Al, and Other Materials with Gas Mixtures Based on CF4 and Cl2", J. Vac. Sci. Technol. 19, 1408 (1981).
• JA-49. P.F. Liao, J.G. Bergman, D.S. Chemla, A. Wokaun, J. Melngailis, A.M. Hawryluk, and N.P. Economou, "Surface Enhanced Raman Scattering from Microlithographic Silver Particle Surfaces", Chem. Phys. Lett. 82, (2), 355 (1981).
• JA-50. C.M. Horwitz, "Reactive Sputter Etching of Silicon with Very Low Mask-Material Etch Rates", IEEE Trans. Elect. Devices ED28, 1320 (198l).
• JA-51. M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, E.W. Maby, and D.A. Antoniadis, "Zone-Melting Recrystallization of Encapsulated Silicon Films on SiO2- Morphology and Crystallography", Appl. Phys. Lett. 40, 158 (1982).
• JA-52. R.J. Hawryluk, A.M. Hawryluk, and H.I. Smith, "Addendum: New Model of Electron Free Path in Multiple Layers for Monte Carlo Simulation", J. Appl. Phys. 53, 5985 (1982).
• JA-53. K.A. Bezjian, H.I. Smith, J.M. Carter, and M.W. Geis, "An Etch Pit Technique for Analyzing Crystallographic Orientation in Si Films", J. Electrochem. Soc. 129, 1848 (1982).
• JA-54. A.M. Hawryluk, H.I. Smith, R.M. Osgood, and D.J. Ehrlich, "Deep-UV Spatial Period Division using An Excimer Laser", Optics Letters 7, 402 (1982).
• JA-55. M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, D.J. Silversmith, and R.W. Mountain, "Zone Melting Recrystallization of Si Films with a Movable-Strip-Heater Oven", J. Electrochem. Soc. 129, 2812 (1982).
• JA-56. H.A. Atwater, H.I. Smith, and M.W. Geis, "Orientation Selection by Zone-Melting Silicon Films through Planar Constrictions", Appl. Phys. Lett. 41, 747 (1982).
• JA-57. N.M. Ceglio, A.M. Hawryluk, and R.H. Price, "Imaging X-ray Spectrometer for Laser Fusion Applications", Appl. Opt. 21, 3953-3960 (1981).
• JA-58. M.W. Geis, H.I. Smith, D.J. Silversmith, R.W. Mountain, and C.V. Thompson, "Solidification-Front Modulation to Entrain Subboundaries in Zone Melting Recrystallization of Si on SiO2", J. Electrochem. Soc. 130, 1178 (1983).
• JA-59. C.M. Horwitz, "New Dry Etch for Al and Al-Cu-Si Alloy: Reactively Masked Sputter Etching with SiF4", Appl. Phys. Lett. 42, 898 (1983).
• JA-60. E.W. Maby, H.A. Atwater, A.L. Keigler, and N.M. Johnson, "Electron-Beam-Induced Current Measurements in Silicon-on-Insulator Films Prepared by Zone-Melting Recrystallization", Appl. Phys. Lett. 43, 482 (1983).
• JA-61. C.M. Horwitz, "RF Sputtering-Voltage Division Between Two Electrodes", J. Vac. Sci. Technol. A 1, 60 (1983).
• JA-62. H.I. Smith, C.V. Thompson, M.W. Geis, R.A. Lemons, and M.A. Bosch, "The Mechanism of Orientation in Si Graphoepitaxy by Laser or Strip-Heater Recrystallization", J. Electrochem. Soc. 130, 2050 (1983).
• JA-63. H.I. Smith, M.W. Geis, C.V. Thompson, and H.A. Atwater, "Silicon-on-Insulator by Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films", J. Crystal Growth, 63, 527 (1983).
• JA-64. C.M. Horwitz, "Hollow Cathode Reactive Sputter Etching - A New High-Rate Process", Appl. Phys. Lett. 43, 977 (1983).
• JA-65. E.H. Anderson, C.M. Horwitz, and H.I. Smith, "Holographic Lithography with Thick Photoresist", Appl. Phys. Lett. 43, 874 (1983).
• JA-66. A.M. Hawryluk, H.I. Smith, and D.J. Ehrlich, "Deep UV Spatial-Frequency Doubling by Combining Multilayer Mirrors with Diffraction Gratings", J. Vac. Sci. Technol. B 1, 1200 (1983).
• JA-67. H.J. Lezec, E.H. Anderson, and H.I. Smith, "An Improved Technique for Resist-Profile Control in Holographic Lithography", J. Vac. Sci. Technol. B 1, 1204 (1983).
• JA-68. N.M. Ceglio, A.M. Hawryluk, and M.L. Schattenburg, "X-ray Phase Lens Design and Fabrication", J. Vac. Sci. Technol. B 1, 1285 (1983).
• JA-69. H.A. Atwater, C.V. Thompson, H.I. Smith, and M.W. Geis, "Orientation Filtering by Growth-Velocity Competition in Zone-Melting Recrystallization of Silicon on SiO2", Appl. Phys. Lett. 43, 1126 (1983).
• JA-70. C.M. Horwitz, "Radio Frequency Sputtering - The Significance of Power Input", J. Vac. Sci. Technol. A 1, 1795 (1983).
• JA-71. H.I. Smith, C.V. Thompson, and H.A. Atwater, "Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films", J. Cryst. Growth 65, 337 (1983).
• JA-72. C.J. Keavney and H.I. Smith, "A 3.8 µm Period Sawtooth Grating in InP by Anisotropic Etching", J. Electrochem. Soc. 131, 452 (1984).
• JA-73. R.F. Kwasnick, M.A. Kastner, J. Melngailis, and P.A. Lee, "Non-Monotonic Variations of the Conductance with Electron Density in ~70 nm Wide Inversion Layers", Phys. Rev. Lett. 52, 224 (1984).
• JA-74. C.V. Thompson and H.I. Smith, "Surface-Energy-Driven Secondary Grain Growth in Ultrathin (<100 nm) Films of Silicon", Appl. Phys. Lett. 44, 603 (1984).
• JA-75. H.A. Atwater, H.I. Smith, C.V. Thompson, and M.W. Geis, "Zone-Melting Recrystallization of Thick Silicon on Insulator Films", Mater. Lett. 2, 269 (1984).
• JA-76. T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, "Graphoepitaxy of Ge on SiO2 by Solid-State Surface-Energy-Driven Grain Growth", Appl. Phys. Lett. 45, 631 (1984).
• JA-77. M.L. Schattenburg, I. Plotnik, and H.I. Smith, "Reactive-Ion Etching of 0.2 µm Period Gratings in Tungsten and Molybdenum using CBrF3", J. Vac. Sci. Technol. B 3, 272 (1985).
• JA-78. A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, "Surface Superlattice Formation in Silicon Inversion Layers using 0.2 µm-Period Grating-Gate Electrodes", IEEE Elect. Dev. Lett. EDL-6, 294 (1985).
• JA-79. G.G. Shahidi, E.P. Ippen, and J. Melngailis, "Submicron-Gap High-Mobility Silicon Picosecond Photodetectors", Appl. Phys. 58, 763 (1985).
• JA-80. C.V. Thompson, "Secondary Grain Growth in Thin Films of Semiconductors: Theoretical Aspects", J. Appl. Phys. 58, 763 (1985).
• JA-81. S.Y. Chou, H.I. Smith, and D.A. Antoniadis, "X-ray Lithography for Sub-100 nm Channel Length Transistors using Masks Fabricated with Conventional Photolithography, Anisotropic Etching and Oblique Shadowing", J. Vac. Sci. Technol. B 3, 1587 (1985).
• JA-82. J.C. Licini, D.J. Bishop, M.A. Kastner, and J. Melngailis, "Aperiodic Magnetoresistance Oscillations in Narrow Inversion Layers in Si", Phy. Dev. Lett. 55, 2987 (1985).
• JA-83. S.Y. Chou, D.A. Antoniadis, and H.I. Smith, "Observation of Electron Velocity Overshoot in Sub-100 nm-Channel MOSFETs in Si", IEEE Elect. Dev. Lett. EDL-6, 665 (1985).
• JA-84. H.I. Smith, "A Statistical Analysis of UV, X-ray and Charged-Particle Lithographies", J. Vac. Sci. Technol. B 4, 148 (1986).
• JA-85. S.Y. Chou, H.I. Smith, and D.A. Antoniadis, "Sub-100 nm Channel-Length Transistors Fabricated using X-ray Lithography", J. Vac. Sci. Technol. B 4, 253 (1986).
• JA-86. A.C. Warren, I. Plotnik, E.H. Anderson, M.L. Schattenburg, D.A. Antoniadis, and H.I. Smith, "Fabrication of Sub-100 nm Linewidth Periodic Structures for Study of Quantum Effects from Interference and Confinement in Si Inversion Layers", J. Vac. Sci. Technol. B 4, 365 (1986).
• JA-87. C.C. Wong, H.I. Smith, and C.V. Thompson "Surface-Energy-Driven Secondary Grain Growth in Thin Au Films", Appl. Phys. Lett. 48, 335 (1986).
• JA-88. H.-J. Kim, C.V. Thompson, "Compensation of Grain Growth Enhancement in Doped Silicon Films", Appl. Phys. Lett. 48, 399 (1986).
• JA-89. A.C. Warren, D.A. Antoniadis, and H.I. Smith, "Quasi One-Dimensional Conduction in Multiple, Parallel Inversion Lines", Phys. Rev. Lett. 56, 1858 (1986).
• JA-90. S.Y. Chou and D.A. Antoniadis "Relationship Between Measured and Intrinsic Transconductances of FETs", IEEE Trans. Electron Devices ED-34, 448 (1987).
• JA-91. M.W. Geis, H.I. Smith, and C.K. Chen, "Characterization and Entrainment of Subboundaries and Defect Trails in Zone-Melting-Recrystallized Si Films", J. Appl. Phys. 60, 1152 (1986).
• JA-92. H.I. Smith, "A Review of Submicron Lithography", Superlattices and Microstructures 2, 129 (1986).
• JA-93. A.C. Warren, D.A. Antoniadis, and H.I. Smith, "Semi-Classical Calculation of Charge Distributions in Ultra-Narrow Inversion Lines", IEEE Electron Device Letters EDL-7, 413 (1986).
• JA-94. S.Y. Chou, D.A. Antoniadis, and H.I. Smith, "Application of the Shubnikov-de Haas Oscillations in Characterization of Si MOSFET's and GaAs MODFET's", IEEE Trans. Elec. Dev. ED-34, 883 (1987).
• JA-95. C.R. Canizares, H.V.D. Bradt, G.W. Clark, A.C. Fabian, P.C. Joss, A.M. Levine, W.H.G. Lewin, T.H. Market, W. Mayer, J.E. McClintock, S.A. Rappaport, G.R. Ricker, M.L. Schattenburg, H.I. Smith, and B.E. Woodgate, "The MIT Spectroscopy Investigation on AXAF and the Study of Supernova Remnants", Astro. Lett. and Communications 26, 87 (1987).
• JA-96. S.M. Garrison, R.C. Cammarata, C.V. Thompson, and H. I. Smith, "Surface-Energy-Driven Grain Growth during Rapid Thermal Annealing (< 10s) of Thin Silicon Films", J. Appl. Phys. 61, 1652 (1987).
• JA-97. S.Y. Chou, D.A. Antoniadis, H.I. Smith, and M.A. Kastner, "Conductance Fluctuations in Ultra-Short-Channel Si MOSFETs", Solid State Communications 61, 571 (1987).
• JA-98. M.A. Kastner, R.F. Kwasnick, J.C. Licini, and D.J. Bishop, "Conductance Fluctuations Near the Localized-to-Extended Transition in Narrow Si MOSFETs", Phys. Rev. B 36, 8015 (1987).
• JA-99. J.S. Im, H. Tomita, and C.V.Thompson, "Cellular and Dendritic Morphologies on Stationary and Moving Liquid-Solid Interfaces in Zone-Melting Recrystallization", Appl. Phys. Lett. 51, 685 (1987).
• JA-100. J. Palmer, C.V. Thompson, and H.I. Smith, "Grain Growth and Grain Size Distribution in Thin Germanium Films", J. Appl. Phys. 62, 2492 (1987).
• JA-101. G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, "Observation of Electron Velocity Overshoot at Room and Liquid Nitrogen Temperatures in Silicon Inversion Layers", IEEE Elect. Dev. Lett. EDL-9, 94 (1988).
• JA-102. H.A. Atwater, C.V. Thompson, and H.I. Smith, "Interface-Limited Grain Boundary Motion during Ion Bombardment", Phys. Rev. Lett. 60, 112 (1988).
• JA-103. G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, "Electron Velocity Overshoot in Sub-100 nm Channel Length MOSFETs at 77K and 300K", J. Vac. Sci. Technol. B 6, 137 (1988).
• JA-104. H.I. Smith, "A Model for Comparing Process Latitude in Ultraviolet, Deep-Ultraviolet and X-ray Lithography", J. Vac. Sci. Technol. B 6, 346-349 (1988).
• JA-105. E.H. Anderson, K. Komatsu, and H.I. Smith, "Achromatic Holographic Lithography in the Deep UV", J. Vac. Sci. Technol. B 6, 216 (1988).
• JA-106. Y.-C. Ku, E.H. Anderson, M.L. Schattenburg, and H.I. Smith, "Use of a Pi-Phase-Shifting X ray Mask to Increase the Intensity Slope at Feature Edges", J. Vac. Sci. Technol. B 6, 150 (1988).
• JA-107. G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, "Reduction of Channel-Hot-Electron-Generated Substrate Current in Sub-150 nm Channel Length Si MOSFETs", IEEE Elect. Dev. Lett. EDL-9, 497 (1988).
• JA-108. K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, "Surface-Superlattice Effects in a Grating-Gate GaAs/GaA1As Modulation-Doped Field-Effect Transistor", Appl. Phys. Lett. 52, 1071 (1988).
• JA-109. M.A. Kastner, S.B. Field, J.C. Licini, and S.L.Park, "Anomalous Magnetoresistance of the Electron Gas in a Restricted Geometry", Phys. Rev. Lett. 60, 2535 (1988).
• JA-110. E.H. Anderson, A.M. Levine, and M.L. Schattenburg, "Transmission X-ray Diffraction Grating Alignment using a Photoelastic Modulator", Appl. Opt. Lett. 27, 3522 (1988).
• JA-111. H.A. Atwater, C.V. Thompson, and H.I. Smith, "Ion Bombardment Enhanced Grain Growth in Germanium, Silicon and Gold Thin Films", J. Appl. Phys. 64, 2337 (1988).
• JA-112. H.A. Atwater, C.V. Thompson, and H.I. Smith, "Mechanisms for Crystallographic Orientation in the Crystallization of Thin Silicon Films from the Melt", J. Mat. Res. 3, 1232 (1988).
• JA-113. D.W. Keith, M.L. Schattenburg, H.I. Smith, and D.E. Pritchard, "Diffraction of Atoms by a Transmission Grating", Phys. Rev. Lett. 61, 1580-1583 (1988).
• JA-114. H.A. Atwater and C.V. Thompson, "Point Defect Enhanced Grain Growth in Silicon Thin Films: The Role of Ion Bombardment and Dopants", Appl. Phys. Lett. 53, 2155 (1988).
• JA-115. C. Ortiz, K.A. Rubin, and S. Ajuria, "Laser-Induced Multi- Crystallization Events of Thin Germanium Films", J. Mat. Res. 3, 1196 (1988).
• JA-116. K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, "Lateral-Surface Superlattice and Quasi-One-Dimensional GaAs/GaAlAs MODFETs Fabricated using X-ray and Deep-UV Lithography", J. Vac. Sci. Technol. B 6, 1824 (1988).
• JA-117. J.H.F. Scott-Thomas, M.A. Kastner, D.A. Antoniadis, H.I. Smith, and S. Field, "Si MOSFETs with 70 nm Slotted Gates for Study of Quasi-One-Dimensional Quantum Transport", J. Vac. Sci. Technol. B 6, 1841 (1988).
• JA-118. JA-118 Y.C. Ku, H.I. Smith,and I. Plotnik, "Use of Ion Implantation to Eliminate Stress-Induced Distortion in X-ray Masks", J. Vac. Sci. Technol. B 6, 2174 (1988).
• JA-119. U. Meirav, M. Heiblum, and F. Stern, "High-Mobility Variable-Density Two-Dimensional Electron Gas in Inverted GaAs-AlGaAs Heterojunctions", Appl. Phys. Lett. 52, 460-462 (1988).]
  JA-120. K. Ismail, W. Chu, A. Yen, D.A. Antoniadis and H.I. Smith, "Negative Transconductance and Negative Differential Resistance in a Grid-Gate Modulation-Doped Field-Effect Transistor", Appl. Phys. Lett. 54, 460 (1989).
• JA-121. K. Ismail, D.A. Antoniadis, and H.I. Smith, "One-Dimensional Subbands and Mobility Modulation in GaAs/AlGaAs Quantum Wires", Appl. Phys. Lett. 54, 1130 (1989).
  JA-122. J.H.F. Scott-Thomas, S.B. Field, M.A. Kastner, H.I. Smith, and D.A. Antoniadis, "Conductance Oscillations Periodic in the Density of a One-Dimensional Electron Gas", Phys. Rev. Lett. 62, 583 (1989).
  JA-123. P.F. Bagwell and T.P. Orlando, "Landauer's Conductance Formula and its Generalization to Finite Voltages", Phys. Rev. B 40, 1456 (1989).
• JA-124. P.F. Bagwell and T.P. Orlando, "Broadened Conductivity Tensor and Density of States for a Superlattice Potential in 1, 2, and 3 Dimensions", Phys. Rev. B 40, 3735 (1989).
• JA-125. C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Magneto-Optics of a Quasi Zero-Dimensional Electron Gas", Appl. Phy. Lett. 55, 168 (1989).
• JA-126. K. Ismail, D.A. Antoniadis, and H.I. Smith, "Lateral Resonant Tunneling in a Double-Barrier Field-Effect Transistor", Appl. Phys. Lett. 55, 589 (1989).
• JA-127. [U. Meirav, M.A. Kastner, M. Heiblum, and S.J. Wind, "One-Dimensional Electron Gas in GaAs: Periodic Conductance Oscillations as a Function of Density", Phys. Rev. B 40, 5871 (1989).]
• JA-128. W. Chu, A. Yen, K. Ismail, M.I. Shepard, H.J. Lezec, C.R. Musil, J. Melngailis, Y.-C. Ku, J.M. Carter, and H.I. Smith, "Sub-100 nm X-ray Mask Technology using Focused-Ion-Beam Lithography", J. Vac. Sci. Technol. B 7, 1583-1585 (1989).
• JA-129. A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith, "Microgap Control in X-ray Nanolithography", J. Vac. Sci. Technol. B 7, 1692-1695 (1989).
• JA-130. K. Ismail, W. Chu, R. Tiberio, A. Yen, H.J. Lezec, M.I. Shepard, C.R. Musil, J. Melngailis, D.A. Antoniadis, and H.I. Smith, "Resonant Tunneling Across and Mobility Modulation Along Surface-Structured Quantum Wells", J. Vac. Sci. Technol. B 7, 2025-2029 (1989).
• JA-131. K. Ismail, D.A. Antoniadis, H.I. Smith, C.T. Liu, K. Nakamura, and D.C. Tsui, "A Lateral-Surface Superlattice Structure on GaAs/AlGaAs for Far-Infrared and Magneto-Capacitance Measurements", J. Vac. Sci. Technol. B 7, 2000-2002 (1989).
• JA-132 K. Ismail, T.P. Smith, III, W.T. Masselink and H. I. Smith, "Magnetic Flux Commensurability in Coupled Quantum Dots", Appl. Phys. Lett. 55, 276 (1989).
• JA-132A A. Kumar, S.E. Laux, and F. Stern, "Channel Sensitivity to Gate Roughness in a Split-gate GaAs-AlGaAs Heterostructure", Appl. Phys. Lett. 54, 1270 (1989).
• JA-133. C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Far-Infrared Transmission Measurements on Grid-Gate GaAs/AlGaAs Lateral-Surface-Superlattice Structures", J. Surface Science 228, 527 (1990).
• JA-134. C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Oscillatory Density-of-States of Landau Bands in a Two-Dimensional Lateral Surface Superlattice", Solid State Communications 75, 395-399 (1990).
• JA-135. C.V. Thompson, J. Floro, and H.I. Smith, "Epitaxial Grain Growth in Thin Metal Films", J. Appl. Phys. 67, 4099-4104 (1990).
• JA-136. M.L. Schattenburg, E.H. Anderson, and H.I. Smith, "X-ray/VUV Transmission Gratings for Astrophysical and Laboratory Applications", Physica Scripta 41, 13-20 (1990).
• JA-137. J.A. del Alamo and C.C. Eugster, "Quantum Field-Effect Directional Coupler", Appl. Phys. Lett. 56, 78 (1990).]
• JA-138. P.F. Bagwell, "Evanescent Modes and Scattering in Quasi-One-Dimensional Wires", Phys. Rev. B 41, 354-371 (1990).
• JA-139. P.F. Bagwell, "Solution of Dyson's Equation in a Quasi-One-Dimensional Wire", J. Phy. Condens. Matter 2, 6179 (1990).
• JA-140. H.I. Smith and H.G. Craighead, "Nanofabrication", Physics Today pp. 24-30 February (1990).
• JA-141. H.I. Smith and D.A. Antoniadis, "Seeking a Radically New Electronics", Technology Review 93, pp. 26-40 (1990).
• JA-142. A. Toriumi, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, "Resonant Magneto-Capacitance in a Two-Dimensional Lateral-Surface Superlattice", Phys. Rev. B 41, 12346-12349 (1990).
• JA-143. S.B. Field, M.A. Kastner, U. Meirav, J.H.F. Scott-Thomas, D.A. Antoniadis, H.I. Smith, and S.J. Wind, "Conductance Oscillations Periodic in the Density of One-Dimensional Electron Gases", Phys. Rev. B 42, 3523-3536 (1990).
• JA-144. A. Kumar and P.F. Bagwell, "Resonant Tunneling in a Multi-Channel Wire", Solid State Communications, 75, 949-953 (1990).
• JA-145. P.F. Bagwell, T.P.E. Broekaert, T.P. Orlando, and C.G. Fonstad, "Resonant Tunneling Diodes and Transistors with a One-, Two-, or Three- Dimensional Electron Emitter", J. Appl. Phys. 68, 4634-4646 (1990).
• JA-146. [U. Meirav, M.A. Kastner, and S.J. Wind, "Single Electron Charging and Periodic Conductance Resonances in GaAs Nanostructures", Phys. Rev. Lett. 65, 771-774 (1990).]
• JA-147. M.L. Schattenburg, K. Early, Y.C. Ku, W. Chu, M.I. Shepard, S.C. The, H.I. Smith, D.W. Peters, R.D. Frankel, D.R. Kelly, and J.P. Drumheller, "Fabrication and Testing of 0.1 µm-Linewidth Microgap X-ray Masks", J. Vac. Sci. Technol. B 8, 1604-1608 (1990).
• JA-148. A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith, "A Compact, Low-Cost System for Sub-100 nm X-ray Lithography", J. Vac. Sci. Technol. B 8, 1648-1651 (1990).
• JA-149. [C.C. Eugster, J.A. del Alamo, and M.J. Rooks, "Transport in Novel Gated Quantum Wires: The Impact of Wire Length", Japanese J. Appl. Phys. 12, L2257-L2260 (1990).]
• JA-150. [A. Kumar, S.E. Laux, and F. Stern, "Electron States in a GaAs Quantum Dot in a Magnetic Field", Phys. Rev. B 42, 5166-5175 (1990).]
• JA-151. K. Ismail, M. Burkhardt, H.I. Smith, N.H. Karam, and P.A. Sekula-Moise, "Patterning and Characterization of Large-Area Quantum-Wire Arrays", Appl. Phys. Lett. 58, 1539-1541 (1991).
• JA-152. A. Kumar and P.F. Bagwell, "Resonant Tunneling in a Quasi-One-Dimensional Wire: Influence of Evanescent Modes", Phys. Rev. B 43, 9012-9020 (l991).
• JA-153. M.W. Geis, H. I. Smith, A. Argoitia, J. Angus, G.H.M. Ma, J.T. Glass, J. Butler, C.J. Robinson, and R. Pryor, "Large-Area Mosaic Diamond Films Approaching Single-Crystal Quality", Appl. Phys. Lett. 58, 2485 (1991).
• JA-154. C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, "Guiding-Center-Drift Resonance of Two-Dimensional Electrons in a Grid-Gate Superlattice Potential", Appl. Phys. Lett. 58, 2945-2947 (1991).
• JA-155. N.H. Karam, A. Mastrovita, V. Haven, K. Ismail, S. Pennycock, and H.I. Smith, "Patterning and Overgrowth of Nanostructure Quantum Well Wire Arrays by LP-MOVPE", J. Crystal Growth 107, 591-597 (1991).
• JA-156. W. Chu, H.I. Smith, M.L. Schattenburg, "Replication of 50 nm Linewidth Device Patterns using Proximity X-ray Lithography at Large Gaps", Appl. Phys. Lett. 59, 1641-1643 (1991).
• JA-157. K. Ismail, P.F. Bagwell, T.P. Orlando, D.A. Antoniadis, and H.I. Smith, "Quantum Phenomena in Field-Effect-Controlled Semiconductor Nanostructures", Proc. IEEE 79, 1106-1116 (1991).
• JA-158. M.L. Schattenburg, C.R. Canizares, D. Dewey, K.A. Flanagan, M.A. Hamnett, A.M. Levine, K.S.K. Lum, R. Manikkalingam, T.H. Markert, and H.I. Smith, "Transmission Grating Spectroscopy and the Advanced X-ray Astrophysics Facility", Optical Engineering 30, 1590 1600 (1991).
• JA-159. K. Ismail, F. Legoues, N.H. Karam, J. Carter, and H.I. Smith, "High Quality GaAs on Sawtooth-Patterned Si Substrates", Appl. Phys. Lett. 59, 2418-2420 (1991).
• JA-160. Y.C. Ku, L.-P. Ng, R. Carpenter, K. Lu, H.I. Smith, L.E. Haas, and I. Plotnik, "In-Situ Stress Monitoring and Deposition of Zero Stress W for X-ray Masks", J. Vac. Sci. Technol. B 9, 3297 3300 (1991).
• JA-161. A. Moel, W. Chu, K. Early, Y.C. Ku, E.E. Moon, F. Tsai, H.I. Smith, M.L. Schattenburg, C.D. Fung, F.W. Griffith, and L.E. Haas, "Fabrication and Characterization of High-Flatness Mesa-Etched Silicon Nitride X-ray Masks", J. Vac. Sci. Technol. B 9, 3287-3291 (1991).
• JA-162. H.I. Smith, S.D. Hector, M.L. Schattenburg, and E.H. Anderson, "A New Approach to High Fidelity E-Beam Lithography Based on an In-Situ, Global Fiducial Grid", J. Vac. Sci. Technol. B 9, 2992-2995 (1991).
• JA-163. E.H. Anderson, V.Boegli, M.L. Schattenburg, D.P. Kern, and H.I. Smith, "Metrology of Electron Beam Lithography Systems using Holographically Produced Reference Samples", J. Vac. Sci. Technol. B 9, 3606-3611 (1991).
• JA-164. M.L. Schattenburg, K. Li, R.T. Shin, J.A. Kong, D.B. Olster, and H.I. Smith, "Electromagnetic Calculation of Soft-X-ray Diffraction from 0.1 µm Scale Gold Structures", J. Vac. Sci. Technol. B 9, 3232-3236 (1991).
• JA-165. A. Kumar and P.F. Bagwell,"Evolution of the Quantized Ballistic Conductance with Increasing Disorder in Narrow-Wire Arrays", Phys. Rev. B44, 1747-1753 (1991).
• JA-166. C.C. Eugster and J.A. del Alamo, "Tunneling Spectroscopy of an Electron Waveguide", Phys. Rev. Lett. 67, 3586-3589 (1991).]
• JA-167. [P.L. McEuen, E.B. Foxman, U. Meirav, M.A. Kastner, Y. Meir, N.S. Wingree, and S.J. Wind, "Transport Spectroscopy of a Coulomb Island in the Quantum Hall Regime", Phys. Rev. Lett. 66, 1926-1929 (1991).]
• JA-168. K.W. Rhee, A.C. Ting, L.M. Shirley, K.W. Foster, J.M. Andrews, M.C. Peckerar, and Y.C. Ku, "Patterning Tungsten Films with an Electron Beam Lithogaphy System at 50 keV for X-ray Mask Applications", J. Vac. Sci. Technol. B 9, 3292-3296 (1991).
• JA-169. [U. Meirav, P.L. McEuen, M.A. Kastner, E.B. Foxman, A. Kumar, and S.J. Wind, "Conductance Oscillations and Transport Spectroscopy of a Quantum Dot", Z. Phys. B – Condensed Matter 85, 357-366 (1991).]
• JA-170. W. Chu, H.I. Smith, S.A. Rishton, D.P. Kern, and M.L. Schattenburg, "Fabrication of 50 nm Line-and-Space X-ray Masks in Thick Au using a 50 keV Electron Beam System", J. Vac. Sci. Technol. B 10, 118-121 (1992).
• JA-171. A. Yen, H.I. Smith, M.L. Schattenburg, and G.N. Taylor. "An Anti-Reflection Coating for use with PMMA at 193 nm", J. Electrochem. Soc., 139, 616-619 (1992).
• JA-172. [C.C. Eugster, J.A. del Alamo, M.J. Rooks, M.R. Melloch, "Split-Gate Dual-Electron Waveguide Device", Appl. Phys. Lett. 5, 642-644 (1992).]
• JA-173. Y. Zhao, D.C. Tsui, M. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, "Magneto-optical Absorption in a Two Dimensional Electron Grid", Appl. Phys. Lett. 12, 1510-1512 (1992).
• JA-174. A. Kumar, "Self-Consistent Calculations on Confined Electrons in Three-Dimensional Geometries", 9th Conf. on Electronic Properties of 2-D Systems, Nara, Japan, July 8-12, 91, Surface Science, 263, 335-340 (1992).
• JA-175. P.F. Bagwell, S.L. Park, A. Yen, D.A. Antoniadis, H.I. Smith, T.P. Orlando, and M.A. Kastner, "Magnetotransport in Multiple Narrow Silicon Inversion Channels Opened Electrostatically into a Two-Dimensional Electron Gas", Phys. Rev. B 45, 9214-9221 (1992).
• JA-176. A. Yen, M.L. Schattenburg, and H.I. Smith, "Proposed Method for Fabricating 50 nm-period Gratings by Achromatic Holographic Lithography", Applied Optics 31, 2972-2973 (1992).
• JA-177. A. Yen, E.H. Anderson, R.A. Ghanbari, M.L. Schattenburg, and H.I. Smith, "Achromatic Holographic Configuration for 100 nm Period Lithography", Applied Optics 31, 4540-4545 (1992).
• JA-178. [M.A. Kastner, "The Single Electron Transistor", Rev. Mod. Phys. 64, 849 (1992).]
• JA-179. J.M. Carter, D.B. Olster, M.L. Schattenburg, A. Yen, and H.I. Smith, "Large-Area, Free-Standing Gratings for Atom Interferometry Produced using Holographic Lithography", J. Vac. Sci. Technol. B 10, 2909-2911 (1992).
• JA-180. Y.C. Ku, M.H. Lim, J.M. Carter, M.K. Mondol, A. Moel, and H.I. Smith, "Correlation of In-Plane and Out-of-Plane Distortion in X-ray Lithography Masks", J. Vac. Sci. Technol. B 10, 3169-3172 (1992).
• JA-181. S.D. Hector, M.L. Schattenburg, E.H. Anderson, W. Chu, V.V. Wong, and H.I. Smith, "Modeling and Experimental Verification of Illumination and Diffraction Effects on Image Quality in X-ray Lithography", J. Vac. Sci. Technol. B 10, 3164-3168 (1992).
• JA-182. G.E. Rittenhouse, K. Early, B.S. Meyerson, H.I. Smith, and J.M. Graybeal, "Novel Vertical Silicon-Membrane Structure and Its Application to Josephson Devices", J. Vac. Sci. Technol. B 10, 2860-2863 (1992).
• JA-183. W. Chu, C.C. Eugster, A. Moel, E.E. Moon, J.A. del Alamo, H.I. Smith, M.L. Schattenburg, K.W. Rhee, M.C. Peckerar, and M.R. Melloch, "Conductance Quantization in a GaAs Electron Waveguide Device Fabricated by X-ray Lithography", J. Vac. Sci. Technol. B 10, 2966-2969 (1992).
• JA-184. R.A. Ghanbari, W. Chu, E.E. Moon, M. Burkhardt, K. Yee, D.A. Antoniadis, H.I. Smith, M.L. Schattenburg, K.W. Rhee, R. Bass, M.C. Peckerar, and M.R. Melloch, "Fabrication of Parallel Quasi-One-Dimensional Wires using a Novel Conformable X-ray Mask Technology", J. Vac. Sci. Technol. B 10, 3196-3199 (1992).
• JA-185. R.A. Ghanbari, M. Burkhardt, D.A. Antoniadis, H.I. Smith, M.R. Melloch, K.W. Rhee, and M.C. Peckerar, "Comparative Mobility Degradation in Modulation-Doped GaAs Devices after E-beam and X-ray Irradiation", J. Vac. Sci. Technol. B 10, 2890-2892 (1992).
• JA-186. K.W. Rhee, D.I. Ma, M.E. Peckerar, R.A. Ghanbari, and H.I. Smith, "Proximity Effect Reduction in X-ray Mask Making using Thin Silicon Dioxide Layers", J. Vac. Sci. Technol. B 10, 3062-3066 (1992).
• JA-187. H.I. Smith, M.L. Schattenburg, "X-ray Lithography, from 500 to 30 nm: X-ray Nanolithography", IBM Journal of Research & Development 37, 319-329 (1993).
• JA-188. Y. Zhao, D.C. Tsui, M. Santos and M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, Henry I. Smith, and K. Kempa, "Mode Softening in the Far Infrared Excitation of Quantum Wire Arrays", Phys. Rev. B 48, 5249-5255 (1993).
• JA-189. A. Moel, E.E. Moon, R. Frankel, and H.I. Smith, "Novel On-axis Interferometric Alignment Method with Sub-10 nm Precision", J. Vac. Sci. Technol. B 11, 2191-2194 (1993).
• JA-190. J. Ferrera, V.V. Wong, S. Rishton, V. Boegli, E.H. Anderson, D.P. Kern, and H.I. Smith, "Spatial-Phase-Locked Electron-Beam Lithography: Initial Test Results", J. Vac. Sci. Technol. B 11, 2342-2345 (1993).
• JA-191. V.V. Wong, W.-Y. Choi, J. Carter, C.G. Fonstad, and H.I. Smith, "Ridge-Waveguide Sidewall-Grating Distributed Feedback Structures Fabricated by X-ray Lithography", J. Vac. Sci. Technol. B 11, 2621-2624 (1993).
• JA-192. N. Gupta, S.D. Hector, K.W. Rhee, and H.I. Smith, "Fabrication of 100 nm T-Gates for Monolithic Microwave Integrated Circuits using X-ray Lithography", J. Vac. Sci. Technol. B 11, 2625-2628 (1993).
• JA-193. M.L. Schattenburg, N.A. Polce, and H.I. Smith, "Fabrication of Flip-Bonded Mesa Masks for X-ray Lithography", J. Vac. Sci. Technol. B 11, 2906-2909 (1993).
• JA-194. A.W. Yanof, G.L. Zipfel, and E.E. Moon, "X-ray Mask Membrane Motion in Narrow Gap Lithography: Hydrodynamic Model and Experiment", J. Vac. Sci. Technol. B 11, 2920-2925 (1993).
• JA-195. S.D. Hector, H.I. Smith, and M.L. Schattenburg, "Simultaneous Optimization of Spectrum, Spatial Coherence, Gap, Feature Bias, and Absorber Thickness in Synchrotron-Based X-ray Lithography", J. Vac. Sci. Technol. B 11, 2981-2985 (1993).
• JA-196. C.O. Bozler, C.T. Harris, S.Rabe, D.D. Rathman, W.D. Goodhue, M.A. Hollis, and H.I. Smith, "Arrays of Gated Field-Emitter Cones having 0.32 µm Tip-to-Tip Spacings", J. Vac. Sci. Technol. B 12, 629-632 (1994).
• JA-197. M. Burkhardt, H.I. Smith, D.A. Antoniadis, T.P. Orlando, M.R. Melloch, K.W. Rhee, and M.C. Peckerar, "Fabrication Using X-ray Nanolithography and Measurement of Coulomb Blockade in a Variable-Sized Quantum Dot", J. Vac. Sci. Technol. B 12, 3611-3613 (1994).
• JA-198. I.Y. Yang, H. Hu, L.T. Su, V.V. Wong, M. Burkhardt, E. Moon, J. Carter, D.A. Antoniadis, H.I. Smith, K.W. Rhee, and W. Chu, "High Performance Self-Aligned Sub-100 nm MOSFETs Using X-ray Lithography", J. Vac. Sci. Technol. B 12, 4051-4054 (1994).
• JA-199. M. Mondol, H. Li, G. Owen, and H.I. Smith, "Uniform-Stress Tungsten on X-ray Mask Membranes via He-Backside Temperature Homogenization", J. Vac. Sci. Technol. B 12, 4024-4027 (1994).
• JA-200. S.D. Hector, V.V. Wong, H.I. Smith, M.A. McCord, A. Wagner, and K.W. Rhee, "Printability of sub-150 nm features in X-ray Lithography: theory and experiments", J. Vac. Sci. Technol. B 12, 3965-3969 (1994).
• JA-201. V.V. Wong, J. Ferrera, J. Damask, J. Carter, E. Moon, H.A. Haus, H.I. Smith, and S. Rishton, "Spatial-Phase Locked E-Beam Lithography and X-ray Lithography for Fabricating First-Order Gratings on Rib Waveguides", J. Vac. Sci. Technol. B 12, 3741-3745 (1994).
• JA-202. J.Z.Y. Guo, G.K. Celler, J.R. Maldonado, and S.D. Hector, “Wavelength Dependence of Exposure Window and Resist Profile in X-Ray Lithography”, J. Vac. Sci. Technol. B 12, 4044-4050 (1994).
• JA-203. H. Hu, J.B. Jacobs, J.E. Chung, and D.A. Antoniadis, “The Correlation between Gate Current and Substrate current in 0.1 um NMOSFETs”, IEEE Elec. Dev. Lett. 11, 418 (1994).
• JA-204. Y. Zhao, D.C. Tsui, M.B. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, “Grating-Induced Cyclotron-Resonance Anomaly in GaAs/Al1Ga1-x As Heterostructures”, Phys. Rev. B51, 13174 (1995).
• JA-205. M. Grayson, D.C. Tsui, M. Shayegan, K. Hirakawa, R.A. Ghanbari, and H. I. Smith, “Far-infrared Emission from Hot Quasi-One-Dimensional Quantum Wires in GaAs”, Appl. Phys. Lett. 67. 1564 (1995).
• JA-206. T.A. Savas, S.N. Shah, M.L. Schattenburg, J.M. Carter, and H.I. Smith, "Achromatic-Interferometric Lithography for 100nm-Period Gratings and Grids", J. Vac. Sci. Technol. B 13(6), 2732-2735 (1995).
• JA-207. I.Y. Yang, S. Silverman, J. Ferrera, K. Jackson, J.M. Carter, D.A. Antoniadis, and H.I. Smith,, "Combining and Matching Optical, E-beam and X-ray Lithographies in the Fabrication of Si CMOS Circuits with 0.1 and Sub-0.1µm Features", J. Vac. Sci. Technol. B 13, 2741-2744 (1995).
• JA-208. R.J. Aucoin and M.L. Schattenburg, "Optically-Matched Tri-Level Resist Process for Nanostructure Fabrication", J. Vac. Sci. Technol. B 13, 3007-3011 (1995).
• JA-209. E.E. Moon, P.N. Everett, and H.I. Smith, “Immunity to Signal Degradation by Overlayers Using a Novel Spatial-Phase-Matching Alignment System”, J. Vac. Sci. Technol. B 13, 2648-2652 (1995).
• JA-210. V.V. Wong, J. Ferrera, J.N. Damask, T.E. Murphy, and H.I. Smith, “Distributed Bragg Grating Integrated Optical Filters; Synthesis and Fabrication”, J. Vac. Sci. Technol. B 13, 2859-2864 (1995).
• JA-211. V.V. Wong, A. Yasaka, and H.I. Smith, “Resist Planarization over Topography using Ion Implantation”, J. Vac. Sci. Technol. B 13, 2797-2800 (1995).
• JA-212. H.I. Smith, “100 Years of X-rays: Impact on Micro- and Nanofabrication”, J. Vac. Sci. Technol. B 13, 2323-2328 (1995).
• JA-213. M.J. Rooks, R.C. Tiberio, M. Chapman, T. Hammond, E. Smith, A. Lenef, R. Rubenstein, D. Pritchard, S. Adams, J. Ferrera, J.M. Carter, and H.I. Smith, "Coherence and Structural Design of Free-Standing Gratings for Atom-Wave Optics", Japan J. Appl. Phys. 34, 6935-6939 (1995).
• JA-214. H.I. Smith, “X-ray Lithography for Microelectronics”, Physics Scripta, 61, 26-31 (1996).
• JA-215. H.I. Smith, M.L. Schattenburg, S.D. Hector, J. Ferrera, E.E. Moon, I.Y. Yang, and M. Burkhardt, “X-ray Nanolithography: Extension to the Limits of the Lithographic Process”, Microelectronic Engineering 32, 143-158 (1996).
• JA-216. E.E. Moon, P.N. Everett, K. Rhee, and H.I. Smith, “Simultaneous Measurement of Gap and Superposition in a Precision Aligner for X-ray Nanolithography,” J. Vac. Sci. Technol. B 14, 3969-3973 (1996).
• JA-217. J. Ferrera, M.L. Schattenburg, and H.I. Smith, “Analysis of Distortion in Interferometric Lithography”, J. Vac. Sci. Technol. B 14, 4009-4013 (1996).
• JA-218. I.Y. Yang, D.A. Antoniadis, and H.I. Smith, “Fabrication of Back-gated CMOS Devices Using Mixed and Matched Optical and X-ray Lithographies,” J. Vac. Sci. Technol. B 14, 4024-4028 (1996).
• JA-219. T.A. Savas, M.L. Schattenburg, J.M. Carter, and H.I. Smith, “Large-Area Achromatic Interferometric Lithography for 100nm-Period Gratings and Grids; With Novel Applications,” J. Vac. Sci. Technol. B 14, 4167-4170 (1996).
• JA-220. H.I. Smith, “A Proposal for Maskless, Zone-Plate-Array Nanolithography,” J. Vac. Sci. Technol. B 14, 4318-4322 (1996).
• JA-221. J. Damask, “Practical Design of Side-Coupled Quarter-Wave Shifted Distributed-Bragg Resonant Filters,” J. Lightwave Tech. 14(5), 812-821 (1996).
• JA-222. H.I. Smith and F. Cerrina, "X-ray Lithography for ULSI manufacturing?" Microlithography World 6(1), 10-15 (1997).
• JA-223. J.S. Foresi, P.R. Villeneuve, J. Ferrera, E.R. Thoen, G. Steinmeyer, S. Fan, J.D. Joannopoulos, L.C. Kimerling, H.I. Smith, E.P. Ippen, “Photonic-Band-Gap Waveguide Microcavities,” Nature, 390, 143-145, (1997).
• JA-224. J. Goodberlet, J. Ferrera, and H.I. Smith, “An Analogue Delay-Locked Loop for Spatial-Phase Locking”, Electronics Letters, 33 (15) 1269-1270 (1997).
• JA-225. E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, H.I. Smith, K.M. Matney, G.D. U’Ren, and M.S. Goorsky, “Preservation of Rectangular-Patterned InP Gratings Overgrown by Gas Source Molecular Beam Epitaxy,” Appl. Phys. Lett. 71 (10), 1400-1402 (1997)
• JA-226. B.E. Little & T.Murphy, “Design Rules for Maximally Flat Wavelength-Insensitive Optical Power Dividers Using Mach-Zehnder Structures”, IEEE Photonics Technology Letters, 9 (12), 1607-1609 (1997).
• JA-227. J. Goodberlet, J. Ferrera, and H.I. Smith, “Spatial-phase-locked electron-beam lithography with a delay-locked loop,” J. Vac. Sci. Technol. B, 15(6), 2293-2297 (1997).
• JA-228. D.J.D. Carter, A. Pepin, M.R. Schweizer, and H.I. Smith, “Direct Measurement of the effect of substrate photoelectrons in x-ray nanolithography,” J. Vac. Sci. Technol. B, 15(6), 2509-2513 (1997).
• JA-229. D. Berman, N. Zhitenev, R.C. Ashoori, and H.I. Smith, “The Single Electron Transitor as a Charge Sensor in Semiconductor Applications,” J. Vac. Sci. Technol. B, 15(6), 2844-2847 (1997).
• JA-230. A.E. Franke, M.L. Schattenburg, E.M. Gillikson, J. Cottam, S.M. Kahn and A. Rasmussen, “Super-Smooth X-Ray Reflection Grating Fabrication,” J. Vac. Sci. Technol. B, 15(6), 2940-2945 (1997).
• JA-231. M. Farhoud, M.M. Hwang, H.I. Smith, J.M. Bae, K. Youcef-Toumi and C.A. Ross, “Fabrication of Large Area Nanostructured Magnets by Interferometric Lithography.” IEEE Trans. Magn. 34, 1087-1089 (1998). (MMM/Intermag Conference 1/98)
• JA-232. J. Goodberlet, J. Ferrera, M. Farhoud, V.Z. Chan, and H.I. Smith, “Extending Spatial-Phase-Locked Electron-Beam Lithography to Two Dimensions,” Japanese Journal of Applied Physics 36, 7557-7559 (1997), Part 1, No 12B (1997).
• JA-233. G.D. U’Ren, M.S. Goorsky, E.M. Koontz, M.H. Lim, G.S. Petrich, L.A. Kolodziejski, V. V. Wong, Henry I. Smith, K.M. Matney and. M Wormington, “Analysis of Lattice Distortions in High Quality InGaAsP Epitaxial Overgrowth of Rectangular-Patterned InP Gratings”, J. Vac. Sci. Technol. B 16(3), (1998).
• JA-234. C.A. Ross and H. I. Smith, “Patterned Media: 200 Gb/in2 or bust”, Data Storage, 5 (10), 41-48, (1998). (invited)
• JA-235. W. Schollkopf, J.P. Toennies, T.A. Savas and H.I. Smith, “A Cluster Size Nanofilter with Variable Openings between 2 and 50nm”, Journal of Chemical Physics, 109 (21), 9252-9257, (1998).
• JA-236. I. Djomehri, T. Savas, and H.I. Smith, “Zone-Plate-Array Lithography in the Deep Ultraviolet”, J. Vac Sci. Technol. B, 16(6), 3426-3429, (1998).
• JA-237. E. Moon, J. Lee, P. Everett and H.I. Smith, “Application of Interferometric Broadband Imaging Alignment on an Experimental X-ray Stepper”, J. Vac Sci. Technol. B 16(6), 3631-3636, (1998).
• JA-238. J. Goodberlet, J. Carter and H.I. Smith, “A Scintillating Global-Fiducial Grid for Electron-Beam Lithography”, J. Vac. Sci. Technol. B 16(6), 3672-3675, (1998).
• JA-239. J.T.M. Van Beek, R.C. Fleming, P.S. Hindle, J.D. Prentiss and M.L. Schattenburg, “Nano-scale freestanding gratings for UV blocking filters”, J. Vac. Sci. Technol. B 16(6), 3911-3916, (1998).
• JA-240. D.J. Twisselmann, M. Farhoud, H.I. Smith and C.A. Ross, “In-Plane Magnetic Anisotropy in CoCrPt and CoCrTa Films Deposited Onto Patterned Silicon Substrates”, J. Appl. Physics, 85, 4292-4294 (1999).
• JA-241. T.A. Savas, M. Farhoud, H. I. Smith, M. Hwang, and C.A. Ross, “Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography” J. Appl. Physics, 85, 6160-6162 (1999).
• JA-242. K-Y Lim, D.J. Ripin, G.S. Petrich, L.A. Kolodziejski, E.P. Ippen, M. Mondol, H.I. Smith, P.R. Villeneuve, S. Fan, J.D. Joannopoulos, “Photonic bandgap waveguide microcavities: monorails and air-bridges”, J. Vac. Sci. Technol. B 17(3), 1171--1174(1999)
• JA-243. E.M. Koontz, G.D. U’Ren, M.H. Lim, L.A. Kolodziejski, M.S. Goorsky, G.S. Petrich, and Henry I. Smith, “Overgrowth of (In,Ga)(As,P) on Rectangular-Patterned Surfaces Using Gas Source Molecular Beam Epitaxy”, J. Crystal Growth 198/199, 1104—1110 (1999).
• JA-244. J.O. Choi, H.S. Jeong, D.G. Pflug, A.I. Akinwande and H.I. Smith, “Fabrication of 0.1 ?m gate aperture Mo-tip field-emitter arrays using interferometric lithography” Appl. Phy. Lett., 74 (20), 3050-3052 (1999).
• JA-245. M.L. Schattenburg, C. Chen, P.N. Everett, J. Ferrera, P. Konkola, and Henry I. Smith, “Sub-100 nm metrology using interferometrically produced fiducials (invited), J. Vac. Sci. Technol. B 17(6), 2692-2697 (1999).
• JA-246. E.E. Moon, P. N. Everett, M. Meinhold, M. Mondol and Henry I. Smith, “A Novel Mask-Wafer Gap-Measurement Scheme with Nanometer-Level Detectivity”, J. Vac. Sci. Technol. B, 17(6), 2698-2702 (1999).
• JA-247. M.H. Lim, T.E. Murphy, J. Ferrera, J.N. Damask and Henry I. Smith, “Fabrication Techniques for Grating-Based Optical Devices”, J. Vac. Sci. Technol. B, 17(6), 3208-3211 (1999).
• JA-248. M.H. Lim, J. Ferrera, K.P. Pipe and Henry I. Smith, “A Holographic Phase-Shifting Interferometer Technique to Measure In-Plane Distortion”, J. Vac. Sci. Technol. B 17(6), 2703-2706 (1999).
• JA-249. D.J.D. Carter, D. Gil, R. Menon, M. Mondol and Henry I. Smith, “Maskless, Parallel Patterning with Zone-Plate Array Lithography (ZPAL), J. Vac. Sci. Technol. B 17(6) 3449-3452 (1999).
• JA-250. M. Farhoud, J. Ferrera, A.J. Lochtefeld, M.L. Schattenburg, C.A. Ross and Henry I. Smith, “Fabrication of 200 nm period nanomagnet arrays using interferometric lithography and a negative resist”, J. Vac. Sci. Technol. B, 17(6), 3182-3185 (1999).
• JA-251. C. A. Ross, H.I. Smith, T. Savas, M. Schattenburg, M. Farhoud, M. Hwang, M. Walsh, M. Abraham, R. Ram, “Fabrication of Patterned Media for High Density Magnetic Storage (invited)”, J. Vac. Sci. Technol. B, 17(6) 3168-3176 (1999).
• JA-252. R.E. Grisenti, W. Schollkopf, J.P. Toennies, G.C. Hegerfeldt and T. Kohler, “Determination of Atom-Surface van der Waals Potentials from Transmission-Grating Diffraction Intensities”, Phys,. Rev. Let., 83(9), 1755-1758 (1999).
• JA-253. C.A. Ross, T.A. Savas, H.I. Smith, M. Hwang and R. Chantrell, “Modelling of Hysteresis Loops of Arrays of 100 nm Period Nanomagnets”, IEEE. Trans. Magnetics, 35, 3781 (1999).
• JA-254. R.E. Grisenti, W. Schoellkopf, J.P. Toennies, J.R. Manson, T.A. Savas and H.I. Smith, “He Atom Diffraction from Nanostructured Transmission Gratings: The Role of Imperfections”, Phys. Rev. A. 61, 033608-1-033608-15 (2000).
• JA-255. James G. Goodberlet, “Patterning 100 nm features using deep-ultraviolet contact photolithography”, Appl. Phy. Lett. 76(6) 667-669, (2000).
• JA-256. M. Farhoud, H.I. Smith, M. Hwang and C.A. Ross, “The effect of aspect ratio on the magnetic anisotropy of particle arrays”, J. Appl. Phys., 87(9) 5120-5122 (2000).
• JA-257. R.E. Grisenti, W. Schollkopf, J.P. Toennis, G.C. Hegerfeldt, T. Kohler and M. Stoll, “Determination of the Bond Length and Binding Energy of the Helium Dimer by Diffraction from a Transmission Grating”, Phys. Rev. Let., 85(11), 2284—2287 (2000).
• JA-258. C.R. Canizares, D.P. Huenemoerder, D.S. Davis, D. Dewey, K.A. Flanagan, J. Houck, T.H. Markert, H.L. Marshall, M.L. Schattenburg, N.S. Schulz, M. Wise, J.J. Drake and N.S. Brickhouse, “High Resolution X-Ray Spectra of Capella: Initial Results from the Chandra High Energy Transmission Grating Spectrometer”, Astrophysical Journal Letters 539, L41-L44 (2000); also, proeedings from the Atomic Data Needs for X-ray Astronomy Meeting, NASA Publications, Vol. 1, Bautista, Kallman and Pradhan, eds. (2000).
• JA-259. Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann and Mark L. Schattenburg, “Beam Steering System and Spatial Filtering Applied to Interference Lithography”, J. Vac. Sci. Technol. B 18(6), 3282-3286, (2000).
• JA-260. Dario Gil, Rajesh Menon, D. J. D. Carter and Henry I. Smith, “Lithographic Patterning and Confocal Imaging with Zone Plates, ”J. Vac. Sci. Technol. B 18(6), 2881-2885, (2000).
• JA-261. Ken-Ichi Murooka, Michael H. Lim, and Henry I. Smith, “Membrane-mask distortion correction: Analytical and experimental results”, J. Vac. Sci. Technol. B 18(6), 2966- 2969, (2000).
• JA-262. J. T. Hastings, Feng Zhang, James Goodberlet, and Henry I. Smith, “Two-Dimensional Spatial-Phase-Locked Electron-Beam Lithography via sparse Sampling, ”, J. Vac. Sci. Technol. B 18(6), 3268-3271, (2000).
• JA-263. Thomas E. Murphy, Mark K. Mondol and Henry I. Smith, “Characterization of field stitching in e-beam lithography using moiré metrology”, J. Vac. Sci. Technol. B 18(6), 3287-3291, (2000).
• JA-264. Ralf K. Heilmann, Paul T. Konkola, Carl G. Chen and Mark L. Schattenburg, “Relativistic corrections in displacement measuring interferometry”, J. Vac. Sci. Technol. B 18(6), 3277-3281, (2000).
• JA-265. Michael E. Walsh, Yaowu Hao, Caroline A. Ross and Henry I. Smith, “Optimization of a lithographic and ion beam etching process for nanostructuring magnetic resistive thin film stacks”, J. Vac. Sci. Technol. B 18(6), 3539-3543, (2000).
• JA-266. C.A. Ross, R. Chantrell, M. Hwang, M. Farhoud, T.A. Savas, Y. Hao, Henry I. Smith, F.M. Ross, M. Redjdal, F. Humphrey, “Incoherent magnetization reversal observed in 30 nm Ni particles”, Phys. Rev. B. 62(21), 14 252- 14 258, (2000).
• JA-267. Carl G. Chen, Ralf K. Heilmann, Paul T. Konkola, Oliver Mongrard, Glen P. Monnelly, and Mark L. Schattenburg, “Microcomb Design and Fabrication for High Accuracy Optical Assembly”, J. Vac. Sci. Technol. B 18(6), 3272-3276, (2000).
• JA-268. C.A. Ross, M. Farhoud, M. Hwang, Henry I. Smith, M. Redjdal, F.B. Humphrey, “Micromagnetic behavior of conical ferromagnetic particles”, J. Appl. Phys, 89, 1310-1319, (2000).
  JA-269. M. Hwang, M.C. Abraham, T.A. Savas, H.I. Smith, R.J. Ram and C.A. Ross, “Magnetic force microscopy study of interactions in 100 nm period nanomagnet arrays”, J. Appl. Phys. 87 5108-10 (2000).
• JA-270. J-Q Wang, L. M. Malkinski, Y. Hao, C. A. Ross, J. A. Wiemann, C. J. O’Connor, “Fabrication of pseudo-spin-valves and 100 nm sized periodic elements for magnetic memory application”, Materials Science and Enginering B76, 1-5 (2000).
• JA-271. Douglas J. Twisselmann, Yuh-Jer Shine, and C. A. Ross, “Correlation of Stress and Magnetic Anisotropy in CoCrPt/Cr Films Grown on Textured Substrates”, IEEE Trans. Mag. 36(5), (2000).
• JA-272. C-C. Hsu, R. S. Indeck, A. Jander, M. W. Muller, C. A. Ross and D. J. Twisselmann, “MFM observation of magnetization reversal rocess in recording media with lithographically defined texture”, IEEE Trans. Magn. 36, 2327-2329, (2000).
• JA-273. C. A. Ross, S. Haratani, F. J. Castano, B. Vogeli, S. Sumita, “Fabrication of MRAM structure and their magnetic properties”, J. f the Society of Materials Engineering for Resources of Japan 14, 43-51, (2001).
• JA-274. H. I. Smith, "Japan could dominate industry with X-ray lithography", Semiconductor International, Vol. 24, No. 2, pp. 67--72 (2001)
• JA-275. S. S. Yi, P. D. Moran, X. Zhang, F. Cerrina, J. Carter, H.I. Smith, T.F. Kuech, "Oriented crystallization of GaSb on a patterned, amorphous Si substrate", App. Phys. Lett. 78(10), 1358-1360 (2001).
• JA-276. M.C. Abraham, H. Schmidt, T.A. Savas, Henry I. Smith, C.A. Ross, R.J. Ram, “Magnetic Properties and Interactions of Single Domain nanomagnets in a periodic array”, J. Appl. Phys. 89(10), 5667-5670, (2001).
• JA-277. T. E. Murphy, J. T. Hastings and Henry I. Smith, “Fabrication and Characterization of Narrow-Band Bragg-Reflection Filters in Silicon-on-Insulator Ridge Waveguides”, Journal of Lightwave Technology, 19(12) 1938-1942, (2001).
• JA-278. J. T. Hastings, J. G. Goodberlet and Henry I. Smith, "Performance of the Raith-150 Electron-Beam lithography System", J. Vac. Sci. Technol. B 19(6), 2499-2503 (2001).
• JA-279. Michael E. Walsh, Henry I. Smith, “Method for Reducing Hyperbolic Phase In Interference Lithography”, J. Vac. Sci. Technol. B 19(6), 2347-2352 (2001).
• JA-280. B. Vogeli and Henry I. Smith, "Patterning processes for fabricating sub-100 nm pseudo-spin valve structures", J. Vac. Sci. Technol. B 19(6), 2753-2756 (2001).
• JA-281. J.O. Choi, A.I. Akinwande and H. I. Smith, “100 nm gate hole openings for low voltage driving field emission display applications”, J. Vac. Sci. Technol. B 19(3), 900-903 (2001).
• JA-282. Ken-ichi Murooka, Michael H. Lim and Henry I. Smith, “Calculational study on membrane mask distortion and correction”, J. Vac. Sci. Technol. B 19(4), 1229-1234 (2001).
• JA-283. F. J. Castano, B. Vogeli, Y. Hao, S. Haratani, M. Hwang, H. I. Smith, and C. A. Ross, "Magnetization Reversal in Sub-100 nm Pseudo-Spin-Valve Element Arrays", Appl. Phys. Lett. 79(10), 1504-1506 (2001).
• JA-284. F. J. Castano, Y. Hao, S. Haratani, C. A. Ross, B. Vogeli, M. Walsh, Henry I. Smith, "Magnetic Switching in 100 nm Patterned Pseudo Spin Valves" IEEE Trans. Mag.37(4), 2073-2075 (2001).
• JA-285. H. I. Smith, "Low cost nanolithography with nanoaccuracy", Physica E, Vol. 11, 104-109 (2001).
• JA-286. A. A. Erchak, D. J. Ripin, S. Fan, P. Rakich, J.D. Joannopoulos, E. Ippen, G.S. Petrich and L. Kolodziejski, “Enhanced coupling to vertical radiation using a two-dimensional photonic crystal in a semiconductor light-emitting diode”, Appl. Phys. Let., 78(5), 563-565 (2001).
• JA-287. Mark L. Schattenburg, “From nanometers to gigaparsecs: The role of nanostructures in unraveling the mysteries of the cosmos”, J. Vac. Sci. Technol. B 19(6), 2319-2328, (2001).
• JA-288. J. Y. Cheng, C. A. ross, V. Z. H. Chan, E. L. Thomas, R. G. H. Lampertink and G. J. Vancso, “Fabrication of nanopatterned thin films using self-assembled block copolymer lithography”, Adv. Mater. 13, 1174-1178 (2001).
• JA-289. S. L. Whittenburg, N. Dao, C. A. Ross, “Micromagnetic studies of hysteresis in nickel pillars”, Physica B 306, 44-46 (2001).
• JA-290. C. A. Ross, M. Hwang, M. Shima, J. Y. Cheng, M. Farhoud, T. A. Savas, Henry I. Smith, W. Schwarzacher, F. M. Ross, M. Redjdal and F. B. Humphrey, “Micromagnetic behavior of electrodeposited cylinder arrays”, Physical Review B 65, 144417-1-144417-8 , (2002).
• JA-291. K-I. Murooka, M.H. Lim, Henry I. Smith, “Membrane Mask Magnification Correction: An Alternate Technique”, J. Vac. Sci. Technol. B 20(1), 370-372 , (2002).
• JA-292. K-I. Murooka, M.H. Lim, Henry I. Smith, “Effect of thermal diffusion on a membrane-mask-distortion correction and compensation method”, J. Vac. Sci. Technol. B 20(2), 721-724 (2002).
• JA-293. Masaki Yoshizawa and T. A. Savas, “A Feasibility Study of 50 nm Resolution with Low Energy Electron Beam Proximity Projection Lithography”, Jpn. J. Appl. Phys. 41, 87-88, (2002).
• JA-294. M. Peuker, M.H. Lim, Henry I. Smith, R. Morton, A.K. van Langen-Suurling, J. Romijn, E.W.J.M. van der Drife, F.C.M.J.M. van Delft, “Hydrogen Silses Quioxane, a High Resolution Negative Tone e-beam Resis, Investigated for its Applicability in Photon Based Lithographies”, Microelectronic Engineering, 61-62, 803-809, (2002).
• JA-295. C. A. Ross, S. Haratani, F. J. Castano, Y. Hao, B. Vogeli, M. Farhoud, M. Walsh and Henry I. Smith, “Magnetic behavior of lithographically patterned particle arrays (invited), J. Appl. Phys. 91(10), 6848-6853, (2002).
• JA-296. Hans-Jurgen Eisler, Vikram C. Sundar, Moungi G. Bawendi, Michael Walsh, Henry I. Smith, Victor Klimov, “Color-Selective Semiconductor Nanocrystal Laser”, Appl. Phy. Lett., 80(24) 4614-4616, (2002).
• JA-297. F. J. Castano, S. Haratani, Y. Hao, C. A. Ross, Henry I. Smith, “Giant magnetoresistance in 60-150-nm-wide pseudo-spin-valve nanowires”, Appl. Phys. Lett. 81(15), 2809-2811, (2002).
• JA-298. Y. Hao, F. J. Castano, C. A. Ross, b. Vogeli, M. E. Walsh, Henry I. Smith, “Magnetization reversal in lithographically patterned sub-200-nm Co particle arrays”, J. Appl. Phys. 91(10), 7989-7991, (2002).
• JA-299. F. J. Castano, Y. Hao, C. A. Ross, B. Vogeli S. Haratani, and Henry I. Smith, “Switching field trends in pseudo spin valve nanoelement arrays”, J. Appl. Phys. 91(10), 7317-7319, (2002).
• JA-300. James G. Goodberlet and Hamide Kavak, “Patterning Sub-50 nm features with near-field embedded-amplitude masks”, Appl. Phys. Lett. 81(7), 1315-1317, (2002).
• JA-301. C. A. Ross, M. Hwang, M. Shima, Henry I. Smith, M. Farhoud, T. A. Savas, W. Schwarzacher, J. Parrochon, W. Esoffier, H. Neal Bertram, F. B. Humphrey and M. Redjdal, “Magnetic properties of arrays of electrodeposited nanowires”, Journal of Magnetism and Magnetic Materials 249, 200-207, (2002).
• JA-302. J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, R.G.H. Lammertink and G.J. Vancso, “Magnetic Properties of Large-Area Particle Arrays Fabricated using Block Copolymer Lithography”, IEEE Transactions of Magnetics, Vol. 38(5) 2541-2543, (2002).
• JA-303. M. Qi and Henry I. Smith, “Achieving nanometer-scale, controllable pattern shifts in x-ray lithography using an assembly-tilting technique”, J. Vac. Sci. Technol. B 20(6), 2991 – 2994, (2002).
• JA-304. J.T. Hastings, M.H. Lim, J.G. Goodberlet and Henry Smith, “Optical Waveguides with Apodized Sidewall Gratings via spatial-phase-locked electron-beam lithography”, J. Vac. Sci. Technol. B 20(6), 2753-2757, (2002).
• JA-305. Chulmin Joo, G.S. Pati, P. K. Konkola, C. G. Chen, R. Heilmann, E.H. Anderson, Mark Schattenburg, “Precision fringe metrology using a Fresnel zone plate”, J. Vac. Sci. Technol. B 20(6), 3075-3079, (2002).
• JA-306. C. G. Chen, R. K. Heilmann, C. Joo, P. T. Konkola, G.S. Pati and Mark L. Schattenburg, “Beam alignment for scanning beam interference lithography”, J. Vac. Sci. Technol. B 20(6), 3071-3074, (2002).
• JA-307. G. S. Pati, P.T. Konkola, C. G. Chen, C. Joo, R. K. Heilmann and M. L. Scattenburg, “Generalized scanning beam interference lithography system for patterning gratings with variable period progressions”, J. Vac. Sci. Technol. B 20(6), 2617-2621, (2002).
• JA-308. Dario Gil, D.J.D. Carter, R. Menon, X. Tang and Henry I. Smith, “Parallel maskless optical lithography for prototyping, low-volume production, and research”, J. Vac. Sci. Technol. B 20(6), 2597-2601, (2002).
• JA-309. M. Yoshizawa, “Sub-50 nm Stencil Mask for Low-Energy Electron-Beam Projection Lithography, J. Vac. Sci. Technol. B 20(6), 3021-3024, (2002).
• JA-310. R.A. Forber, Z.W. Chen, S. Mrowka, C.G. Gaeta, K. Cassidy, H.I. Smith and I.C.E. Turcu, JMAR Research Inc., San Diego, CA, X-Ray Optical Systems, Albany, NY, and MIT, Cambridge, MA, “Collimated Point-Source X-ray Nanolithography”, J. Vac. Sci. Technol. B 20(6), 2984-2990, (2002).
• JA-311. Saul Griffith, Mark Mondol, David S. Kong, Joseph M. Jacobson, “Nanostructure Fabrication by Direct Electron-Beam Writing of Nanoparticles”, J. Vac. Sci. Technol. B 20(6), 2768-2772, (2002).
• JA-312. C. J. Gaeta, H. Rieger, I.E.E. Turcu, R.A. Forber, S.M. Campeau, K.L. Cassdy, M.F. Powers, J.R. Maldonado, G. French, J. Naungayan, C. Kelsy, P. Hark, J.H. Morris, R.M. Foster, H.I. Smith, M.H. Lim, “High Power Compact Laser-Plasma Source for X-Ray Lithography”, Jpn. J. Appl. Phys. Vol. 41, 4111-4121, (2002).
• JA-313. J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, G.J. Vancso "Fabrication of nanostructures with long-range order using block copolymer lithography", Appl. Phys. Letts., 81(19), 3657-3659, (2002).
• JA-314. N. Dao, S. L. Whittenburg, Y. Hao, C. A. Ross, L. M. Malkinski, J. Q. Wang, “Magnetization reversal of elliptical Co/Cu/Co pseudo-spin valve dots”, J. Appl. Phys. 91(10) 8293-8295, (2002).
• JA-315. Xiabin Zhu, P. Grutter, Y. Hao, F. J. Castano, S. Haratani, C.A. Ross, B. Vogeli and H.I. Smith, “Magnetization switching in 70 nm-wide pseudo-spin-valve nanoelements”, J. Appl. Phys. 93(2), 1132-1136. (2003).
• JA-316. John G. Hartley, Timothy R. Groves, Henry I. Smith, Mark K. Mondol, James G. Goodberlet, Mark L. Schattenburg, Juan Ferrera and Alexandr Bernshteyn, “Spatial-phase locking with shaped-beam lithography”, Review of Scientific Instruments, Vol. 74(3), 1377-1379, (2003).
• JA-317. F. J. Castano, C.A. Ross, C. Frandsen, A. Eilez, D. Gil, Henry I. Smith, M. Redjdal and F.B. Humphrey, “Metastable states in magnetic nanorings”, Physical Review B, 67, 184425, (2003).
• JA-318. Y. Hao, C. A. Ross, Henry I. Smith, “Thermal stability of lithographicaly patterned sub-200 nm NiFe elements”, J. Appl. Phys. 93(10), 7909-7911 (2003).
• JA-319. F.J. Castano, Y. Hao, S. Haratani, C. A. Ross, B. Vogeli, Henry I. Smith, C. Sanchez-Hanke, C.C. Kao, X. Zhu, P. Grutter, “Magnetic force microscopy and x-ray scattering study of 70 x 550 nm2 pseudo-spin-valve nanomagnets”, J. Appl. Pys. 93(10), 7927-7929, (2003)
• JA-320. X. Zhu, P. Grutter, V. Metlushko, Y. Hao, F. J. Castano, C. A. Ross, B. Ilic, H. I. Smith, “Construction of hysteresis loops of single domain elements and coupled permalloy ring arrays by magnetic force microscopy”, J. Appl. Phys. 93(10), 8540-8542, (2003).
• JA-321. J. Y. Cheng, C.A. Ross, E.L. Thomas, Henry I. Smith, G.J. Vancso, “Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography”, Adv. Mater. 2003, 15 No. 19, October 2. 1599-1602. (2003).
• JA-322. Euclid E. Moon, Lynn Chen, Patrick N. Everett and Henry I. Smith, “Interferometric-Spatial-Phase Imaging for 6-Axis Mask control”, J. Vac. Sci. Technol. B 21(6), 3112-3115 (2003).
• JA-323 Dario Gil, Rajesh Menon and Henry I. Smith, “The Case for Diffractive Optics in Maskless Lithography”, J. Vac. Sci. Technol. B 21(6), 2810-2814 (2003).
• JA-324 Dario Gil, Rajesh Menon and Henry I. Smith, “Fabrication of High-Numerical-Aperture Phase Zone Plates with a Single Lithography Exposure and no Etching”, J. Vac. Sci. Technol. B 21(6), 2956-2960 (2003).
• JA-325 X. Zhuang, D. Conkerton, A. Lal, M. Feldman, T. O’Reilly and H.I. Smith, “Adaptive Membrane Masks”, J. Vac. Sci. Technol. B 21(6), 3082-3085 (2003).
• JA-326 Tymon Barwicz, Henry I. Smith, “Evolution of line-edge roughness during fabrication of high-index-contrast microphotonic devices”, J. Vac. Sci. Technol. B 21(6), 2892-2896 (2003).
• JA-327 J. T. Hastings, Feng Zhang, and Henry I. Smith, “Nanometer-Level Stitching in raster-Scanning E-Beam Lithography Using Spatial-Phase Locking”, J. Vac. Sci. Technol. B 21(6), 2650-2656 (2003).
• JA-328 T. Barwicz, M.A. Popovic, P.T. Rakich, M.R. Watts, H.A. Haus, E.P. Ippen, and H.I. Smith “Microring-resonator-based add-drop filters in SiN: fabrication and analysis,” Optics Express, vol. 12, pp. 1437-1442, 2004.
• JA-329 JA-A F.J. Castano, C.A. Ross, A. Eilez, D. Gil and Henry I. Smith, "Magnetization reversal in lithographically defined elliptical-ring nanomagnets", Journal of Physics D: Applied Physics, 36, 2031-2035 (2003).
• JA-330 F. J. Castaño, C. A. Ross, A. Eilez, W. Jung, and C. Frandsen, "Magnetic configurations in 160-520 nm diameter ferromagnetic rings", Physical Review B, 69, 144421 (2004).
• JA-331 Minghao Qi, Elefterios Lidorikis, Peter T. Rakich, Steven G. Johnson, J.D. Joannopoulos, Erich P. Ippen and Henry I. Smith, “A three-dimensional optical photonic crystal with designed point defects” Nature Magazine, Vol. 429, 538-542, June 2004.

AWAITING PUBLICATION:

• JA-A Christel Zanke, Minghao Qi and Henry I. Smith, “Large-area Patterning for 2D and 3D Photonic Crystals via Coherent Diffraction Lithography (CDL)”, submitted to the 48th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, June 1-4, 2004, San Diego, CA.
• JA-B Minghao Qi, J. D. Joannooulos and Henry I. Smith, “A Three-Dimensional Optical Photonic Crystal with Designed Point-Defects”, submitted to the 48th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-C Fernando J. Castano, Rajesh Menon, Wonjoon Jung, Caroline A. Ross, and Henry I. Smith, “Fabrication of exchange-biased Elliptical-Ring Arrays using Zone-Plate-Array Lithography”, submitted to the 48th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-D Rajesh Menon, Amil Patel, David Chao and Henry I. Smith, “An Alpha-Prototype System for Zone-Plate-Array Lithography (ZPAL), submitted to the 48th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, June 1-4, 2004 -San Diego, CA.
• JA-E Rajesh Menon, Euclid Moon, Mark Mondol and Henry I. Smith, “Scanning-Spatial-Phase Alignment for Zone-Plate-Array Lithography”, submitted to the 48th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, June 1-4, 2004 -San Diego, CA.
• JA-F Feng Zhang and Henry I. Smith, “Partial Blanking of an Electron Beam Using a quadrupole Lens”, Submitted to the 48th International Conference on Electron, Ionm Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-G Euclid E. Moon, Mark K. Mondol, Henry I. Smith, “Atomic-Level Alignment Detectivity Using Novel Interleaved Fringe Formation in Interferometric Spatial Phase Imaging”, Submitted to the 48th Internationa Conference on Electron, Ionm Photon Beam Technology and Nanofabrication, June 1-4, 2004 - San Diego, CA.
• JA-H Solomon Assefa, Peter T. Rakich, Peter Bienstman, Steven G. Johnson, Gale S. Petrich, John D. Joannopoulos, Leslie A. Kolodziejski, Erich P. Ippen, and Henry I. Smith, “Guiding 1.5 ?m Light in Photonic Crystals Based on dielectric Rods”, submitted to Applied Physics Letters (2004).
• JA-I Tymon Barwicz, Milos¹ A. Popovc, Peter T. Rakich, Michael R. Watts, Hermann A. Haus, Erich P. Ippen, and Henry I. Smith, “Microring-resonator-based add-drop filters in SiN: fabrication and analysis”, To be published in the IEEE Photonics Technology Letters (2004).

Published Conference Proceedings

• (PCP-1) H.I. Smith, (The Dynamics of Pumping and Desorption in a Bayard-Alpert Ionization Gauge), Transactions 10th National Vacuum Symposium, 1963, pp. 263 MacMillian Company, New York, NY (1963).
• (PCP-2) H.I. Smith, (The Fabrication of Microsound Components), IEEE International Convention, New York, NY, Session 2-C, Convention Digest, pp. 90-91, March 24-27, 1969.
• (PCP-3) R.J. Hawryluk and H.I. Smith, (Electron Beam Exposure Profiles in Thin Polymer Films), pp. 51-67, 5th International Conference, Electron and Ion Beam Science and Technology, Houston, TX, May 7-11, 1972, Ed. R. Bakish 1972, The Electrochemical Society Inc.
• (PCP-4) D.L. Spears, H.I. Smith, and E. Stern, (X-ray Replication of Scanning Electron Microscopy Generated Patterns), pp. 80-91, 5th International Conference, Electron and Ion Beam Science and Technology, Houston, TX, May 7-11,1972, Ed. R. Bakish 1972, The Electrochemical Society Inc., Princeton, NJ.
• (PCP-5) H.I. Smith, R.C. Williamson, and W.T. Brogan, (Ion Beam Etching of Reflective Array Filters), pp. 198-201 Proceedings, 1972 Ultrasonics Symposium, Boston, MA, October 4-7, 1972, Ed. J. DeKlerk, Institute of Electrical and Electronics Engineers Inc., 345 E. 47th Street, New York, NY, Catalog #72CHO708-8SU.
• (PCP-6) C.K. Crawford and H.I. Smith, (Directly Heated LaB6 Cathodes Interchangeable with Standard SEM Filaments), Proceedings 8th National Meeting, Electron Microscope Society of America, New Orleans, LA, August 1973.
• (PCP-7) H.I. Smith, J. Melngailis, R.C. Williamson, and W.T. Brogan, (Ion-Beam Etching of Surface Gratings), Proceedings IEEE Ultrasonics Symposium, Monterey, CA, November 5-7, 1973, pp. 558-563, Ed. J. DeKlerk, IEEE Inc., New York, NY, Cat. #73CHO807-8SU.
• (PCP-8) R.C. Williamson, V.S. Dolat, and H.I.Smith, (L-Band Reflective-Array Compressor with a Compression Ratio of 5120), Proceedings Ultrasonics Symposium, Monterey, CA, November 5-7, 1973, pp. 490-493, Ed. J. DeKlerk, IEEE Inc., New York, NY, Cat. #73CHO807-8SU.
• (PCP-9) H.I. Smith, (Fabrication Techniques for Optical and Acoustical Microelectronic Devices), pp. 221-232, Proceedings of the Symposium on Optical and Acoustical Micro-electronics, New York, NY, April 16-18, 1974. Published by Polytechnic Press of the Polytechnic Institute of New York, 1975, Microwave Research Institute, Symposia Series, Vol. XXIII, Ed. Jerome Fox. (Invited paper)
• (PCP-10) R.J. Hawryluk, A. Soares, H.I. Smith, and A.M. Hawryluk, (Experimental Utilization of Monte Carlo Models for Electron Beam Lithography), pp. 87-94, Proceedings 6th International Conference, Electron and Ion Beam Science and Technology, May 13-16, 1974, San Francisco, CA, Ed. R. Bakish, The Electrochemical Society, Princeton, NJ.
• (PCP-11) S.E. Bernacki and H.I. Smith, (X-ray Lithography Applied to Silicon Device Fabrication), pp. 34-46, Proceedings 6th International Conference Electron and Ion Beam Science and Technology, May 13-16, 1974, San Francisco, CA. Ed. R. Bakish, The Electrochemical Society, Princeton, NJ.
• (PCP-12) H.I. Smith, (Electron Beam, Ion Beam, X-ray, and Optical Techniques for Fabricating Surface-Acoustic-Wave and Thin Film Optical Devices), Proceedings 6th Congress International AVISEM, Toulouse, FRANCE, October 8-11, 1974, Societe Francais du Vide. (Invited paper)
• (PCP-13) H.I. Smith, (Techniques for Making Gap-Coupled Acoustoelectric Devices), pp. 238-240, Ultrasonics Symposium Proceedings, Los Angeles, CA, September 22-24, 1975. Ed. J. DeKlerk, IEEE Inc., New York, NY.
• (PCP-14) H.I. Smith, (Ion Beam Etching), pp. 133-143, Proceedings Symposium on Etching for Pattern Definition, Eds. H.G. Hughes and M.J. Rand, The Electrochemical Society Inc., Washington, DC, May 3-4, 1976. (Invited paper)
• (PCP-15) H.I. Smith and D.C. Flanders, (X-ray Replication of Submicrometer Linewidth Patterns), Proc. 35th Annual Meeting Electron Microscope Society of America, p. 136, Boston, MA, August 22-26, 1977, Ed. G.W. Bailey, 1977 Calitor's Publishing Division, Baton Rouge, LA. (Invited paper)
• (PCP-16) N.M. Ceglio and H.I. Smith, (An Efficient Lensing Element for X-rays), Proc. 8th International Conference on X-ray Optics and Microanalysis, Boston, MA, August 18-24, 1977.
• (PCP-17) H.I. Smith and D.C. Flanders, (X-ray Lithography), Proc. 8th Conference 1976 International on Solid State Devices, pp. 61-65, Tokyo, Japan, September 1-3, 1976. Japan J. Appl. Phys. Vol. 16, Suppl. 16-1, pp. 61-65 (1977). (Invited paper)
• (PCP-18) H.I. Smith, D.C. Flanders, and D.C. Shaver, (New Applications of Submicrometer Structures in Materials Science and Biology), pp. 33-40, Scanning Electron Microscopy, Vol. 1, 1978, Ed. O. Johari, Scanning Electron Microscopy, Inc., AMF O'Hare, IL. (Invited paper)
• (PCP-19) H.I. Smith, (The Impact of Submicrometer Structures on Future Integrated Electronics), EASCON '79, pp. 296-297, Arlington, VA, October 8-11, 1979. IEEE Electronics and Aerospace Systems Conference, IEEE, New York, NY.
• (PCP-20) M.W. Geis, D.C. Flanders, D.A. Antoniadis, and H.I. Smith, (Crystalline Silicon on Insulators by Graphoepitaxy), IEEE International Electron Devices Meeting, pp. 210-212, Washington, DC, December 3-5, 1979.
• (PCP-21) H.I. Smith, (Equivalent Data Rate of X-ray Lithography Systems), Proc. 9th International Conference, Electron and Ion Beam Science and Technology, pp. 425-435, St. Louis, MO, May 1980, Ed. R. Bakish, The Electrochemical Society.
• (PCP-22) D.C. Flanders, D.C. Shaver, A.M. Hawryluk, and H.I. Smith, (Progress in the Fabrication of Artificial Microstructures for X-ray Imaging and Spectroscopy), Proc. Conf. Ultrasoft X-ray Microscopy, June 13-15, 1979, New York, NY. Annals of the New York Academy of Sciences, V342, 203-212 (1980).
• (PCP-23) M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, (Silicon Graphoepitaxy), Proceedings of 12th Conference on Solid State Devices, Tokyo, Japan (1980). Also, Japan J. Appl. Phys. 20, Supplement 20-1, 39 (1981). (Invited paper)
• (PCP-24) H.I. Smith, (The Impact of Submicrometer Structures in Research and Applications), Proc. of the International Conference on Microlithography, September 30 - October 2, 1980, Amsterdam. Ed. R. Kramer, DELFT University Press, The Netherlands (1981). (Invited paper)
• (PCP-25) A.M. Hawryluk, N.M. Ceglio, R.H. Price, J. Melngailis, and H.I. Smith, (Soft X-ray Spectroscopy using Thick Gold Transmission Gratings of 0.2 to 0.32 µm Spatial Periods), pp. 286-289, Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981. Eds. D.T. Atwood and B.L. Henke, Amer. Inst. of Physics Conference Proc. No. 75, New York, NY (1981).
• (PCP-26) H.I. Smith, (Fabrication of Diffractive Optical Elements for X-ray Diagnostics), pp. 223-224 Proc. Topical Conference on Low Energy Diagnostics, Monterey, CA, June 8-10, 1981. Eds. D.T.Atwood and B.L. Henke, Amer. Inst. of Physics, Conf. Proc. No. 75, New York, NY (1981). (Invited paper)
• (PCP-27) N.M. Ceglio, M. Roth, and A.M. Hawryluk, (A Streaked X-ray Transmission Grating Spectrometer), Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981; D.T. Atwood, Chairman, Amer. Inst. of Physics, Conference Proc. No. 75, p. 290 (1981).
• (PCP-28) R. Tatchyn, I. Lindau, E. Kallne, E. Spiller, R. Bartlett, J. Kallne, M. Hecht, J.H. Dijkstra, A.M. Hawryluk, and R.Z. Bachrach, (High Quality Fraunhofer Diffraction Spectra Taken at SSRL in the Soft X-ray Range), Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981; D.T. Atwood, Chairman. Amer. Inst. of Physics, Conference Proc. No. 75, p. 297 (1981).
• (PCP-29) M.W. Geis, H.I. Smith, J.C.C. Fan, B.Y. Tsaur, and J.P. Sallerno, (Preparation of Oriented Silicon Films on Insulating Substrates), 5th International Conference on Vapor Growth and Epitaxy/5th American Conference on Crystal Growth, Coronado, CA, July 19-24, 1981; A.L. Gentile, Conference Secretariat.
• (PCP-30) H.I. Smith, H.A. Atwater, and M.W. Geis, (Orientation Selection by Zone Melting Silicon Films through Planar Constrictions), Extended Abstract, 161st Meeting, Electrochemical Society, Montreal, Canada, May 9-14, 1982.
• (PCP-31) H.I. Smith and M.W. Geis, (The Mechanism of Orientation in Si Graphoepitaxy using a Strip-Heater Oven), Extended Abstract, 161st Meeting, Electrochemical Society, Montreal, Canada, May 9-14, 1982.
• (PCP-32) M.N. Islam, H.A. Haus, and J. Melngailis, (Radiation Loss for Normal and Oblique Incidence Gratings), IEEE Ultrasonics Symposium. Cat. #82CH1823-4, p. 92 (1982).
• (PCP-33) D.-P. Chen, J. Melngailis, and H.A. Haus, (Filters Based on Conversion of Surface Acoustic Waves to Bulk Plate Modes in Gratings), IEEE Ultrasonics Symposium. Cat. #82CH1823-4, p. 67 (1982).
• (PCP-34) D.T. Atwood, N.M. Ceglio, H.M. Medecki, H.I. Smith, A.M. Hawryluk, T.W. Barbee Jr., W.K. Warburton, J.H. Underwood, B.L. Henke, T.H.P. Chang, M. Hatzakis, D.P. Kern, P.J. Coane, W.W. Molzlen, A.J. Speth, G.L. Stradling, and D.W. Sweeney, (Current Developments in High Resolution X-ray Measurements), American Institute of Physics Conference Proceedings, Series Editor, H.C. Wolfe, No. 90, Subseries on Optical Science and Engineering No. 2. Topical Meeting on Laser Techniques for Extreme Ultraviolet Spectroscopy, Boulder, CO (1982). Eds. T.J. McIlrath and R.R. Freeman.
• (PCP-35) M.W. Geis, H.I. Smith, B.Y. Tsaur, J.C.C. Fan, D.J. Silversmith, R.W. Mountain, and R.L. Chapman, (Zone-Melting Recrystallization of Semiconductor Films), Laser-Solid Interactions and Transient Thermal Processing of Materials Symposium, Boston, MA, November 1982. Mat. Res. Soc. Symp. Proc. Vol. 13, 477 (1983), Eds. J. Narayan, W.L. Brown, and R.A. Lemons, North-Holland Publishing Co.
• (PCP-36) N.M. Johnson, M.D. Moyer, L.E. Fennell, E.W. Maby, and H.A. Atwater, (Detection of Electronic Defects in Strip-Heater Crystallized Silicon Thin Films), Laser-Solid Interactions and Transient Thermal Processing of Materials Symposium, Boston, MA, November 1982. Mat. Res. Soc. Symp. Proc. Vol. 13, 491 (1983), Eds. J. Narayan, W.L. Brown and R.A. Lemons, North-Holland Publishing Co.
• (PCP-37) C.J. Keavney, H.A. Atwater, H.I. Smith, and M.W. Geis, (Zone Melting Recrystallization of InSb on Oxidized Silicon Wafers), Electro-Chemical Society Symposium on III-V Opto-Electronics Epitaxy and Device-Related Processes, San Francisco, May 1983. Eds. V.G. Keramidas and S. Mahajan. Also, Extended Abstracts, 162nd Meeting, The Electrochemical Society, San Francisco, CA, May 8-13, 1983.
• (PCP-38) H.I. Smith, E.H. Anderson, A.M. Hawryluk, and M.L. Schattenburg, (Planar Techniques for Fabricating X-ray Diffraction Gratings and Zone Plates), Symposium on X-ray Microscopy, Gottingen, FRG, September 14-16, 1983. Springer Series in Optical Sciences Vol. 43: X-ray Microscopy, pp. 51-61. Eds. D. Rudolph and G. Schmahl, Springer-Verlag, Berlin, Heidelburg (1984). (Invited paper)
• (PCP-39) H.I. Smith, C.V. Thompson, M.W. Geis, H.A. Atwater, C.C. Wong, and T. Yonehara, (Zone Melting Recrystallization of Patterned Films and Low-Temperature Graphoepitaxy), Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, Boston, MA, November 1983. Mat. Res. Soc. Symp. Proc. 23, 459 (1984). Elsevier Science Publishers Co., Eds. N.M. Johnson and J.C.C. Fan (1984). (Invited paper)
• (PCP-40) C.C. Wong, C.J. Keavney, H.A. Atwater, C.V. Thompson, and H.I. Smith, (Zone Melting Recrystallization of InSb Films on Oxidized Si Wafers), Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, Boston, MA, November 1983. Mat. Res. Soc. Symp. Proc. 23, 627 (1984), Elsevier Science Publishing Co., Eds. N.M. Johnson and J.C.C. Fan.
• (PCP-41) T. Yonehara, C.V. Thompson, and H.I. Smith, (Abnormal Grain Growth in Ultra-Thin Films of Germanium on Insulator), Mat. Res. Soc. Symp. Proc. 25, 517 (1984). 'Thin-Films and Interfaces', Elsevier Science Publishing Co., Eds. J. Baglin and D. Campbell.
• (PCP-42) T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, (Surface- Energy-Driven Graphoepitaxy in Ultra-Thin Films of Ge), 1984 International Conference on Solid State Devices and Materials, Kobe, Japan, August 30 - September 1, 1984. Extended Abstracts of the 16th International Conference on Solid State Devices and Materials, B-10-1, 515-518 (1984).
• (PCP-43) M.W. Geis, H.I. Smith, C.K. Chen, R.W. Mountain, and C.L. Doherty, (The Characterization, Control and Reduction of Subboundaries in Silicon-on-Insulators), Mat. Res. Soc. Symp. Proc. 35, 575-582 (1985). Energy Beam-Solid Interactions and Transient Thermal Processing, Materials Research Society, Eds. D.K. Biegelson, G.A. Rozgonyi, C.V. Shank.
• (PCP-44) C.V. Thompson, (Solid Phase Processes for Semiconductor-On-Insulator), Mat. Res. Soc. Symp. Proc. 35, 711 (1985). Energy-Beam Solid Interactions and Transient Thermal, Eds. D.K. Biegelson, G.A. Rozgonyi, C.V. Shank.
• (PCP-45) A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, (Modification of Silicon Electronic Band Structure using Submicron Period Gate Electrodes), p. 866, IEEE International Electronic Device Meeting, San Francisco, CA, December 9-12, 1984.
• (PCP-46) M.W. Geis, C.K. Chen, H.I. Smith, R.W. Mountain, and C.L. Doherty, (Recent Advances in SOI Films Produced by Zone-Melting Recrystallization), Extended Abstracts of the 2nd International Workshop on Future Electron Devices. SOI Technology and Three-Dimensional Integration (FED SOI/3D Workshop), March 19-21, 1985, Shuzenji, Japan, p. 87, Research and Development Association for Future Electron Devices (1985).
• (PCP-47) C.C. Wong, H.I. Smith, and C.V. Thompson, (Room Temperature Grain Growth in Thin Au Films), 4th International Symposium on Grain Boundary Structure and Related Phenomena, Supplement to Trans. of Jap. Inst. of Metals 27, 641 (1986).
• (PCP-48) H.-J. Kim and C.V. Thompson, (The Effect of Dopants on Grain Boundary Mobility in Silicon), 4th International Symposium on Grain Boundary Structure and Related Phenomena), Japan Institute of Metals, Supplement to Trans. of Jap. Inst. of Metals 27, 495 (1986).
• (PCP-49) C.C. Wong, H.I. Smith, and C.V. Thompson, (Secondary Grain Growth and Graphoepitaxy in Thin Au Films on Submicrometer-Period Gratings), Mater. Res. Soc. Symp. Proc. 47, 35 (1985).
• (PCP-50) H.A. Atwater, H.I. Smith, and C.V. Thompson (Enhancement of Grain Growth in Ultra-Thin Germanium Films by Ion Bombardment), Mat. Res. Soc. Symp. Proc. 51, 337 (1986), Eds. H. Kurz, G.L. Olson, J.M. Poate. (Invited paper)
• (PCP-51) H.I. Smith, M.W. Geis, C.V. Thompson, and C.K. Chen, (Crystalline Films on Amorphous Substrates by Zone Melting and Surface-Energy-Driven Grain Growth in Conjunction with Patterning), Mat. Res. Soc. Symp. Proc. 53, 39 (1986). Eds. A. Chiang, M.W. Geis, L. Pfeiffer.
• (PCP-52) M.W. Geis, C.K. Chen, H.I. Smith, P.M. Nitishin, B.-Y. Tsaur, and R.W. Mountain, (Elimination of Subboundaries from Zone-Melting-Recrystallized Silicon-On-Insulator Films), Mat. Res. Soc. Symp. Proc. 53, 39 (1986).
• (PCP-53) C.V. Thompson and H.I. Smith, (Secondary Grain Growth in Thin Films), Phase Transitions in Condensed Systems - Experiment and Theory, Mat. Res. Soc. Symp. Proc. 57, 499 (1987). Eds. G.S. Cargill III, F. Spaepen K.N. Tu.
• (PCP-54) H.J. Kim and C.V. Thompson, (The Effects of Dopants on Surface-Energy-Driven Grain Growth in Ultrathin Si Films), presented at Fall Meeting of the Materials Research Society, Boston, MA, December 2-6, 1985, Mat. Res. Soc. Symp. Proc. 54, 730 (1986).
• (PCP-55) S.Y. Chou, D.A. Antoniadis, and H.I. Smith, (Application of the Shubnikov-de Haas Effect in Characterization of Sub-100 nm Channel Si MOSFETs), IEEE International Electron Devices Meeting, Washington, DC, December 1985, IEDM Technical Digest, 562-564 (1985).
• (PCP-56) D.A. Antoniadis, A.C. Warren, and H.I. Smith, (Quantum Mechanical Effects in Very Short and Very Narrow Channel MOSFETs), IEEE International Electron Devices Meeting, Washington, DC, December 1985, IEDM Technical Digest, 558-561 (1985).
• (PCP-57) C.R. Canizares, M.L. Schattenburg, and H.I. Smith, (High Energy Transmission Grating Spectrometer for AXAF), SPIE Vol. 597, 253 X-ray Instrumentation in Astronomy Society of Photo-Optical Instrumentation Engineers (1985).
• (PCP-58) S.Y. Chou, C.S. Lam, D.A. Antoniadis, H.I. Smith, and C.G. Fonstad, (Characterization of Modulation-Doped FET's using Shubnikov-de Haas Oscillations), Proc. 13th International Symposium on Gallium Arsenide and Related Compounds, Las Vegas, NV, September 28 - October 1, 1986, Ed. W.T. Lindley, Inst. Phys. Conf. Ser. No. 83, Chapter 4, p. 239-244.
• (PCP-59) H.I. Smith, (A Statistical Analysis of Microlithography), presented at the 18th International Conference on Solid State Devices & Materials, Tokyo, Japan, August 20-22, 1986. Also, in Extended Abstracts of the 18th (1986 International) Conference on Solid State Devices and Materials, p. 13 (1986), Japan Society of Applied Physics, Business Center for Academic Societies Japan, 40-14, Hongo-2-chome, Bunkyo-ku, Tokyo.
• (PCP-60) I. Plotnik, M.E. Porter, M. Toth, S. Akhtar, and H.I. Smith, (Ion-Implant Compensation of Tensile Stress in Tungsten Absorber for Low Distortion X-ray Masks), Proc. 1986 International Conference on Microlithography and Related Microelectronics Technologies, September 23-25, 1986, Interlaken, Switzerland p. 51, Eds. H.W. Lehmann and Ch. Bleiker, Elsevier, 1986. Also, Microelectronic Engineering 5, 51 (1986).
• (PCP-61) H.A. Atwater, H.I. Smith, and C.V. Thompson, (Ion Beam Enhanced Grain Growth in Thin Films), Beam-Solid Interactions and Transient Processes Symposium, Materials Research Society Meeting, December 1986. Mat. Res. Soc. Symp. Proc. 74, 499 (1987).
• (PCP-62) M.W. Geis, C.K. Chen, and H.I. Smith, (Elimination of Subboundaries in 0.5-µm-thick Si-on-Insulator Films Produced by ZMR), Beam-Solid Interactions and Transient Processes Symposium, Mat. Res. Soc. Meeting, December 1986.
• (PCP-62(a)) G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, (Electron Velocity Overhshoot at 300K and 77K in Silicon MOSFETs with Submicron Channel Lengths), IEEE International Electron Devices Meeting, Los Angeles, CA, December 1986, IEDM Technical Digest, 824 (1986).
• (PCP-63) J.S. Im, C.V. Thompson, and H. Tomita, (Solidification Morphologies in Zone-Melting Recrystallization), Beam-Solid Interactions and Transient Processes Symposium, Materials Research Society Meeting, December 1986, Mat. Res. Soc. Symp. Proc. 74, 555 (1987).
• (PCP-64) R.C. Cammarata, C.V. Thompson, and S.M. Garrison, (Secondary Grain Growth during Rapid Thermal Annealing of Doped Polysilicon Films), presented at Spring Materials Research Society Meeting, 1987 Mat. Res. Soc. Symp. Proc. 92, 335 (1987).
• (PCP-65) D.A. Antoniadis, (Quantum Mechanical and Non-Steady-State Transport Phenomena in Nanostructured Silicon Inversion Layers), Extended Abstracts, 19th Conference on Solid State Devices and Materials, August 25-27, 1987, The Japan Society of Applied Physics, Tokyo, Japan.
• (PCP-66) E.H. Anderson, D. Kern, and H.I. Smith, (Fabrication by Tri-Level Electron Beam Lithography of X-ray Masks with 50 nm Linewidths and Replication by X-ray Nanolithography), Microcircuit Engineering Proc. International Conference on Microlithography, September 22-25, l987, Paris, France, pg. 541, Eds. R. Castagne and J. Perrocheau, Elsevier, 1987. Also, Microelectronic Engineering 6, 541 (1987).
• (PCP-67) M.L. Schattenburg, I. Tanaka and H.I. Smith, (Microgap X-ray Nanolithography), Microcircuit Engineering Proc. International Conference on Microlithography, September 22-25, l987, Paris, France, pg. 273, Eds. R. Castagne and J. Perrocheau, Elsevier, 1987. Also, Microelectronic Engineering 6, 273 (1987).
• (PCP-68) H.A. Atwater, C.V. Thompson, and H.I. Smith, (Transition State Model for Grain Boundary Motion during Ion Bombardment), Mat. Res. Soc. Symp. Proc. 100, 345 (1988).
• (PCP-69) C.R. Canizares, M.L. Schattenburg, D. Dewey, A.M. Levine, T.H. Markert and H.I. Smith, (Transmission Grating Spectroscopy and The Advanced X-ray Astrophysics Facility (AXAF)), SPIE's 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, San Diego, CA, August 14-19, 1988.
• (PCP-70) K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, (Superlattice Effect in A Grid-Gate GaAs/AlGaAs MODFET Structure), Conference on Gallium Arsenide and Related Compounds, Atlanta, GA, September 12-14, 1988.
• (PCP-71) Y.C. Ku and H.I. Smith, (X-ray Mask Technology), Techcon '88, Semiconductor Research Corporation, Dallas, TX, October 12-14, 1988.
• (PCP-72) H. Kawata, J.M. Carter, A. Yen, and H.I. Smith, (Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity), Microcircuit Engineering '88, Vienna, Austria September 21-24, 1988. Microelectronic Engineering 9, 31-36 (1989).
• (PCP-73) H.I. Smith, K. Ismail, W. Chu, A. Yen, Y.C. Ku, and D.A. Antoniadis,)X-ray Nanolithography and Quantum-Effect Electronics), Molecular Electronics-Science and Technology, Engineering Foundation Conferences, Keauhou Kona, Hawaii, February 19-24, 1989. Molecular Electronics-Science and Technology, pp. 107-118, Ed. Ari Aviram, Engineering Foundation, New York, NY (1989).
• (PCP-74) H.I. Smith, K. Ismail, W. Chu, A. Yen, Y.C. Ku, M.L. Schattenburg, and D.A. Antoniadis, (Fabrication of Quantum-Effect Electronic Devices using X-ray Nanolithography), Proceedings of the International Symposium on Nanostructure Physics and Fabrication, pp. 57-65, Eds. M.A. Reed, and W.P. Kirk Academic Press, San Diego, CA (1989).
• (PCP-75) C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, (Far-Infrared Transmission Measurements on Grid-Gate GaAs/AlGaAs Lateral-Surface-Superlattice Structures), Proc. of the 4th International Conference on Modulated Semiconductor Structures, p. 819, Ann Arbor, MI (1989).
• (PCP-76) D.A. Antoniadis, K. Ismail, and H.I. Smith, (Lateral Surface Superlattices and Quasi-One-Dimensional Structures in GaAs), presented at the (Science and Engineering of One-and Zero-Dimensional Semiconductors), NATO Advanced Research Workshop, 29 March 29 - April 1, 1989, Cadiz, Spain, Science & Engineering of One-and Zero-Dimensional Semiconductors, Ed. S.P. Beaumont and C.M. Stotmajor Torres, Plenum Press, (1990).
• (PCP-77) H.I. Smith, K. Ismail, M.L. Schattenburg, and D.A. Antoniadis, (Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography), Microelectronic Engineering 11, 53-59 (1990).
• (PCP-78) Y.C. Ku, H.I. Smith, and I. Plotnik, (Low Stress Tungsten Absorber for X-ray Masks), Microelectronic Engineering 11, 303-308 (1990).
• (PCP-79) A. Yen, R.A. Ghanbari, E.H. Anderson, and H.I. Smith, (Fabrication of 100 nm Period Gratings using Achromatic Holographic Lithography), Microelectronic Engineering 11, 201-205 (1990).
• (PCP-80) K. Early, M.L. Schattenburg, and H.I. Smith, (Absence of Resolution Degradation in X-ray Lithography for l from 4.5 nm to 0.83 nm). Microelectronic Engineering 11, 317-321 (1990).
• (PCP-81) J.A. Floro and C.V. Thompson, (Epitaxial Grain Growth and Orientation Metals Metastability in Heteroepitaxial Thin Films), Mat. Res. Soc. Symp. Proceedings 187, 273 (1990).
• (PCP-82) C.T. Liu, D.C. Tsui, M. Santos, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, (Magnetoresistance of Two-Dimensional Electrons in a Two-Dimensional Lateral Surface Superlattice), Materials Research Society Fall Meeting, Boston, MA 1990, Mat. Res. Soc. Extended Abstract EA-26, 95 (1990).
• (PCP-83) C.C. Eugster, J.A. del Alamo, P.A. Belk, and M.J. Rooks, (Criteria for One-Dimensional Transport in Split-Gate Field-Effect Transistors), International Electron Devices Meeting (IEDM) 1990, Technical Digest 90, 335 (1990).
• (PCP-84) T. H. Markert, M.L. Schattenburg, T. Isobe, J. Bauer, C. Canizares, J. O'Connor, J. Porter, and H.I. Smith, (Investigations of Materials for Ultra-Thin Window X-ray Detectors), presented at 177th Meeting of the American Astronomical Society, Philadelphia, PA, January 13-17, 1991. Abstract in Bull. Am. Astron. Soc. 22, 1260 (1990).
• (PCP-85) C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, (Observation of Landau Level Splitting in Two-Dimensional Lateral Surface Superlattices), 20th International Conference on (The Physics of Semiconductors), Thessaloniki, Greece, August 6-10, 1990, Vol. 2, eds. E.M. Anastassakis, J.D. Joannopoulos, World Scientific Publishing Co.
• (PCP-86) A. Toriumi, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, (Resonant Magneto-Conductance in a Two-Dimensional Lateral-Surface-Superlattice), 20th International Conference on the (The Physics of Semiconductors), Thessaloniki, Greece, August 6-10, 1990, Vol. 2, eds. E.M. Anastassakis, J.D. Joannopoulos, World Scientific Publishing Co.
• (PCP-87) A. Yen, R.A. Ghanbari, Y.-C. Ku, W. Chu, M.L. Schattenburg, J.M. Carter, and H. I. Smith, (X-ray Masks with Large-Area 100 nm Period Gratings for Quantum-Effect Device Applications), Microelectronic Engineering 13, 271-274 (1991).
• (PCP-88) M. L. Schattenburg and H.I. Smith, (X-ray Nanolithography - the Clearest Path to 0.1 and Sub-0.1 µm ULSI), Proc. of International MicroProcess Conf., Kanazawa, Japan, July 15-18, 1991, JJAP Series 5, pp. 63-70 (1991).
• (PCP-89) N.H. Karam, V. Haven, K. Ismail, F. Legoues, J. Carter, and H.I. Smith, (A New Approach for Low Defect Density GaAs on Patterned Si Substrates by MOCVD), Materials Research Society Spring Meeting, Anaheim, CA, April 29, 1991, Mat. Res. Soc. Symp. Proc. 221, 309 (1991).
• (PCP-90) D.A. Antoniadis and J.E. Chung, (Physics and Technology of Ultra Short Channel MOSFET Devices), International Electron Devices Meeting (IEDM), Technical Digest, 21 (Dec. 1991).
• (PCP-91) H.I. Smith and M.L. Schattenburg, (Proximity X-ray Nanolithography), OSA Proceedings on Soft X-ray Projection Lithography, Jeffrey Bokor, ed. (Optical Society of America, Washington, DC), 12, 148-149 (1991).
• (PCP-92) T.H. Markert, J.M. Bauer, C.R. Canizares, T. Isobe, S. Nenonen, J. O'Connor, M.L. Schattenburg, H.I. Smith, K.A. Flanagan, M.V. Zombeck, (Proportional Counter Windows for the Bragg Crystal Spectrometer on AXAF), SPIE Conference on EUV, X-ray and Gamma Instruments for Astronomy II, San Diego, CA, July 24-26, (1991).
• (PCP-93) Y. Zhao, D.C. Tsui, K. Hirakawa, M. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, (Far Infrared Magneto-Absorption by the 2DEG in GaAs/AlGaAs Heterostructures with Grid Gates), presented at 21st International Conference on the Phyiscs of Semiconductors, Aug. 10-14, 1992 Bejing, China.
• (PCP-94) K. Early, M.L. Schattenburg, D.B. Olster, M.I. Shepard, and H.I. Smith, (Diffraction in Proximity X-ray Lithography: Comparing Theory and Experiment for Gratings, Lines, and Spaces), Microelectronic Engineering 17, 149-152 (1992).
• (PCP-95) W. Chu, M.L. Schattenburg, and H.I. Smith, (Low-Stress Gold Electroplating for X-ray Masks), Microelectronic Engineering 17, 223-226 (1992).
• (PCP-96) H.I. Smith and M.L. Schattenburg, (Lithography for Manufacturing at 0.25 Micrometer and Below), Crucial Issues in Semiconductor Materials and Processing Technologies, NATO ASI Series E, Applied Sciences -Vol. 222, p. 153, eds. S. Coffa, F. Priolo, E. Rimini, and J.M. Poate (Kluwer: Dordrecht, The Netherlands), 1992.
• (PCP-97) P.F. Bagwell, A. Kumar, and R. Lake, (Scattering and Quantum Localization of Electrons in a Waveguide by Static and Time-Varying Potentials), Chapter 2, p 45, Quantum-Effect Physics Electronics & Applications, Inst. of Physics Publishing Ltd., Bristol England, and Philadelphia, ed. by K. Ismail, T. Ikoma, and H.I. Smith (1992).
• (PCP-98) H.I. Smith and M.L. Schattenburg, (Why Bother with X-ray Lithography?) Proc. SPIE Symposium Microlithography, 1671, 228-298, San Jose, CA, March 8-9, 1992.
• (PCP-99) M.L. Schattenburg, J. Carter, W. Chu, R.C. Fleming, R.A. Ghanbari, M. Mondol, N. Polce, and H.I. Smith, (Mask Technology for X-ray Nanolithography), Mat. Res. Soc. Symp. Proc. 306, 63-68 (1993).
• (PCP-100) S.D. Hector and H.I. Smith, (Soft X-ray Projection Lithography using Two Arrays of Phase Zone Plates), OSA Proceedings on Soft X-ray Projection Lithography, Andrew M. Hawryluk and Richard H. Stulen, eds. (Optical Society of America, Washington, DC), 18, 202-206 (1993).
• (PCP-101) S.D. Hector, H.I. Smith, N. Gupta, and M.L. Schattenburg, (Optimizing Synchrotron-Based X-ray Lithography for 0.1 µm Lithography). Microelectronic Engineering, 23, 203-206 (1994).
• (PCP-102) H.I. Smith and M.L. Schattenburg, (X-ray Nanolithography: Limits, and Application to Sub-100 nm Manufacturing), presented at the NATO Workshop on Nanolithography, Rome, Italy April 6-8, 1993; Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies, pp. 103-119, Eds. M. Gentili, et al, Kluwer Academic Publishers, Netherlands (1994).
• (PCP-103) Y. Zhao, D.C. Tsui, M.B. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, H.I. Smith, and K. Kempa, (Mode Softening of Coupled Quantum Wires), submitted to 10th International Conference on the Electronic Properties of Two-Dimensional Systems Salva Regina University, Newport, Rhode Island May 31-June 4, 1993.
• (PCP-104) H. Hu, L.T. Su, I.Y. Yang, D.A. Antoniadis, and H.I. Smith, (Channel and Source/Drain Engineering in High-Performance Sub-0.1 µm NMOSFETs using X-ray Lithography), 1994 Symposium on VLSI Technology Digest of Technical Papers, pp. 17-18, (IEEE cat. No. 94CH3433-0, JSAP cat. No. AP 941211) Honolulu, Hawaii, June 7-9, 1994.
• (PCP-105) M.L. Schattenburg, R.J. Aucoin, R.C. Fleming, I. Plotnik, J. Porter and H.I. Smith, (Fabrication of High Energy X-Ray Transmission Gratings for AXAF), submitted to SPIE Proceedings 2280, EUV, X-ray and Gamma-Ray Instrumentation for Astronomy V, San Diego, CA, July 24-29, 1994.
• (PCP-106) J.N. Damask, J. Ferrera, V.V. Wong, H.I. Smith, and H.A. Haus, (Limitations and Solutions for the Use of Integrated l/4-Shifted Distributed Bragg Resonators in Wavelength-Division Multiplexing Applications), International Symposium on Integrated Optics '94, Lindau, Germany, April 13-14, 1994, proceedings titled Nanofabrication Technologies and Device Integration, Wolfgang Karthe, Chair/Editor; SPIE, v 2213, pp. 137-151 (1994).
• (PCP-107) M. Burkhardt, S. Silverman, H.I. Smith, D.A. Antoniadis, K.W. Rhee, and M.C. Peckerar, (Gap Control in the Fabrication of Quantum-Effect Devices Using X-Ray Nanolithography), Microelectronic Engineering, 27, 307-310 (1995).
• (PCP-108) I.Y. Yang, C. Vieri, A. Chandrakasan, and D.A. Antoniadis, ``Back Gated CMOS on SOIAS for Dynamic Threshold Voltage Control'', IEDM Technical Digest, p. 877, 1995.
• (PCP-109) C. Vieri, I.Y. Yang, C. Chandrakasan, and D.A. Antoniadis, ``SOIAS: Dynamically Variable Threshold SOI with Active Substrate'', Symposium on Low Power Electronics, Digest of Technical Papers, p.86, 1995.
• (PCP-110) A. Chandrakasan, I. Yang, C. Vieri, and D.A. Antoniadis, (Design Considerations and Tools for Low-voltage Digital System Design), IEEE/ACM Design Automation Conference, pp. 113-118, June 1996.
• (PCP-111) D. Berman, R.C. Ashoori, and H.I. Smith, (Single Electron Transistors for Charge Sensing in Semiconductors), Proceedings of the International Conference on Quantum Devices and Circuits, K. Ismail, S. Bandyopadhyay, and J.P. Leburton, eds., (World Scientific, New Jersey) p. 217-223, 1996.
• (PCP-112) E.M. Koontz, G.S. Petrich, L.A. Kolodziejski, M.H. Lim, V.V. Wong, H.I. Smith, and M.S. Goorsky and K.M Matney, (Overgrowth of InGaAsP Materials on Rectangular-Patterned Gratings using GSMBE,) Proceedings of the Ninth International Conference on InP and Related materials, IEEE, Piscataway, NJ, p. 62-65, (1997).
• (PCP-113) J. Goodberlet, S. Silverman, J. Ferrera, M. Mondol, M.L. Schattenburg, and H.I. Smith, (A One-Dimensional Demonstration of Spatial-Phase-Locked Electron-Beam Lithography), Microelectronic Engineering 35, pp. 473-476, (1997).
• (PCP-114) J.S. Foresi, P.R. Villeneuve, J. Ferrera, E.R. Thoen, G. Steinmeyer, S. Fan, J.D. Joannopoulos, L.C. Kimerling, H.I. Smith, E.P. Ippen, (Measurements of Photonic Band Gap Waveguide Microcavities at l=1.564 mm,) CLEO, Baltimore, Maryland, 1997.
• (PCP-115) H.I. Smith, (Recent Progress in X-ray Technology at MIT), 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, Pacifico Yokohama, Japan, July 13-15, 1997.
• (PCP-116) D.J. Twisselmann, B.T. Adekor, M. Farhoud, Henry I. Smith, P.C. Dorsey and C.A. Ross, (In-Plane Anisotropy in CoCr(Ta,Pt)/Cr Films Deposited Onto Substrates With Controlled Topography), in press, Proc. Materials Research Society 571 193-8, (1998). (MRS Spring, 3/98)
• (PCP-117) D.G. Pflug, M. Schattenburg, H.I. Smith and A.I. Akinwande, (100nm Aperture field Emitter Arrays for Low Voltage Applications), IEDM Technical Digest, San Francisco, CA. pp. 855Ñ858, 1998.
• (PCP-118) C.A. Ross, T.A. Savas, H.I. Smith, M. Hwang and R. Chantrell, (Modelling of Hysteresis Loops of Arrays of 100 nm Period Nanomagnets), Intermag 99, Korea, May 1999.
• (PCP-119) J.Goodberlet, (A Very-High-Density Scintillation-Data-Storage Device), Microelectronic Engineering 46 (1999) 145-148.
• (PCP-120) D.J.D. Carter, H.I. Smith, K.W. Rhee and C. Marrian, (Sub-40nm pattern replication with +/- 20% process latitude by soft contact x-ray lithography), Proceedings of SPIE's 24th Annual International Symposium on Microlithography, Emerging Lithographic Technologies III, 14-19 March 1999, Santa Clara, CA. SPIE 3676, pp.70-78 (1999).
• (PCP-121) D.J.D. Carter, D. Gil, R. Menon, I. J. Djomehri and Henry I. Smith, (Zone-Plate Array Lithography (ZPAL): A new maskless approach), Proceedings of SPIE's 24th Annual International Symposium on Microlithography, Emerging Lithographic Technologies III 14-19 March 1999, Santa Clara, CA. SPIE 3676, pp.324-332 (1999).
• (PCP-122) T. E. Murphy, B. E. Little and H. I. Smith, (Wavelength-and Polarization-Insensitive Integrated Directional Couplers using Mach-Zehnder Structures,) in Integrated Photonics Research, OSA Technical Digest, pp. 138-140 (1999).
• (PCP-123) J.G. Goodberlet, B.L. Dunn ,)Deep-Ultraviolet Contact Photolithography), Micro & Nano Engineering, 1999., 11-12. (1999).
• (PCP-124) R. Menon, D.J.D. Carter, D. Gil and H.I. Smith, (Zone-plate-array lighography (ZPAL): Simulations for System Design), In X-Ray Microscopy: Proceedings of the Sixth International Conference, Berkeley, CA, 2-6 August 1999., 647-651 American Institute of Physics, 2000.
• (PCP-125) J.T. Hastings, F. Zhang, J.G. Goodberlet and H.I. Smith, (Improved Pattern-Placement Accuracy in E-Beam Lithography Via Sparse-Sample Spatial-Phase Locking), Microelectronic Engineering 53, 361Ñ364, 2000.
• (PCP-126) H. I. Smith, D. J. D. Carter, M. Meinhold, E.E. Moon, M.H. Lim, J. Ferrera, M. Walsh, D. Gil, R. Menon, (Soft X-Rays for Deep Sub-100 nm Lithography, with and without masks), Microelectronic Engineering 53, 77Ñ84, 2000.
• (PCP-127) Euclid E. Moon, Patrick N. Everett, Mitchell W. Meinhold and Henry I. Smith, (Dynamic three-Dimensional Mask-Wafer Positioning with Nanometer Exposure Overlay Accuracy), Jpn. J. Appl. Phys. Vol. 39, pp. 7040-7043, Part 1, No. 12B, December 2000.
• (PCP-128) Henry I. Smith, (Patterning Accuracy in X-ray Lithography, New Approaches and Applications), XEL 2000 Conference, Yokohama, Japan, M1-3, November, 2000.
• (PCP-129) H. I. Smith, D. Carter, D. Gil and R. Menon, (Zone-Plate Array Lighography (ZPAL): A Maskless Approach Extendible to 20 nm), XEL 2000 Conference, Yokohama, Japan, 7-1, November, 2000.
• (PCP-130) Henry Smith, (The Role of Lithography and the Planar Process), Proceedings, Korea-U.S. Forum on Nano Science and Technology, p. 58-71, Cambridge. September, 2000.
• (PCP-131) M. Hwang, M. Farhoud, Y. Hao, M. Walsh, T.A. Savas, H.I. Smith and C. A. Ross, (Major hysteresis loop modelling of two-dimensional arrays of single-domain particles), IEEE Transactions on Magnetics, 36(5), pp. 3173-3175, September 2000.
• (PCP-132) H. Bergner, L.M. Cohen, M.L. Schattenburg and G. Monnelly, (Precision assembly station for high-resolution segmented optics), Proc. SPIE 4138, X-Ray Optics, Instruments and Missions IV, Eds. R. B. Hoover and A.B.C. Walker, 134-145 (2000).
• (PCP-133) Glen P. Monnelly, Olivier Mongrard, David Breslau, Nat Butler, Carl G. Chen, Lester Cohen, Wendy Gu, Ralf K. Heilmann, Paul T. Konkola, George R. Ricker, and Mark L. Schattenburg, (High-Accuracy X-ray Foil Optic Assembly), Proc. SPIE 4138, X-Ray Optics, Instruments and Missions IV, eds. R.B. Hoover and A.B.C. Walker, 164-173 (2000).
• (PCP-134) K.A. Flanagan, T.H. Markert, J.E. Davis, M.L. Schattenburg, R.L. Blake, F. Scholze, P. Bulicke, R. Fliegauf, S. Kraft, G. Ulm, E.M. Gullikson, (Modeling the Chandra High Energy Transmission Gratings below 2 keV) Proc. SPIE 4140, X ÐRay and Gamma-Ray Instrumentation for Astronomy XI, pp. 111-122, Eds. K.A. Flanagan and O.H.W. Siegmund, 2000.
• (PCP-135) R. Petre, L.M. Cohen, D.A. Content, J.D. Hein, T. Saha, M. Schattenburg, and W. Zhang, (Progress towards Meeting the Constellation-X Performance Goals using segmented X-ray Mirrors), Proc. SPIE 4138 pp. 16-24, 2000.
• (PCP-136) Y. Hao, M. Walsh, C.A. Ross, H.I. Smith, J. Wang, L. Malkinski, (In-plane anisotropy in arrays of magnetic ellipses), IEEE Trans. Magn. 36(5), 2996-2998. (2000).
• (PCP-137) David G. Pflug, Mark Schattenburg, Henry I. Smith and Akintunde I. Akinwande, (Field Emitter Arrays for Low Voltage Applications with sub 100 nm apertures and 200 nm period). Presented at the 2001 IEDM, 2-5 December, Washington, DC pp. 179-182.
• (PCP-138) M.L. Schattenburg, C.G. Chen, R.K. Heilmann, P.T. Konkola and G.S. Pati, (Progress towards a general grating patterning technology using phase-locked scanning beams), Proceedings of the SPIE, Vol. 4485, 378-384 (2002).
• (PCP-139) Mark L. Schattenburg and Henry I. Smith, (The critical role of metrology in nanotechnology), Proceedings of the SPIE, Nanostructure Science, Metrology, and Technology, Martin C. Peckerar and Michael T. Postek, Jr. Chairs/Editors, Vol. 4608, pages 116-124, Gaithersburg, MD, 2001.
• PCP-140 M. Shima, M. Hwang. M. Farhoud, T. A. Savas, A. Tkzacyk, H. I. Smith, C. A. Ross, W. Schwarzacher, “Fabrication and magnetic properties of arrays of electrodeposited cylinders”, Proc. Electrochem. Soc. PV2000-29 p.111 (2001)
• PCP-141 C. G. Chen, P. T. Konkola, R. K. Heilmann, C. Joo and Mark Schattenburg, “Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography”, Published in Proc. SPIE 4936, pp. 126-134, (2003).
• PCP-142 R. Menon, D. Gil, H. I. Smith, "Zone-plate-array lithography: a maskless fast-turn-around system for microoptic device fabrication", Invited Paper at the Photonics West 2003, 25-31 January 2003, San Jose Convention Center, San Jose, CA USA, Published in the Proceedings of Micromachining and Microfabrication, San Jose, CA, January 25-31, 2003. SPIE vol. 4984, pp.10-17, 2003
• PCP-143 S. M. Jurga, C. Hidrovo, J. Niemczura, H. I. Smith, and G. Barbastathis, Nanostructured origami,IEEE Nanotechology 2003, San Francisco, CA, Aug 12-14 (paper TR-4).

AWAITING PUBLICATION:

• PCP-A G.D. U’Ren, K.M. Matney, M.S. Goorsky, M. Wormington, E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, and H.I. Smith, “Triple Axis diffraction Studies of InGaAsP/InP Epitaxial Overgrowth Grating Structures”, to be published in The 46th Annual Denver X-ray Conference Proceedings.
• PCP-B Minghao Qi, Steven G. Johnson, John D. Joannopoulos and Henry Smith, “Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 um”, Conference on Lasers and Electro-Optics", June 1-6, Baltimore, Maryland 2003.
• PCP-C Tymon Barwicz, Milos A. Popoviae, Peter T. Rakich, Michael R. Watts, Hermann Haus, Erich Ippen and Henry I. Smith, “Fabrication and analysis of add-drop filters based on microring resonators in SiN”, submitted to OFC:04 (Optical Fiber Communication Conference) in Los Angeles CA from Feb 22-27, 2004.
• PCP-D Ytshak Avrahami, Milos A. Popovic, Tymon Barwicz, Peter T. Rakich, Michael R. Watts, Francisco Lopez-Royo, Fabrizio Giancometti, Mark Beals, Lionel C. Kimerling, Henry I. Smith, Hermann A. Haus, Harry L. Tuller, George Barbastathis, “MEMS enabled optical switching with high-index contrast ring resonator filters. (submittedto OFC:04 (Optical Fiber commnication Conference) in Los Angeles, CA. Feb 22-27, 2004.
• PCP-E Hyun Jin In, Will Arora, Tilman Buchner, Stanley M. Jurga, Henry I. Smith, George Barbastathis, “The Nanostructured Origami 3D Fabrication and Assembly Process for Nanomanufacturing”, IEEE Nano 04, Munich, Germany.

Conference Presentations (Abstract Only)

• (CP-1) H.I. Smith, (The Fabrication of Microsound Components), IEEE International Conv. Digest, p. 90-91 (1969). (Report MS-2457; ESD-TR-70-88).
• (CP-2) R.C. Williamson and H.I. Smith, (The Reflection of Elastic Surface Waves from Periodic Arrays on YX LiNbO3), IEEE Ultrasonics Symposium, Miami, FL, December 6-8, 197l.
• (CP-3) R.C. Williamson and H.I. Smith, (Large Time Bandwidth Product Surface Wave Pulse Compressor Employing Reflective Gratings), Ultrasonics Symposium, Boston, MA, October 4-7, 1972.
• (CP-4) D.L. Spears and H.I. Smith, (High Frequency Surface Wave Transducers Fabricated by X-ray Lithography), IEEE Ultrasonics Symposium, Boston, MA, October 6, 1972.
• (CP-5) H.I. Smith, J. Melngailis, R.C. Williamson, and W.T. Brogan, (Ion Beam Etching of Surface Gratings), J. Vac. Sci. Technol. 10, 1127 (1973).
• (CP-6) H.I. Smith, (X-ray and Optical Replication of Electron Beam Generated Masks), IEEE Digests of the Intermag. Conference, Toronto, Canada, May 14-17, 1974. Also, IEEE Boston Section of Sonics & Ultrasonics, February 5, 1974.
• (CP-7) S.E. Bernacki and H.I. Smith, (X-ray Lithography Applied to Silicon Device Fabrication), Electrochemical Society Meeting, San Francisco, CA, May 12-17, 1974.
• (CP-8) R.J. Hawryluk, A. Soares, H.I. Smith, and A.M. Hawryluk, (Experimental Evaluation of Electron Scattering Models), Electrochemical Society Meeting, San Francisco, CA, May 12-17, 1974.
• (CP-9) D.C. Flanders, H.I. Smith, and S.E. Bernacki, (X-ray Lithographic Replication of 1000? Linewidth Patterns using CuL Radiation), Electrochemical Society Spring Meeting, Washington, DC, May 2-7, 1976.
• (CP-10) D.C. Flanders and H.I. Smith, (X-ray Lithographic and Processing Technologies for Fabricating Surface Relief Gratings with Profile Control < 400?), 14th Symposium on Electron, Ion & Photon Beam Technol., Palo Alto, CA, May 27, 1977.
• (CP-11) D.C. Flanders, D.C. Shaver, and H.I. Smith, (Submicrometer Spatial-Period Surface-Relief Gratings for Orienting Crystalline Overlayers), 8th International Conference Electron & Ion Beam Science & Technology, Seattle, WA, May 1978.
• (CP-12) H.I. Smith, D.C. Flanders, and M.W. Geis, (Fabrication and Application of Submicrometer Structures), Dry Etching Seminar, Danvers, MA, October 1978. (Invited)
• (CP-13) H.I. Smith and D.C. Flanders, (X-ray Lithography - A Review and Assessment of Future Applications), Semicon East, Boston, MA, September 1979. H.I. Smith and D.C. Flanders, (X-ray Lithography - A Review and Assessment of Future Applications), Semicon East, Boston, MA, October 1979. (Invited)
• (CP-14) H.I. Smith and D.C. Flanders, (X-ray Lithography - A Review and Assessment of Future Applications), 26th National Vacuum Symposium, New York, NY, October 1979. (Invited)
• (CP-15) M.W. Geis, D.A. Antoniadis, D.C. Flanders, and H.I. Smith, (Crystallographic and Electrical Properties of Silicon Produced by Graphoepitaxy), Mat. Res. Soc., Boston, MA, November 26-30, 1979.
• (CP-16) H.I. Smith, (Artificial Microstructure Research and Its Impact on Future Integrated Circuits), Conference on Advanced Research in Integrated Circuits, MIT, Cambridge, MA, January 1980. (Invited)
• (CP-17) H.I. Smith, (Microfabrication for Guided-Wave Optical Devices), Topical Meeting on Integrated and Guided-Wave Optics, Incline Village, NV, January 1980. Integrated and Guided Wave Optics Technical Digest, IEEE (1980). (Invited)
• (CP-18) H.I. Smith, (Microlithography and New Materials for VLSI), Workshop on Microprocessors in Military and Industrial Systems, Johns Hopkins University, MD, January 15-16, 1980. (Invited)
• (CP-19) H.I. Smith and D.C. Flanders, (A Review of X-ray Lithography), Electrochemical Society Meeting, May 1980.
• (CP-20) H.I. Smith, (Graphoepitaxy of Silicon on Amorphous Substrates), March Meeting of the American Physical Society, New York, NY, (1980). (Invited)
• (CP-21) P.F. Liao and J.G. Bergman, (Surface Enhanced Raman Spectroscopy on Lithographically Produced Silver Microstructures), Annual Meeting of the Optical Society, Chicago, IL, October 1980. Abstract in J. Opt. Soc. Amer.
• (CP-22) H.I. Smith, (Submicrometer Structures Technology), Symposium uber Mikrostrukturforschung, Institut fur Halbleitertechnik, Aachen, FRG, March 5-6, 1981. (Invited)
• (CP-23) H.I. Smith, (Review of Conventional Submicrometer Fabrication Techniques), Workshop on the Interaction of Laser Radiation with Surfaces for Application to Microelectronics, MIT, Cambridge, MA, May 4-5, 1981. (Invited)
• (CP-24) M.W. Geis, D.J. Silversmith, J.C.C. Fan, B.Y. Tsaur, H.I. Smith and D.A. Antoniadis, (Preparation of Oriented Silicon Films on Insulating Amorphous Substrates), Electronic Materials Conference, Santa Barbara, CA, June 24-26, 1981.
• (CP-25) S.S. Dana and H.I. Smith, (Studies of Graphoepitaxy by CVD and Solution Growth), 5th